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Patent applications and USPTO patent grants for Kobayashi; Naoaki.The latest application filed is for "methods for cleaning a substrate".
Patent | Date |
---|---|
Methods for cleaning a substrate Grant 7,288,156 - Isago , et al. October 30, 2 | 2007-10-30 |
Methods for cleaning a substrate App 20060112974 - Isago; Yoichi ;   et al. | 2006-06-01 |
Apparatus for cleaning a substrate Grant 7,004,181 - Isago , et al. February 28, 2 | 2006-02-28 |
Water supply apparatus and method thereof App 20030217762 - Kobayashi, Naoaki ;   et al. | 2003-11-27 |
Water supplying apparatus and water supplying method App 20030041881 - Isago, Yoichi ;   et al. | 2003-03-06 |
Deposition of silicon nitrides by plasma-enhanced chemical vapor deposition Grant 5,591,494 - Sato , et al. January 7, 1 | 1997-01-07 |
Deposition of silicon nitride by plasma-enchanced chemical vapor deposition Grant 5,508,067 - Sato , et al. April 16, 1 | 1996-04-16 |
Cleaning method for semiconductor wafer processing apparatus Grant 5,129,958 - Nagashima , et al. July 14, 1 | 1992-07-14 |
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