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Patent applications and USPTO patent grants for Koblinger; Otto.The latest application filed is for "method for producing an integrated circuit structure with a dense multilayer metallization pattern".
Patent | Date |
---|---|
Method for producing an integrated circuit structure with a dense multilayer metallization pattern Grant 5,109,267 - Koblinger , et al. April 28, 1 | 1992-04-28 |
Process for making masks with structures in the submicron range Grant 5,055,383 - Koblinger , et al. October 8, 1 | 1991-10-08 |
Method of producing integrated semiconductor structures comprising field-effect transistors with channel lengths in the submicron range using a three-layer resist system Grant 4,980,317 - Koblinger , et al. December 25, 1 | 1990-12-25 |
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