Patent | Date |
---|
Illumination Optical System, Exposure Apparatus, And Exposure Method App 20120236285 - TANITSU; Osamu ;   et al. | 2012-09-20 |
Illumination optical system, exposure apparatus, and exposure method App 20100225895 - Tanitsu; Osamu ;   et al. | 2010-09-09 |
Illumination optical system, exposure apparatus, and exposure method App 20100149511 - Tanitsu; Osamu ;   et al. | 2010-06-17 |
Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device Grant 7,515,247 - Tanitsu , et al. April 7, 2 | 2009-04-07 |
Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment Grant 7,515,248 - Tanitsu , et al. April 7, 2 | 2009-04-07 |
Illumination optical system, exposure apparatus, and exposure method App 20080239274 - Tanitsu; Osamu ;   et al. | 2008-10-02 |
Illumination optical system, exposure apparatus, and exposure method with polarized switching device Grant 7,423,731 - Tanitsu , et al. September 9, 2 | 2008-09-09 |
Illumination optical system, exposure apparatus, and exposure method App 20080094602 - Tanitsu; Osamu ;   et al. | 2008-04-24 |
Illumination optical system, exposure apparatus, and exposure method App 20080074632 - Tanitsu; Osamu ;   et al. | 2008-03-27 |
Illuminating optical system, exposure system and exposure method App 20060171138 - Muramatsu; Kenichi ;   et al. | 2006-08-03 |
Exposure apparatus and optical component for the same App 20060164620 - Mizuguchi; Masafumi ;   et al. | 2006-07-27 |
Exposure apparatus and optical component for the same App 20060158636 - Mizuguchi; Masafumi ;   et al. | 2006-07-20 |
Exposure apparatus and optical component for the same Grant 7,072,026 - Mizuguchi , et al. July 4, 2 | 2006-07-04 |
Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus App 20060110604 - Mizuguchi; Masafumi ;   et al. | 2006-05-25 |
Illumination optical system, exposure apparatus, and exposure method App 20060055834 - Tanitsu; Osamu ;   et al. | 2006-03-16 |
Exposure apparatus and optical component for the same App 20060012768 - Mizuguchi; Masafumi ;   et al. | 2006-01-19 |
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member App 20050284177 - Komine, Norio ;   et al. | 2005-12-29 |
Synthetic quartz glass member and method for producing the same App 20050047986 - Mizuguchi, Masafumi ;   et al. | 2005-03-03 |
Quartz glass member and projection aligner Grant 6,835,683 - Komine , et al. December 28, 2 | 2004-12-28 |
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member App 20040095566 - Komine, Norio ;   et al. | 2004-05-20 |
Optical member and projection optical system for photolithography using the same App 20040047029 - Komine, Norio ;   et al. | 2004-03-11 |
Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus Grant 6,656,860 - Yoshida , et al. December 2, 2 | 2003-12-02 |
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member Grant 6,649,268 - Komine , et al. November 18, 2 | 2003-11-18 |
Quartz glass member and projection aligner App 20030171203 - Komine, Norio ;   et al. | 2003-09-11 |
Exposure apparatus including silica glass for photolithography App 20030119649 - Jinbo, Hiroki ;   et al. | 2003-06-26 |
Fluorine-containing silica glass and its method of manufacture App 20030037568 - Fujiwara, Seishi ;   et al. | 2003-02-27 |
Synthetic silica glass optical member and method of manufacturing the same App 20020144517 - Fujiwara, Seishi ;   et al. | 2002-10-10 |
Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus App 20020082157 - Yoshida, Akiko ;   et al. | 2002-06-27 |
Synthetic silica glass molding method, synthetic silica glass molding apparatus, and synthetic silica glass App 20020050152 - Fujiwara, Seishi ;   et al. | 2002-05-02 |
Silica glass and its manufacturing method App 20020013208 - Komine, Norio ;   et al. | 2002-01-31 |
Manufacturing method of synthetic silica glass App 20020007649 - Fujiwara, Seishi ;   et al. | 2002-01-24 |
Silica glass and its manufacturing method Grant 6,291,377 - Komine , et al. September 18, 2 | 2001-09-18 |
Silica glass having superior durability against excimer laser beams and method for manufacturing the same App 20010000508 - Jinbo, Hiroki ;   et al. | 2001-04-26 |
Manufacturing method of synthetic silica glass Grant 6,094,940 - Fujiwara , et al. August 1, 2 | 2000-08-01 |
Silica glass for photolithography Grant 6,087,283 - Jinbo , et al. July 11, 2 | 2000-07-11 |
Image-focusing optical system for ultraviolet laser Grant 6,061,174 - Shiozawa , et al. May 9, 2 | 2000-05-09 |
Fluorine-containing silica glass Grant 5,958,809 - Fujiwara , et al. September 28, 1 | 1999-09-28 |
Method for producing a silica glass Grant 5,908,482 - Komine , et al. June 1, 1 | 1999-06-01 |
Silica glass Grant 5,707,908 - Komine , et al. January 13, 1 | 1998-01-13 |
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production Grant 5,696,624 - Komine , et al. December 9, 1 | 1997-12-09 |
Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range Grant 5,679,125 - Hiraiwa , et al. October 21, 1 | 1997-10-21 |