KOMINE; Nobuhiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for KOMINE; Nobuhiro.The latest application filed is for "semiconductor manufacturing apparatus and semiconductor manufacturing method".

Company Profile

2.32.44

KOMINE; Nobuhiro - Nagoya Aichi JP
Komine; Nobuhiro - Nagoya JP
Komine; Nobuhiro - Aichi-ken JP
Komine; Nobuhiro - Aichi JP
KOMINE; Nobuhiro - Nagoya-shi JP
Komine; Nobuhiro - Mie-ken JP
Komine; Nobuhiro - Mie N/A JP
Komine; Nobuhiro - Yokkaichi JP
Komine; Nobuhiro - Yokohama JP
KOMINE; Nobuhiro - Yokkaichi-shi JP
Komine, Nobuhiro - Yokohama-shi JP
Komine; Nobuhiro - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor Manufacturing Apparatus And Semiconductor Manufacturing Method App 20220293418 - MIZUTANI; Takuya ; et al.	2022-09-15
Mask manufacturing method and mask set Grant 11,143,950 - Akamatsu , et al. October 12, 2	2021-10-12
Exposure method, exposure system, and manufacturing method for semiconductor device Grant 10,599,045 - Mizuta , et al.	2020-03-24
Imprint apparatus and manufacturing method of semiconductor device Grant 10,488,754 - Komine Nov	2019-11-26
Substrate measurement system, method of measuring substrate, and computer program product Grant 10,295,409 - Toshima , et al.	2019-05-21
Exposure Method, Exposure System, And Manufacturing Method For Semiconductor Device App 20190079412 - MIZUTA; Yoshio ; et al.	2019-03-14
Mask Manufacturing Method And Mask Set App 20190079386 - AKAMATSU; Yuki ; et al.	2019-03-14
Imprint Apparatus And Manufacturing Method Of Semiconductor App 20180217493 - KOMINE; Nobuhiro	2018-08-02
Imprint device and pattern forming method Grant 9,952,505 - Okamoto , et al. April 24, 2	2018-04-24
Substrate Holding Apparatus App 20180082880 - KOMINE; Nobuhiro	2018-03-22
Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording medium Grant 9,885,960 - Komine , et al. February 6, 2	2018-02-06
Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device Grant 9,784,573 - Sato , et al. October 10, 2	2017-10-10
Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of device Grant 9,772,566 - Komine , et al. September 26, 2	2017-09-26
Wafer lithography equipment Grant 9,760,017 - Shiozawa , et al. September 12, 2	2017-09-12
Method of forming mark pattern, recording medium and method of generating mark data Grant 9,741,564 - Setta , et al. August 22, 2	2017-08-22
Substrate Measurement System, Method Of Measuring Substrate, And Computer Program Product App 20170235232 - TOSHIMA; Miki ; et al.	2017-08-17
Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium Grant 9,703,912 - Furubayashi , et al. July 11, 2	2017-07-11
Mask processing apparatus and mask processing method Grant 9,632,407 - Sato , et al. April 25, 2	2017-04-25
Mask Alignment Mark, Photomask, Exposure Apparatus, Exposure Method, And Manufacturing Method Of Device App 20170003606 - Komine; Nobuhiro ; et al.	2017-01-05
Measurement Apparatus, Measurement Method, And Manufacturing Method Of Semiconductor Device App 20160379902 - HAGIO; Yoshinori ; et al.	2016-12-29
Method Of Forming Mark Pattern, Recording Medium And Method Of Generating Mark Data App 20160322307 - SETTA; Yuji ; et al.	2016-11-03
Deflection measuring device and deflection measuring method Grant 9,459,093 - Sato , et al. October 4, 2	2016-10-04
Wafer Lithography Equipment App 20160274470 - SHIOZAWA; Kazufumi ; et al.	2016-09-22
Mask Set, Fabrication Method Of Mask Set, Manufacturing Method Of Semiconductor Device, And Recording Medium App 20160266484 - Furubayashi; Ai ; et al.	2016-09-15
Exposure Apparatus, Exposure Method, And Manufacturing Method Of Device App 20160266500 - KOMINE; Nobuhiro	2016-09-15
Adjusting method of pattern transferring plate, laser application machine and pattern transferring plate Grant 9,429,849 - Sato , et al. August 30, 2	2016-08-30
Positional Deviation Measuring Device, Non-transitory Computer-readable Recording Medium Containing A Positional Deviation Measuring Program, And Method Of Manufacturing Semiconductor Device App 20160245645 - SATO; Hidenori ; et al.	2016-08-25
Substrate Holding Device And Semiconductor Device Manufacturing Method App 20160225650 - KOMINE; Nobuhiro ; et al.	2016-08-04
Reticle mark arrangement method and nontransitory computer readable medium storing a reticle mark arrangement program Grant 9,396,299 - Nakagawa , et al. July 19, 2	2016-07-19
Light exposure condition analysis method, nontransitory computer readable medium storing a light exposure condition analysis program, and manufacturing method for a semiconductor device Grant 9,368,413 - Komine , et al. June 14, 2	2016-06-14
Overlay displacement amount measuring method, positional displacement amount measuring method and positional displacement amount measuring apparatus Grant 9,354,527 - Sato , et al. May 31, 2	2016-05-31
Pattern formation method and pattern formation apparatus Grant 9,260,300 - Matsunaga , et al. February 16, 2	2016-02-16
Mark, Semiconductor Device, And Semiconductor Wafer App 20160043037 - NAKAGAWA; Shinichi ; et al.	2016-02-11
Pattern Forming Method And Method Of Manufacturing Semiconductor Device App 20160020099 - SEGAWA; Kazuhiro ; et al.	2016-01-21
