loadpatents
Patent applications and USPTO patent grants for Kofuji; Naoyuki.The latest application filed is for "dry etching apparatus and dry etching method".
Patent | Date |
---|---|
Plasma processing apparatus Grant 11,398,371 - Kofuji , et al. July 26, 2 | 2022-07-26 |
Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method Grant 11,287,782 - Ohmori , et al. March 29, 2 | 2022-03-29 |
Search device, search method and plasma processing apparatus Grant 11,189,470 - Ohmori , et al. November 30, 2 | 2021-11-30 |
Dry Etching Apparatus And Dry Etching Method App 20210335625 - KOFUJI; Naoyuki ;   et al. | 2021-10-28 |
Substitute sample, method for determining control parameter of processing, and measurement system Grant 11,152,237 - Nakada , et al. October 19, 2 | 2021-10-19 |
Plasma Processing Method App 20200328099 - KOBAYASHI; Hiroyuki ;   et al. | 2020-10-15 |
Substitute Sample, Method for Determining Control Parameter of Processing, and Measurement System App 20200273732 - NAKADA; Hyakka ;   et al. | 2020-08-27 |
Search Device, Search Method And Plasma Processing Apparatus App 20190295827 - OHMORI; Takeshi ;   et al. | 2019-09-26 |
Plasma Processing Apparatus App 20190295823 - KOFUJI; Naoyuki ;   et al. | 2019-09-26 |
Plasma etching method Grant 10,418,224 - Kofuji , et al. Sept | 2019-09-17 |
Etching method and etching apparatus Grant 10,418,254 - Shinoda , et al. Sept | 2019-09-17 |
Optical element, manufacturing method of optical element, and optical device Grant 10,310,321 - Hirata , et al. | 2019-06-04 |
Etching Method And Etching Apparatus App 20190067032 - SHINODA; Kazunori ;   et al. | 2019-02-28 |
Computer, Method for Determining Processing Control Parameter, Substitute Sample, Measurement System, and Measurement Method App 20190064755 - OHMORI; Takeshi ;   et al. | 2019-02-28 |
Plasma Etching Method App 20180233329 - KOFUJI; Naoyuki ;   et al. | 2018-08-16 |
Plasma processing method and plasma processing apparatus Grant 9,997,337 - Mori , et al. June 12, 2 | 2018-06-12 |
Plasma Processing Apparatus App 20180122665 - KOBAYASHI; Hiroyuki ;   et al. | 2018-05-03 |
Plasma etching method Grant 9,960,014 - Kofuji , et al. May 1, 2 | 2018-05-01 |
Optical element and optical device Grant 9,933,553 - Hirata , et al. April 3, 2 | 2018-04-03 |
Plasma Processing Device And Plasma Processing Method Using Same App 20180047595 - KOFUJI; Naoyuki ;   et al. | 2018-02-15 |
Plasma Etching Method App 20170084430 - KOFUJI; Naoyuki ;   et al. | 2017-03-23 |
Sample Cleaning Apparatus And Sample Cleaning Method App 20160079055 - KOFUJI; Naoyuki ;   et al. | 2016-03-17 |
Plasma Processing Method And Plasma Processing Apparatus App 20150348763 - MORI; Masahito ;   et al. | 2015-12-03 |
Optical Element, Manufacturing Method Of Optical Element, And Optical Device App 20150234230 - Hirata; Koji ;   et al. | 2015-08-20 |
Optical Element And Optical Device App 20150226896 - Hirata; Koji ;   et al. | 2015-08-13 |
Semiconductor device manufacturing method Grant 9,099,349 - Kofuji , et al. August 4, 2 | 2015-08-04 |
Plasma processing method and plasma processing apparatus Grant 9,076,637 - Mori , et al. July 7, 2 | 2015-07-07 |
Method of manufacturing semiconductor device Grant 8,791,027 - Kofuji , et al. July 29, 2 | 2014-07-29 |
Semiconductor Device Manufacturing Method App 20140175534 - KOFUJI; Naoyuki ;   et al. | 2014-06-26 |
Plasma Processing Method And Plasma Processing Apparatus App 20140116621 - MORI; Masahito ;   et al. | 2014-05-01 |
Plasma processing method and plasma processing apparatus Grant 8,546,266 - Mori , et al. October 1, 2 | 2013-10-01 |
Plasma Etching Apparatus App 20130087285 - Kofuji; Naoyuki ;   et al. | 2013-04-11 |
Plasma processing method and plasma processing apparatus Grant 8,129,283 - Mori , et al. March 6, 2 | 2012-03-06 |
Control method of a temperature of a sample Grant 8,093,529 - Kofuji , et al. January 10, 2 | 2012-01-10 |
Plasma Processing Method And Plasma Processing Apparatus App 20110297533 - MORI; Masahito ;   et al. | 2011-12-08 |
