loadpatents
name:-0.29183912277222
name:-0.062174081802368
name:-0.010518074035645
Kofuji; Naoyuki Patent Filings

Kofuji; Naoyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kofuji; Naoyuki.The latest application filed is for "dry etching apparatus and dry etching method".

Company Profile
10.31.46
  • Kofuji; Naoyuki - Tokyo JP
  • Kofuji; Naoyuki - Tama JP
  • Kofuji; Naoyuki - Niiza-shi JP
  • Kofuji; Naoyuki - Naka-1-chome Kunitachi-shi JP
  • Kofuji; Naoyuki - Kunitachi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma processing apparatus
Grant 11,398,371 - Kofuji , et al. July 26, 2
2022-07-26
Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method
Grant 11,287,782 - Ohmori , et al. March 29, 2
2022-03-29
Search device, search method and plasma processing apparatus
Grant 11,189,470 - Ohmori , et al. November 30, 2
2021-11-30
Dry Etching Apparatus And Dry Etching Method
App 20210335625 - KOFUJI; Naoyuki ;   et al.
2021-10-28
Substitute sample, method for determining control parameter of processing, and measurement system
Grant 11,152,237 - Nakada , et al. October 19, 2
2021-10-19
Plasma Processing Method
App 20200328099 - KOBAYASHI; Hiroyuki ;   et al.
2020-10-15
Substitute Sample, Method for Determining Control Parameter of Processing, and Measurement System
App 20200273732 - NAKADA; Hyakka ;   et al.
2020-08-27
Search Device, Search Method And Plasma Processing Apparatus
App 20190295827 - OHMORI; Takeshi ;   et al.
2019-09-26
Plasma Processing Apparatus
App 20190295823 - KOFUJI; Naoyuki ;   et al.
2019-09-26
Plasma etching method
Grant 10,418,224 - Kofuji , et al. Sept
2019-09-17
Etching method and etching apparatus
Grant 10,418,254 - Shinoda , et al. Sept
2019-09-17
Optical element, manufacturing method of optical element, and optical device
Grant 10,310,321 - Hirata , et al.
2019-06-04
Etching Method And Etching Apparatus
App 20190067032 - SHINODA; Kazunori ;   et al.
2019-02-28
Computer, Method for Determining Processing Control Parameter, Substitute Sample, Measurement System, and Measurement Method
App 20190064755 - OHMORI; Takeshi ;   et al.
2019-02-28
Plasma Etching Method
App 20180233329 - KOFUJI; Naoyuki ;   et al.
2018-08-16
Plasma processing method and plasma processing apparatus
Grant 9,997,337 - Mori , et al. June 12, 2
2018-06-12
Plasma Processing Apparatus
App 20180122665 - KOBAYASHI; Hiroyuki ;   et al.
2018-05-03
Plasma etching method
Grant 9,960,014 - Kofuji , et al. May 1, 2
2018-05-01
Optical element and optical device
Grant 9,933,553 - Hirata , et al. April 3, 2
2018-04-03
Plasma Processing Device And Plasma Processing Method Using Same
App 20180047595 - KOFUJI; Naoyuki ;   et al.
2018-02-15
Plasma Etching Method
App 20170084430 - KOFUJI; Naoyuki ;   et al.
2017-03-23
Sample Cleaning Apparatus And Sample Cleaning Method
App 20160079055 - KOFUJI; Naoyuki ;   et al.
2016-03-17
Plasma Processing Method And Plasma Processing Apparatus
App 20150348763 - MORI; Masahito ;   et al.
2015-12-03
Optical Element, Manufacturing Method Of Optical Element, And Optical Device
App 20150234230 - Hirata; Koji ;   et al.
2015-08-20
Optical Element And Optical Device
App 20150226896 - Hirata; Koji ;   et al.
2015-08-13
Semiconductor device manufacturing method
Grant 9,099,349 - Kofuji , et al. August 4, 2
2015-08-04
Plasma processing method and plasma processing apparatus
Grant 9,076,637 - Mori , et al. July 7, 2
2015-07-07
Method of manufacturing semiconductor device
Grant 8,791,027 - Kofuji , et al. July 29, 2
2014-07-29
Semiconductor Device Manufacturing Method
App 20140175534 - KOFUJI; Naoyuki ;   et al.
2014-06-26
Plasma Processing Method And Plasma Processing Apparatus
App 20140116621 - MORI; Masahito ;   et al.
2014-05-01
Plasma processing method and plasma processing apparatus
Grant 8,546,266 - Mori , et al. October 1, 2
2013-10-01
Plasma Etching Apparatus
App 20130087285 - Kofuji; Naoyuki ;   et al.
2013-04-11
Plasma processing method and plasma processing apparatus
Grant 8,129,283 - Mori , et al. March 6, 2
2012-03-06
Control method of a temperature of a sample
