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name:-0.033653974533081
name:-0.017386913299561
name:-0.00058293342590332
KOMINE; Norio Patent Filings

KOMINE; Norio

Patent Applications and Registrations

Patent applications and USPTO patent grants for KOMINE; Norio.The latest application filed is for "illumination optical system, exposure apparatus, and exposure method".

Company Profile
0.16.25
  • KOMINE; Norio - Sagamihara-shi JP
  • Komine; Norio - Sagamihara JP
  • Komine; Norio - Kanagawa JP
  • Komine; Norio - Chiyoda-ku JP
  • Komine, Norio - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Illumination Optical System, Exposure Apparatus, And Exposure Method
App 20120236285 - TANITSU; Osamu ;   et al.
2012-09-20
Illumination optical system, exposure apparatus, and exposure method
App 20100225895 - Tanitsu; Osamu ;   et al.
2010-09-09
Illumination optical system, exposure apparatus, and exposure method
App 20100149511 - Tanitsu; Osamu ;   et al.
2010-06-17
Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device
Grant 7,515,247 - Tanitsu , et al. April 7, 2
2009-04-07
Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment
Grant 7,515,248 - Tanitsu , et al. April 7, 2
2009-04-07
Illumination optical system, exposure apparatus, and exposure method
App 20080239274 - Tanitsu; Osamu ;   et al.
2008-10-02
Illumination optical system, exposure apparatus, and exposure method with polarized switching device
Grant 7,423,731 - Tanitsu , et al. September 9, 2
2008-09-09
Illumination optical system, exposure apparatus, and exposure method
App 20080094602 - Tanitsu; Osamu ;   et al.
2008-04-24
Illumination optical system, exposure apparatus, and exposure method
App 20080074632 - Tanitsu; Osamu ;   et al.
2008-03-27
Illuminating optical system, exposure system and exposure method
App 20060171138 - Muramatsu; Kenichi ;   et al.
2006-08-03
Exposure apparatus and optical component for the same
App 20060164620 - Mizuguchi; Masafumi ;   et al.
2006-07-27
Exposure apparatus and optical component for the same
App 20060158636 - Mizuguchi; Masafumi ;   et al.
2006-07-20
Exposure apparatus and optical component for the same
Grant 7,072,026 - Mizuguchi , et al. July 4, 2
2006-07-04
Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus
App 20060110604 - Mizuguchi; Masafumi ;   et al.
2006-05-25
Illumination optical system, exposure apparatus, and exposure method
App 20060055834 - Tanitsu; Osamu ;   et al.
2006-03-16
Exposure apparatus and optical component for the same
App 20060012768 - Mizuguchi; Masafumi ;   et al.
2006-01-19
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
App 20050284177 - Komine, Norio ;   et al.
2005-12-29
Synthetic quartz glass member and method for producing the same
App 20050047986 - Mizuguchi, Masafumi ;   et al.
2005-03-03
Quartz glass member and projection aligner
Grant 6,835,683 - Komine , et al. December 28, 2
2004-12-28
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
App 20040095566 - Komine, Norio ;   et al.
2004-05-20
Optical member and projection optical system for photolithography using the same
App 20040047029 - Komine, Norio ;   et al.
2004-03-11
Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus
Grant 6,656,860 - Yoshida , et al. December 2, 2
2003-12-02
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
Grant 6,649,268 - Komine , et al. November 18, 2
2003-11-18
Quartz glass member and projection aligner
App 20030171203 - Komine, Norio ;   et al.
2003-09-11
Exposure apparatus including silica glass for photolithography
App 20030119649 - Jinbo, Hiroki ;   et al.
2003-06-26
Fluorine-containing silica glass and its method of manufacture
App 20030037568 - Fujiwara, Seishi ;   et al.
2003-02-27
Synthetic silica glass optical member and method of manufacturing the same
App 20020144517 - Fujiwara, Seishi ;   et al.
2002-10-10
Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus
App 20020082157 - Yoshida, Akiko ;   et al.
2002-06-27
Synthetic silica glass molding method, synthetic silica glass molding apparatus, and synthetic silica glass
App 20020050152 - Fujiwara, Seishi ;   et al.
2002-05-02
Silica glass and its manufacturing method
App 20020013208 - Komine, Norio ;   et al.
2002-01-31
Manufacturing method of synthetic silica glass
App 20020007649 - Fujiwara, Seishi ;   et al.
2002-01-24
Silica glass and its manufacturing method
Grant 6,291,377 - Komine , et al. September 18, 2
2001-09-18
Silica glass having superior durability against excimer laser beams and method for manufacturing the same
App 20010000508 - Jinbo, Hiroki ;   et al.
2001-04-26
Manufacturing method of synthetic silica glass
Grant 6,094,940 - Fujiwara , et al. August 1, 2
2000-08-01
Silica glass for photolithography
Grant 6,087,283 - Jinbo , et al. July 11, 2
2000-07-11
Image-focusing optical system for ultraviolet laser
Grant 6,061,174 - Shiozawa , et al. May 9, 2
2000-05-09
Fluorine-containing silica glass
Grant 5,958,809 - Fujiwara , et al. September 28, 1
1999-09-28
Method for producing a silica glass
Grant 5,908,482 - Komine , et al. June 1, 1
1999-06-01
Silica glass
Grant 5,707,908 - Komine , et al. January 13, 1
1998-01-13
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
Grant 5,696,624 - Komine , et al. December 9, 1
1997-12-09
Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
Grant 5,679,125 - Hiraiwa , et al. October 21, 1
1997-10-21

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