Mask Processing Apparatus, Mask Processing Method And Recording Medium App 20160018730 - Sato; Hidenori ; et al.	2016-01-21
Exposure apparatus and transfer characteristics measuring method Grant 9,239,526 - Sato , et al. January 19, 2	2016-01-19
Light Exposure Condition Analysis Method, Nontransitory Computer Readable Medium Storing A Light Exposure Condition Analysis Program, And Manufacturing Method For A Semiconductor Device App 20160005661 - KOMINE; Nobuhiro ; et al.	2016-01-07
Reticle Mark Arrangement Method And Nontransitory Computer Readable Medium Storing A Reticle Mark Arrangement Program App 20150339423 - Nakagawa; Shinichi ; et al.	2015-11-26
Imprint Device And Pattern Forming Method App 20150251350 - OKAMOTO; Yosuke ; et al.	2015-09-10
Adjusting Method Of Pattern Transferring Plate, Laser Application Machine And Pattern Transferring Plate App 20150253676 - SATO; Hidenori ; et al.	2015-09-10
Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device Grant 9,128,388 - Komine September 8, 2	2015-09-08
Deflection Measuring Device And Deflection Measuring Method App 20150233706 - SATO; Hidenori ; et al.	2015-08-20
Method for controlling exposure apparatus and exposure apparatus Grant 9,104,115 - Komine August 11, 2	2015-08-11
Pattern Shape Adjustment Method, Pattern Shape Adjustment System, Exposure Apparatus, And Recording Medium App 20150183059 - Komine; Nobuhiro ; et al.	2015-07-02
Measurement mark, method for measurement, and measurement apparatus Grant 8,976,356 - Komine , et al. March 10, 2	2015-03-10
Overlay Displacement Amount Measuring Method, Positionaldisplacement Amount Measuring Method And Positional Displacement Amount Measuring Apparatus App 20150036717 - SATO; Hidenori ; et al.	2015-02-05
Exposure Apparatus And Transfer Characteristics Measuring Method App 20150022791 - Sato; Hidenori ; et al.	2015-01-22
Mask Distortion Measuring Apparatus And Method Of Measuring Mask Distortion App 20150009488 - OKAMOTO; Yosuke ; et al.	2015-01-08
Reflective mask Grant 8,928,871 - Suzuki , et al. January 6, 2	2015-01-06
Method Of Focus Measurement, Exposure Apparatus, And Method Of Manufacturing Semiconductor Device App 20140370719 - KOMINE; Nobuhiro	2014-12-18
Imprint apparatus, imprint method, and manufacturing method of semiconductor device Grant 8,907,346 - Koshiba , et al. December 9, 2	2014-12-09
Exposure System And Exposure Method App 20140285787 - YONEDA; Eiji ; et al.	2014-09-25
Measurement Mark, Method For Measurement, And Measurement Apparatus App 20140240704 - KOMINE; Nobuhiro ; et al.	2014-08-28
Electrostatic Chuck, Reticle, And Electrostatic Chuck Method App 20140240892 - OKAMOTO; Yosuke ; et al.	2014-08-28
Pattern Formation Method And Pattern Formation Apparatus App 20140213058 - Matsunaga; Kentaro ; et al.	2014-07-31
Imprint Apparatus, Imprint Method, And Manufacturing Method Of Semiconductor Device App 20140065735 - Koshiba; Takeshi ; et al.	2014-03-06
Patterning Method And Template App 20140061969 - OKAMOTO; Yosuke ; et al.	2014-03-06
Method For Controlling Exposure Apparatus And Exposure Apparatus App 20140063479 - KOMINE; Nobuhiro	2014-03-06
Flare Measuring Method, Reflective Mask, And Exposure Apparatus App 20130208252 - SUZUKI; Masaru ; et al.	2013-08-15
Exposure apparatus inspection mask and exposure apparatus inspection method Grant 8,343,692 - Komine , et al. January 1, 2	2013-01-01
Exposure Apparatus Inspection Mask and Exposure Apparatus Inspection Method App 20110300472 - KOMINE; Nobuhiro ; et al.	2011-12-08
Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device Grant 7,906,258 - Komine , et al. March 15, 2	2011-03-15
Exposure processing system, exposure processing method and method for manufacturing a semiconductor device Grant 7,630,052 - Kono , et al. December 8, 2	2009-12-08
Photomask, Photomask Superimposition Correcting Method, And Manufacturing Method Of Semiconductor Device App 20080225254 - KOMINE; Nobuhiro ; et al.	2008-09-18
Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device Grant 7,164,960 - Komine , et al. January 16, 2	2007-01-16
Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device Grant 7,092,068 - Komine August 15, 2	2006-08-15
Exposure processing system, exposure processing method and method for manufacturing a semiconductor device App 20050170262 - Kono, Takuya ; et al.	2005-08-04
Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device App 20050125178 - Komine, Nobuhiro ; et al.	2005-06-09
Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device App 20050105068 - Komine, Nobuhiro	2005-05-19
Exposure method and method of manufacturing semiconductor device Grant 6,872,508 - Komine , et al. March 29, 2	2005-03-29
Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit Grant 6,866,976 - Asano , et al. March 15, 2	2005-03-15
Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit App 20030215724 - Asano, Masafumi ; et al.	2003-11-20
Exposure method and method of manufacturing semiconductor device App 20030016341 - Komine, Nobuhiro ; et al.	2003-01-23

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