Grant 8,093,529 - Kofuji , et al. January 10, 2
2012-01-10
Plasma Processing Method And Plasma Processing Apparatus
App 20110297533 - MORI; Masahito ;   et al.
2011-12-08
Plasma Processing Apparatus And Plasma Processing Method
App 20110253672 - Kamibayashi; Masami ;   et al.
2011-10-20
Method Of Manufacturing Semiconductor Device
App 20100311246 - KOFUJI; Naoyuki ;   et al.
2010-12-09
Plasma Etching Apparatus And Plasma Etching Method
App 20100167426 - Kofuji; Naoyuki ;   et al.
2010-07-01
Pressure control device for low pressure processing chamber
Grant 7,680,563 - Kofuji , et al. March 16, 2
2010-03-16
Sample Temperature Control Method
App 20090310645 - Kofuji; Naoyuki ;   et al.
2009-12-17
Plasma processing apparatus
Grant 7,604,709 - Kurihara , et al. October 20, 2
2009-10-20
Semiconductor Device Manufacturing Method And Semiconductor Device Manufacturing Apparatus
App 20090098669 - Kofuji; Naoyuki
2009-04-16
Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
Grant 7,479,459 - Kofuji January 20, 2
2009-01-20
Plasma processing method and plasma processing apparatus
App 20080190893 - Mori; Masahito ;   et al.
2008-08-14
Pressure Control Device for Low Pressure Processing Chamber
App 20080183340 - KOFUJI; Naoyuki ;   et al.
2008-07-31
Plasma etching apparatus and plasma etching method
Grant 7,396,771 - Miya , et al. July 8, 2
2008-07-08
Control Method for plasma etching apparatus
App 20080154422 - KOFUJI; Naoyuki ;   et al.
2008-06-26
Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film
Grant 7,371,692 - Kofuji May 13, 2
2008-05-13
Plasma Etching Apparatus And Plasma Etching Method
App 20080078505 - Kofuji; Naoyuki ;   et al.
2008-04-03
Semiconductor Fabrication Method and Etching System
App 20070232067 - Hirota; Kousa ;   et al.
2007-10-04
Apparatus and method for plasma etching
App 20070199657 - Kofuji; Naoyuki ;   et al.
2007-08-30
Plasma etching apparatus and plasma etching method
App 20070056929 - Miya; Go ;   et al.
2007-03-15
Surface processing method of a specimen and surface processing apparatus of the specimen
Grant 7,049,243 - Ono , et al. May 23, 2
2006-05-23
Dry etching apparatus and a method of manufacturing a semiconductor device
App 20060096706 - Kofuji; Naoyuki ;   et al.
2006-05-11
Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
App 20060076315 - Kofuji; Naoyuki
2006-04-13
Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film
App 20050227470 - Kofuji, Naoyuki
2005-10-13
Surface processing method of a specimen and surface processing apparatus of the specimen
App 20040259361 - Ono, Tetsuo ;   et al.
2004-12-23
Plasma treatment apparatus and method of producing semiconductor device using the apparatus
Grant 6,797,112 - Itabashi , et al. September 28, 2
2004-09-28
Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copper
Grant 6,784,109 - Kofuji , et al. August 31, 2
2004-08-31
Dry etching method
App 20040058554 - Izawa, Masaru ;   et al.
2004-03-25
Plasma processing apparatus
App 20040026040 - Kurihara, Masaru ;   et al.
2004-02-12
Specimen surface processing method
Grant 6,677,244 - Ono , et al. January 13, 2
2004-01-13
Plasma treatment apparatus and method of producing semiconductor device using the apparatus
App 20030203641 - Itabashi, Naoshi ;   et al.
2003-10-30
Method and apparatus for fabricating semiconductor devices
App 20030008509 - Kofuji, Naoyuki ;   et al.
2003-01-09
Plasma treatment apparatus and method of producing semiconductor device using the apparatus
App 20020129904 - Itabashi, Naoshi ;   et al.
2002-09-19
Method for manufacturing a semiconductor device
App 20020125206 - Kofuji, Naoyuki ;   et al.
2002-09-12
Plasma processing method
App 20020123229 - Ono, Tetsuo ;   et al.
2002-09-05
Dry Etching Apparatus And A Method Of Manufacturing A Semiconductor Device
App 20020084034 - KOFUJI, NAOYUKI ;   et al.
2002-07-04
Surface treatment method and system
Grant 6,332,425 - Kofuji , et al. December 25, 2
2001-12-25
Surface treatment method and system
Grant 6,231,777 - Kofuji , et al. May 15, 2
2001-05-15

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