| Patent | Date |
|---|
Exhaust Processing Method, Plasma Processing Method And Plasma Processing Apparatus
App 20070169890 - SHISHIDO; TAKESHI ; et al. | 2007-07-26 |
Exhaust processing method, plasma processing method and plasma processing apparatus
Grant 7,211,708 - Shishido , et al. May 1, 2 | 2007-05-01 |
Apparatus for forming deposited film
Grant 6,877,458 - Ozaki , et al. April 12, 2 | 2005-04-12 |
Apparatus and method for forming deposited film
Grant 6,846,521 - Shishido , et al. January 25, 2 | 2005-01-25 |
Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis
Grant 6,794,275 - Kondo , et al. September 21, 2 | 2004-09-21 |
Apparatus and method for forming deposited film
App 20040035361 - Shishido, Takeshi ; et al. | 2004-02-26 |
Methods of forming semiconductor element, and semiconductor elements
Grant 6,653,165 - Kondo , et al. November 25, 2 | 2003-11-25 |
Apparatus and method for forming deposited film
Grant 6,632,284 - Shishido , et al. October 14, 2 | 2003-10-14 |
Silicon film, semiconductor device, and process for forming silicon films
App 20030104664 - Kondo, Takaharu ; et al. | 2003-06-05 |
Process for producing a semiconductor device
Grant 6,495,392 - Sakai , et al. December 17, 2 | 2002-12-17 |
Process for producing a semiconductor device
App 20020016017 - Sakai, Akira ; et al. | 2002-02-07 |
Exhaust processing method, plasma processing method and plasma processing apparatus
App 20020006477 - Shishido, Takeshi ; et al. | 2002-01-17 |
Production process of semiconductor layer, fabrication process of photovoltaic cell and production apparatus of semiconductor layer
App 20020001924 - Fujioka, Yasushi ; et al. | 2002-01-03 |
Apparatus for forming deposited film
App 20010039924 - Ozaki, Hiroyuki ; et al. | 2001-11-15 |
Apparatus and method for forming a deposited film by means of plasma CVD
App 20010025601 - Yajima, Takahiro ; et al. | 2001-10-04 |
Apparatus and method for forming deposited film
App 20010022991 - Shishido, Takeshi ; et al. | 2001-09-20 |
Deposition of semiconductor layer by plasma process
Grant 6,287,943 - Fujioka , et al. September 11, 2 | 2001-09-11 |
Photovoltaic element and fabrication process thereof
Grant 5,720,826 - Hayashi , et al. February 24, 1 | 1998-02-24 |
Non-monocrystalline silicon carbide semiconductor and semiconductor device employing the same
Grant 5,510,631 - Saito , et al. April 23, 1 | 1996-04-23 |
Photovoltaic device, method of producing the same and generating system using the same
Grant 5,439,533 - Saito , et al. August 8, 1 | 1995-08-08 |
Apparatus for repairing an electrically short-circuited semiconductor device
Grant 5,418,680 - Saito , et al. May 23, 1 | 1995-05-23 |
Si- and/or Ge-containing non-single crystalline semiconductor film with an average radius of 3.5 A or less as for microvoids contained therein and a microvoid density 1.times.10.sup.(19) (cm.sup.-3) or less
Grant 5,371,380 - Saito , et al. December 6, 1 | 1994-12-06 |
Method for repairing an electrically short-circuited semiconductor device, and process for producing a semiconductor device utilizing said method
Grant 5,281,541 - Saito , et al. January 25, 1 | 1994-01-25 |
| 