Kochi Industrial Promotion Center

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kochi Industrial Promotion Center.The latest application filed is for "field emission electrode, manufacturing method thereof, and electronic device".

Company Profile

0.11.11

Kochi Industrial Promotion Center - Kochi-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Deposition apparatus and deposition method Grant 8,307,782 - Nishimura , et al. November 13, 2	2012-11-13
Field emission electrode, manufacturing method thereof, and electronic device Grant 8,035,291 - Nishimura , et al. October 11, 2	2011-10-11
Manufacturing method of semiconductor device including active layer of zinc oxide with controlled crystal lattice spacing Grant 7,993,964 - Hirao , et al. August 9, 2	2011-08-09
Manufacturing method of thin film transistor including low resistance conductive thin films Grant 7,981,734 - Furuta , et al. July 19, 2	2011-07-19
Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof Grant 7,977,169 - Hirao , et al. July 12, 2	2011-07-12
Deposition apparatus and deposition method Grant 7,935,548 - Nishimura , et al. May 3, 2	2011-05-03
Soft X-ray generation apparatus and static elimination apparatus Grant 7,907,700 - Inaba , et al. March 15, 2	2011-03-15
Field emission electrode, method and apparatus of manufacturing the same by carrying a humidification process and an aging process Grant 7,812,512 - Nishimura , et al. October 12, 2	2010-10-12
Field Emission Electrode, Manufacturing Method Thereof, And Electronic Device App 20100219744 - NISHIMURA; Kazuhito ; et al.	2010-09-02
Field emission electrode, manufacturing method thereof, and electronic device Grant 7,755,271 - Nishimura , et al. July 13, 2	2010-07-13
Manufacturing Method Of Semiconductor Device Including Active Layer Of Zinc Oxide With Controlled Crystal Lattice Spacing App 20090286351 - HIRAO; Takashi ; et al.	2009-11-19
Manufacturing Method Of Thin Film Transistor Including Low Resistance Conductive Thin Films App 20090269881 - FURUTA; Mamoru ; et al.	2009-10-29
Semiconductor device including active layer of zinc oxide with controlled crystal lattice spacing and manufacturing method thereof Grant 7,598,520 - Hirao , et al. October 6, 2	2009-10-06
Thin film transistor including low resistance conductive thin films and manufacturing method thereof Grant 7,576,394 - Furuta , et al. August 18, 2	2009-08-18
Deposition Apparatus And Deposition Method App 20090169769 - Nishimura; Kazuhito ; et al.	2009-07-02
Deposition Apparatus And Deposition Method App 20090155934 - NISHIMURA; Kazuhito ; et al.	2009-06-18
Plasma CVD apparatus and film deposition method App 20080226838 - Nishimura; Kazuhito ; et al.	2008-09-18
Semiconductor device including active layer of zinc oxide with controlled crystal lattice spacing and manufacturing method thereof App 20070278490 - Hirao; Takashi ; et al.	2007-12-06
Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof App 20070187678 - Hirao; Takashi ; et al.	2007-08-16
Thin film transistor including low resistance conductive thin films and manufacturing method thereof App 20070187760 - Furuta; Mamoru ; et al.	2007-08-16
Plasma CVD apparatus and plasma surface treatment method App 20070074664 - Nishimura; Kazuhito ; et al.	2007-04-05
Field emission electrode, manufacturing method thereof, and electronic device App 20060113891 - Nishimura; Kazuhito ; et al.	2006-06-01

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