loadpatents
name:-0.034547090530396
name:-0.022175073623657
name:-0.0035409927368164
Kohno; Masayuki Patent Filings

Kohno; Masayuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kohno; Masayuki.The latest application filed is for "plasma processing apparatus".

Company Profile
3.21.28
  • Kohno; Masayuki - Austin TX
  • Kohno; Masayuki - Miyagi JP
  • KOHNO; Masayuki - Hopewell Junction NY
  • Kohno; Masayuki - Kyoto JP
  • Kohno; Masayuki - Kurokawa-gun JP
  • Kohno; Masayuki - Amagasaki JP
  • Kohno; Masayuki - Kyoto-shi JP
  • Kohno; Masayuki - Amagasaki-shi JP
  • Kohno; Masayuki - Nirasaki JP
  • Kohno; Masayuki - Nirasaki City JP
  • Kohno; Masayuki - Hyogo JP
  • Kohno; Masayuki - Nirasaki-shi JP
  • Kohno; Masayuki - Hyogo-Ken JP
  • Kohno; Masayuki - Amagasaki City JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma processing apparatus
Grant 10,504,698 - Kohno , et al. Dec
2019-12-10
Plasma processing apparatus
Grant 10,312,057 - Kohno , et al.
2019-06-04
Plasma etching method
Grant 9,412,607 - Kamada , et al. August 9, 2
2016-08-09
Plasma Processing Apparatus
App 20160126114 - KOHNO; Masayuki ;   et al.
2016-05-05
Plasma Processing Apparatus
App 20160118224 - KOHNO; Masayuki ;   et al.
2016-04-28
Temperature Measuring Method And Plasma Processing System
App 20150221482 - YOSHIDA; Yusuke ;   et al.
2015-08-06
Selective anticancer chimeric peptides which bind neuropilin receptor
Grant 8,940,863 - Kawakami , et al. January 27, 2
2015-01-27
Selective anticancer chimeric peptides which bind transferrin receptor
Grant 8,940,862 - Kawakami , et al. January 27, 2
2015-01-27
Plasma Etching Method
App 20140332372 - Kamada; Tomiko ;   et al.
2014-11-13
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,569,186 - Kohno , et al. October 29, 2
2013-10-29
Selective Anticancer Chimeric Peptide
App 20130274200 - Kawakami; Koji ;   et al.
2013-10-17
Selective Anticancer Chimeric Peptide
App 20130274201 - Kawakami; Koji ;   et al.
2013-10-17
Hsp9O-targeted anti-cancer chimeric peptide
Grant 8,546,320 - Kawakami , et al. October 1, 2
2013-10-01
Selective anticancer chimeric peptide comprising an EGF receptor-binding peptide and a cytotoxic peptide
Grant 8,436,137 - Kawakami , et al. May 7, 2
2013-05-07
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20130072033 - Kohno; Masayuki ;   et al.
2013-03-21
Plasma cleaning method and plasma CVD method
Grant 8,366,953 - Kohno , et al. February 5, 2
2013-02-05
Crystalline Silicon Film Forming Method And Plasma Cvd Apparatus
App 20120315745 - Katayama; Daisuke ;   et al.
2012-12-13
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,329,596 - Kohno , et al. December 11, 2
2012-12-11
Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus
Grant 8,318,614 - Kohno , et al. November 27, 2
2012-11-27
MOS semiconductor memory device having charge storage region formed from stack of insulating films
Grant 8,258,571 - Endoh , et al. September 4, 2
2012-09-04
Method Of Forming Silicon Nitride Film And Method Of Manufacturing Semiconductor Memory Device
App 20120208376 - Honda; Minoru ;   et al.
2012-08-16
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20120178268 - KOHNO; Masayuki ;   et al.
2012-07-12
Silicon Nitride Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20120153442 - Honda; Minoru ;   et al.
2012-06-21
Silicon Dioxide Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20120126376 - Honda; Minoru ;   et al.
2012-05-24
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,138,103 - Kohno , et al. March 20, 2
2012-03-20
Forming a MOS memory device having a dielectric film laminate as a charge accumulation region
Grant 8,124,484 - Endoh , et al. February 28, 2
2012-02-28
Forming a silicon nitride film by plasma CVD
Grant 8,119,545 - Honda , et al. February 21, 2
2012-02-21
Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus
Grant 8,114,790 - Kohno , et al. February 14, 2
2012-02-14
Novel Hsp90-targeted Anti-cancer Chimeric Peptide
App 20120003299 - Kawakami; Koji ;   et al.
2012-01-05
Selective Anticancer Chimeric Peptide
App 20110319336 - Kawakami; Koji ;   et al.
2011-12-29
Method For Depositing Silicon Nitride Film, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110254078 - HONDA; Minoru ;   et al.
2011-10-20
Silicon Oxide Film, Method For Forming Silicon Oxide Film, And Plasma Cvd Apparatus
App 20110206590 - Honda; Minoru ;   et al.
2011-08-25
Silicon Oxynitride Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110189862 - Honda; Minoru ;   et al.
2011-08-04
Method For Manufacturing A Mos Semiconductor Memory Device, And Plasma Cvd Device
App 20110086485 - Endoh; Tetsuo ;   et al.
2011-04-14
Process For Producing Silicon Nitride Film, Process For Producing Silicon Nitride Film Laminate, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110086517 - Honda; Minoru ;   et al.
2011-04-14
Mos Semiconductor Memory Device
App 20100283097 - Endoh; Tetsuo ;   et al.
2010-11-11
Plasma processing method and film forming method
Grant 7,771,796 - Kohno , et al. August 10, 2
2010-08-10
RLSA CVD deposition control using halogen gas for hydrogen scavenging
Grant 7,763,551 - Brcka , et al. July 27, 2
2010-07-27
Silicon Nitride Film And Nonvolatile Semiconductor Memory Device
App 20100140683 - Miyazaki; Seiichi ;   et al.
2010-06-10
Method For Forming Silicon Nitride Film, Method For Manufacturing Nonvolatile Semiconductor Memory Device, Nonvolatile Semiconductor Memory Device And Plasma Apparatus
App 20100052040 - Kohno; Masayuki ;   et al.
2010-03-04
Plasma Cleaning Method And Plasma Cvd Method
App 20090308840 - Kohno; Masayuki ;   et al.
2009-12-17
Rlsa Cvd Deposition Control Using Halogen Gas For Hydrogen Scavenging
App 20090241310 - Brcka; Jozef ;   et al.
2009-10-01
Plasma Cvd Method, Method For Forming Silicon Nitride Film, Method For Manufacturing Semiconductor Device And Plasma Cvd Method
App 20090203228 - Kohno; Masayuki ;   et al.
2009-08-13
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20090197376 - Kohno; Masayuki ;   et al.
2009-08-06
Plasma processing method and film forming method
App 20060099799 - Kohno; Masayuki ;   et al.
2006-05-11

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