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name:-0.020109891891479
name:-0.013059139251709
name:-0.0014638900756836
KOH; Wonyong Patent Filings

KOH; Wonyong

Patent Applications and Registrations

Patent applications and USPTO patent grants for KOH; Wonyong.The latest application filed is for "aluminum compounds and methods of forming aluminum- containing film using the same".

Company Profile
1.10.17
  • KOH; Wonyong - Daejeon KR
  • Koh; Wonyong - Daejoen KR
  • Koh; Wonyong - Yuseong-gu KR
  • Koh; Wonyong - Hachioji JP
  • Koh; Wonyong - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Aluminum Compounds And Methods Of Forming Aluminum- Containing Film Using The Same
App 20210147450 - HAN; Won Seok ;   et al.
2021-05-20
Group 4 Metal Element-containing Compounds, Method Of Preparing The Same, Precursor Compositions Including The Same For Forming A Film, And Method Of Forming A Film Using The Same
App 20200361969 - HAN; Won Seok ;   et al.
2020-11-19
Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition
Grant 10,763,001 - Han , et al. Sep
2020-09-01
Group 4 metal element-containing alkoxy compound, preparing method thereof, precursor composition including the same for film deposition, and method of depositing film using the same
Grant 10,131,680 - Han , et al. November 20, 2
2018-11-20
Liquid Precursor Compositions, Preparation Methods Thereof, And Methods For Forming Layer Using The Composition
App 20180286529 - HAN; Won Seok ;   et al.
2018-10-04
Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition
Grant 10,014,089 - Han , et al. July 3, 2
2018-07-03
Group 4 metal element-containing compound, method of preparing the same, precursor composition including the same for depositing film, and method of depositing film using the same
Grant 10,005,795 - Han , et al. June 26, 2
2018-06-26
Group 4 Metal Element-containing Compound, Method Of Preparing The Same, Precursor Composition Including The Same For Depositing Film, And Method Of Depositing Film Using The Same
App 20180162882 - HAN; Won Seok ;   et al.
2018-06-14
Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same
Grant 9,957,614 - Han , et al. May 1, 2
2018-05-01
Novel Ruthenium Compound, Preparation Method Therefor, Precursor Composition For Film Deposition Containing Same, And Method For Depositing Film By Using Same
App 20170226638 - Han; Won Seok ;   et al.
2017-08-10
Indium-containing Film And Composition For Forming The Same
App 20160326008 - Koh; Wonyong ;   et al.
2016-11-10
Liquid Precursor Compositions, Preparation Methods Thereof, And Methods For Forming Layer Using The Composition
App 20160314980 - HAN; Won Seok ;   et al.
2016-10-27
Indium-containing oxide film and preparing method thereof
Grant 9,431,144 - Koh , et al. August 30, 2
2016-08-30
Aluminum precursor composition
Grant 9,255,324 - Koh , et al. February 9, 2
2016-02-09
Indium-containing Oxide Film And Preparing Method Thereof
App 20140335363 - Koh; Wonyong ;   et al.
2014-11-13
Aluminum Precursor Composition
App 20140050848 - Koh; Wonyong ;   et al.
2014-02-20
Atomic layer deposition apparatus
Grant 8,215,264 - Hong , et al. July 10, 2
2012-07-10
Atomic Layer Deposition Apparatus
App 20110308460 - Hong; Kyung Il ;   et al.
2011-12-22
Atomic layer deposition apparatus
Grant 7,976,898 - Hong , et al. July 12, 2
2011-07-12
Selective formation of metal layers in an integrated circuit
Grant 7,476,618 - Kilpela , et al. January 13, 2
2009-01-13
Methods Of Depositing A Ruthenium Film
App 20080171436 - Koh; Wonyong ;   et al.
2008-07-17
Ald Apparatus And Method For Depositing Multiple Layers Using The Same
App 20080075858 - Koh; Wonyong
2008-03-27
Atomic Layer Deposition Apparatus
App 20080069955 - Hong; Kyung Il ;   et al.
2008-03-20
Method and apparatus of time and space co-divided atomic layer deposition
App 20070215036 - Park; Hyung-Sang ;   et al.
2007-09-20
Semiconductor-processing Apparatus With Rotating Susceptor
App 20070218702 - SHIMIZU; Akira ;   et al.
2007-09-20
Semiconductor-processing apparatus with rotating susceptor
App 20070218701 - Shimizu; Akira ;   et al.
2007-09-20
Selective formation of metal layers in an integrated circuit
App 20060121733 - Kilpela; Olli V. ;   et al.
2006-06-08

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