Plasma Processing Apparatus And Plasma Processing Method App 20110253672 - Kamibayashi; Masami ;   et al. | 2011-10-20 |
Method Of Manufacturing Semiconductor Device App 20100311246 - KOFUJI; Naoyuki ;   et al. | 2010-12-09 |
Plasma Etching Apparatus And Plasma Etching Method App 20100167426 - Kofuji; Naoyuki ;   et al. | 2010-07-01 |
Pressure control device for low pressure processing chamber Grant 7,680,563 - Kofuji , et al. March 16, 2 | 2010-03-16 |
Sample Temperature Control Method App 20090310645 - Kofuji; Naoyuki ;   et al. | 2009-12-17 |
Plasma processing apparatus Grant 7,604,709 - Kurihara , et al. October 20, 2 | 2009-10-20 |
Semiconductor Device Manufacturing Method And Semiconductor Device Manufacturing Apparatus App 20090098669 - Kofuji; Naoyuki | 2009-04-16 |
Semiconductor device manufacturing method and semiconductor device manufacturing apparatus Grant 7,479,459 - Kofuji January 20, 2 | 2009-01-20 |
Plasma processing method and plasma processing apparatus App 20080190893 - Mori; Masahito ;   et al. | 2008-08-14 |
Pressure Control Device for Low Pressure Processing Chamber App 20080183340 - KOFUJI; Naoyuki ;   et al. | 2008-07-31 |
Plasma etching apparatus and plasma etching method Grant 7,396,771 - Miya , et al. July 8, 2 | 2008-07-08 |
Control Method for plasma etching apparatus App 20080154422 - KOFUJI; Naoyuki ;   et al. | 2008-06-26 |
Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film Grant 7,371,692 - Kofuji May 13, 2 | 2008-05-13 |
Plasma Etching Apparatus And Plasma Etching Method App 20080078505 - Kofuji; Naoyuki ;   et al. | 2008-04-03 |
Semiconductor Fabrication Method and Etching System App 20070232067 - Hirota; Kousa ;   et al. | 2007-10-04 |
Apparatus and method for plasma etching App 20070199657 - Kofuji; Naoyuki ;   et al. | 2007-08-30 |
Plasma etching apparatus and plasma etching method App 20070056929 - Miya; Go ;   et al. | 2007-03-15 |
Surface processing method of a specimen and surface processing apparatus of the specimen Grant 7,049,243 - Ono , et al. May 23, 2 | 2006-05-23 |
Dry etching apparatus and a method of manufacturing a semiconductor device App 20060096706 - Kofuji; Naoyuki ;   et al. | 2006-05-11 |
Semiconductor device manufacturing method and semiconductor device manufacturing apparatus App 20060076315 - Kofuji; Naoyuki | 2006-04-13 |
Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film App 20050227470 - Kofuji, Naoyuki | 2005-10-13 |
Surface processing method of a specimen and surface processing apparatus of the specimen App 20040259361 - Ono, Tetsuo ;   et al. | 2004-12-23 |
Plasma treatment apparatus and method of producing semiconductor device using the apparatus Grant 6,797,112 - Itabashi , et al. September 28, 2 | 2004-09-28 |
Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copper Grant 6,784,109 - Kofuji , et al. August 31, 2 | 2004-08-31 |
Dry etching method App 20040058554 - Izawa, Masaru ;   et al. | 2004-03-25 |
Plasma processing apparatus App 20040026040 - Kurihara, Masaru ;   et al. | 2004-02-12 |
Specimen surface processing method Grant 6,677,244 - Ono , et al. January 13, 2 | 2004-01-13 |
Plasma treatment apparatus and method of producing semiconductor device using the apparatus App 20030203641 - Itabashi, Naoshi ;   et al. | 2003-10-30 |
Method and apparatus for fabricating semiconductor devices App 20030008509 - Kofuji, Naoyuki ;   et al. | 2003-01-09 |
Plasma treatment apparatus and method of producing semiconductor device using the apparatus App 20020129904 - Itabashi, Naoshi ;   et al. | 2002-09-19 |
Method for manufacturing a semiconductor device App 20020125206 - Kofuji, Naoyuki ;   et al. | 2002-09-12 |
Plasma processing method App 20020123229 - Ono, Tetsuo ;   et al. | 2002-09-05 |
Dry Etching Apparatus And A Method Of Manufacturing A Semiconductor Device App 20020084034 - KOFUJI, NAOYUKI ;   et al. | 2002-07-04 |
Surface treatment method and system Grant 6,332,425 - Kofuji , et al. December 25, 2 | 2001-12-25 |
Surface treatment method and system Grant 6,231,777 - Kofuji , et al. May 15, 2 | 2001-05-15 |
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