KOCH; RENEE

Patent Applications and Registrations

Patent applications and USPTO patent grants for KOCH; RENEE.The latest application filed is for "inductively coupled plasma reactor having rf phase control and methods of use thereof".

Company Profile

0.5.6

KOCH; RENEE - Brentwood CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof App 20100276391 - GRIMBERGEN; MICHAEL N. ; et al.	2010-11-04
Multi-step photomask etching with chlorine for uniformity control Grant 7,786,019 - Koch , et al. August 31, 2	2010-08-31
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another Grant 7,520,999 - Chandrachood , et al. April 21, 2	2009-04-21
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator Grant 7,504,041 - Chandrachood , et al. March 17, 2	2009-03-17
Plasma reactor with a dynamically adjustable plasma source power applicator Grant 7,431,797 - Chandrachood , et al. October 7, 2	2008-10-07
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another Grant 7,419,551 - Chandrachood , et al. September 2, 2	2008-09-02
Multi-step Photomask Etching With Chlorine For Uniformity Control App 20080142476 - KOCH; RENEE ; et al.	2008-06-19
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another App 20070256784 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Plasma reactor with a dynamically adjustable plasma source power applicator App 20070256787 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another App 20070257008 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator App 20070257009 - Chandrachood; Madhavi R. ; et al.	2007-11-08

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