Koike; Kesahiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Koike; Kesahiro.The latest application filed is for "transparent substrate for mask blank and mask blank".

Company Profile

0.7.8

Koike; Kesahiro - Tokyo JP
Koike; Kesahiro - Ohizumi-mura JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grains Grant 7,732,101 - Koike , et al. June 8, 2	2010-06-08
Method of producing a glass substrate for a mask blank and method of producing a mask blank Grant 7,691,279 - Koike April 6, 2	2010-04-06
Transparent substrate for mask blank and mask blank Grant 7,635,544 - Koike , et al. December 22, 2	2009-12-22
Transparent Substrate For Mask Blank And Mask Blank App 20090280415 - KOIKE; KESAHIRO ; et al.	2009-11-12
Method Of Producing A Glass Substrate For A Mask Blank, Method Of Producing A Mask Blank, And Method Of Producing A Transfer Mask App 20090011681 - Koike; Kesahiro ; et al.	2009-01-08
Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus Grant 7,455,785 - Koike , et al. November 25, 2	2008-11-25
Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask Grant 7,413,832 - Koike , et al. August 19, 2	2008-08-19
Transparent substrate for mask blank and mask blank App 20060057474 - Koike; Kesahiro ; et al.	2006-03-16
Method Of Determining A Flatness Of An Electronic Device Substrate, Method Of Producing The Substrate, Method Of Producing A Mask Blank, Method Of Producing A Transfer Mask, Polishing Method, Electronic Device Substrate, Mask Blank, Transfer Mask, And Polishing Apparatus Grant 6,951,502 - Koike , et al. October 4, 2	2005-10-04
Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus App 20050186691 - Koike, Kesahiro ; et al.	2005-08-25
Method of producing a glass substrate for a mask blank and method of producing a mask blank App 20040192171 - Koike, Kesahiro	2004-09-30
Method of producing a glass substrate for a mask blank and method of producing a mask blank App 20040192063 - Koike, Kesahiro	2004-09-30
Method of producing a glass substrate for a mask blank, method of producing a mask blank, method of producing a transfer mask, method of producing a semiconductor device, glass substrate for a mask blank, mask blank, and transfer mask App 20040035153 - Koike, Kesahiro ; et al.	2004-02-26
Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus App 20030186624 - Koike, Kesahiro ; et al.	2003-10-02
X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide film Grant 6,127,068 - Shoki , et al. October 3, 2	2000-10-03

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