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Overlay mark dependent dummy fill to mitigate gate height variation Grant 9,368,453 - Ning , et al. June 14, 2 | 2016-06-14 |
Overlay Mark Dependent Dummy Fill To Mitigate Gate Height Variation App 20160079180 - NING; Guoxiang ;   et al. | 2016-03-17 |
Overlay mark dependent dummy fill to mitigate gate height variation Grant 9,252,061 - Ning , et al. February 2, 2 | 2016-02-02 |
Overlay Mark Dependent Dummy Fill To Mitigate Gate Height Variation App 20150287651 - NING; Guoxiang ;   et al. | 2015-10-08 |
Methods for fabricating integrated circuits with improved patterning schemes Grant 8,940,641 - Hu , et al. January 27, 2 | 2015-01-27 |
Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masks Grant 8,911,920 - Raghunathan , et al. December 16, 2 | 2014-12-16 |
Methods For Fabricating Euv Masks And Methods For Fabricating Integrated Circuits Using Such Euv Masks App 20140272677 - Raghunathan; Sudharshanan ;   et al. | 2014-09-18 |
Spacer-less low-K dielectric processes Grant 8,624,329 - Lee , et al. January 7, 2 | 2014-01-07 |
Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS Grant 7,999,325 - Teh , et al. August 16, 2 | 2011-08-16 |
Method for reducing silicide defects in integrated circuits Grant 7,960,283 - Ye , et al. June 14, 2 | 2011-06-14 |
Integrated circuit system employing sacrificial spacers Grant 7,892,900 - Liu , et al. February 22, 2 | 2011-02-22 |
Method For Reducing Silicide Defects In Integrated Circuits App 20100267236 - YE; Jianhui ;   et al. | 2010-10-21 |
Method for reducing silicide defects in integrated circuits Grant 7,745,320 - Ye , et al. June 29, 2 | 2010-06-29 |
Spacer-less Low-K Dielectric Processes App 20100059831 - Lee; Yong Meng ;   et al. | 2010-03-11 |
Method For Reducing Silicide Defects In Integrated Circuits App 20090289309 - YE; Jianhui ;   et al. | 2009-11-26 |
Spacer-less low-k dielectric processes Grant 7,615,427 - Lee , et al. November 10, 2 | 2009-11-10 |
Integrated Circuit System Employing Sacrificial Spacers App 20090250762 - Liu; Huang ;   et al. | 2009-10-08 |
Integrated Circuit System Employing Feed-forward Control App 20090179307 - Zhou; Wenzhan ;   et al. | 2009-07-16 |
Method To Remove Spacer After Salicidation To Enhance Contact Etch Stop Liner Stress On Mos App 20090026549 - TEH; Young Way ;   et al. | 2009-01-29 |
Semiconductor System Having Complementary Strained Channels App 20080315317 - Lai; Chung Woh ;   et al. | 2008-12-25 |
Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS Grant 7,445,978 - Teh , et al. November 4, 2 | 2008-11-04 |
Spacer-less low-k dielectric processes App 20070281410 - Lee; Yong Meng ;   et al. | 2007-12-06 |
Composite stress spacer Grant 7,256,084 - Lim , et al. August 14, 2 | 2007-08-14 |
Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS App 20060249794 - Teh; Young Way ;   et al. | 2006-11-09 |
Composite stress spacer App 20060252194 - Lim; Khee Yong ;   et al. | 2006-11-09 |