Kogure; Osamu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kogure; Osamu.The latest application filed is for "photosensitive resin composition and process for forming photo-resist pattern using the same".
- Kogure; Osamu - Mito JP
| Patent | Date |
|---|---|
| Photosensitive resin composition and process for forming photo-resist pattern using the same Grant 4,702,990 - Tanaka , et al. October 27, 1 | 1987-10-27 |
| Pattern forming material and method for forming pattern therewith Grant 4,507,384 - Morita , et al. March 26, 1 | 1985-03-26 |
| Method for forming micropattern Grant 4,426,247 - Tamamura , et al. January 17, 1 | 1984-01-17 |
| Apparatus and method for writing storable images into a matrix-addressed image-storing liquid crystal display device Grant 3,936,815 - Kogure , et al. February 3, 1 | 1976-02-03 |
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