loadpatents
name:-0.0069808959960938
name:-0.0065679550170898
name:-0.0021638870239258
Koli; Dinesh Patent Filings

Koli; Dinesh

Patent Applications and Registrations

Patent applications and USPTO patent grants for Koli; Dinesh.The latest application filed is for "corrosion and/or etch protection layer for contacts and interconnect metallization integration".

Company Profile
1.4.6
  • Koli; Dinesh - Mechanicville NY
  • Koli; Dinesh - Clifton Park NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Advanced structure for self-aligned contact and method for producing the same
Grant 10,211,103 - Huang , et al. Feb
2019-02-19
Corrosion and/or etch protection layer for contacts and interconnect metallization integration
Grant 10,020,260 - Ahmed , et al. July 10, 2
2018-07-10
Corrosion And/or Etch Protection Layer For Contacts And Interconnect Metallization Integration
App 20180182708 - AHMED; Shafaat ;   et al.
2018-06-28
Gate Structures
App 20180130891 - HAN; Ja-Hyung ;   et al.
2018-05-10
Automatic Control Of Spray Bar And Units For Chemical Mechanical Polishing In-situ Brush Cleaning
App 20170053794 - KIM; Hong Jin ;   et al.
2017-02-23
Methods of forming integrated circuits with a planarized permanent layer and methods for forming FinFET devices with a planarized permanent layer
Grant 9,299,584 - Koli , et al. March 29, 2
2016-03-29
Methods Of Forming Integrated Circuits With A Planarized Permanet Layer And Methods For Forming Finfet Devices With A Planarized Permanent Layer
App 20150380269 - Koli; Dinesh ;   et al.
2015-12-31
Common fill of gate and source and drain contacts
Grant 9,136,131 - Konduparthi , et al. September 15, 2
2015-09-15
Planarization Scheme For Finfet Gate Height Uniformity Control
App 20150200111 - Muralidharan; Sruthi ;   et al.
2015-07-16
Common Fill Of Gate And Source And Drain Contacts
App 20150123216 - KONDUPARTHI; Deepasree ;   et al.
2015-05-07

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