loadpatents
name:-0.058823108673096
name:-0.038846015930176
name:-0.0074160099029541
Kobayashi; Katsuhiro Patent Filings

Kobayashi; Katsuhiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kobayashi; Katsuhiro.The latest application filed is for "pyridone derivative having tetrahydropyranylmethyl group".

Company Profile
7.39.48
  • Kobayashi; Katsuhiro - Kita-ku JP
  • KOBAYASHI; Katsuhiro - Tokyo JP
  • Kobayashi; Katsuhiro - Fukuoka JP
  • Kobayashi; Katsuhiro - Chiyoda-ku JP
  • Kobayashi; Katsuhiro - Shizuoka N/A JP
  • Kobayashi; Katsuhiro - Shinagawa-ku JP
  • Kobayashi; Katsuhiro - Kanagawa JP
  • Kobayashi; Katsuhiro - Jyoetsu JP
  • Kobayashi; Katsuhiro - Joetsu JP
  • KOBAYASHI; Katsuhiro - Joetsu-shi JP
  • Kobayashi; Katsuhiro - Kodaira-shi JP
  • Kobayashi; Katsuhiro - Kodaira JP
  • Kobayashi; Katsuhiro - Tsubame JP
  • Kobayashi; Katsuhiro - Niigata-ken JP
  • Kobayashi; Katsuhiro - Tsubame-shi JP
  • Kobayashi; Katsuhiro - Kanagawa-ken JP
  • Kobayashi, Katsuhiro - Kawasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
EP300/CREBBP inhibitor
Grant 11,274,100 - Naito , et al. March 15, 2
2022-03-15
Pyridone Derivative Having Tetrahydropyranylmethyl Group
App 20220002277 - HAGINOYA; Noriyasu ;   et al.
2022-01-06
Pyridone derivatives having tetrahydropyranylmethyl groups
Grant 11,208,403 - Haginoya , et al. December 28, 2
2021-12-28
Endoscope with distal linear conductor
Grant 11,064,868 - Kobayashi , et al. July 20, 2
2021-07-20
Ep300/crebbp Inhibitor
App 20210171520 - Naito; Hiroyuki ;   et al.
2021-06-10
Adhesive layer-equipped transparent plate and display device
Grant 10,866,443 - Hori , et al. December 15, 2
2020-12-15
Display Device And Process For Producing Display Device
App 20200219425 - NOJIRI; Yu ;   et al.
2020-07-09
Display apparatus and manufacturing method of display apparatus
Grant 10,564,473 - Kobayashi , et al. Feb
2020-02-18
Pyridone Derivatives Having Tetrahydropyranylmethyl Groups
App 20200010458 - HAGINOYA; Noriyasu ;   et al.
2020-01-09
Catheter, examination system and thrombus removing device
Grant 10,456,200 - Okada , et al. Oc
2019-10-29
Pyridone derivatives having tetrahydropyranylmethyl groups
Grant 10,442,797 - Haginoya , et al. Oc
2019-10-15
Adhesive Layer-equipped Transparent Plate And Display Device
App 20190187510 - Hori; Yuki ;   et al.
2019-06-20
Endoscope
App 20190038112 - KOBAYASHI; Katsuhiro ;   et al.
2019-02-07
Display Apparatus And Manufacturing Method Of Display Apparatus
App 20190018285 - KOBAYASHI; Katsuhiro ;   et al.
2019-01-17
Crystal of 5-hydroxy-4-(trifluoromethyl)pyrazolopyridine derivative
Grant 10,138,240 - Kobayashi , et al. Nov
2018-11-27
Crystal Of 5-hydroxy-4-(trifluoromethyl)pyrazolopyridine Derivative
App 20180170926 - Kobayashi; Katsuhiro ;   et al.
2018-06-21
Pyridone Derivatives Having Tetrahydropyranylmethyl Groups
App 20180148436 - HAGINOYA; Noriyasu ;   et al.
2018-05-31
Pyridone Derivative Having Tetrahydropyranylmethyl Group
App 20170183329 - HAGINOYA; Noriyasu ;   et al.
2017-06-29
Pyridone derivatives
Grant 8,933,103 - Ohki , et al. January 13, 2
2015-01-13
Positive resist composition and patterning process
Grant 8,871,427 - Taniguchi , et al. October 28, 2
2014-10-28
Pyridone Derivatives
App 20130281428 - Ohki; Hitoshi ;   et al.
2013-10-24
Positive Resist Composition And Patterning Process
App 20130045444 - TANIGUCHI; Ryosuke ;   et al.
2013-02-21
Patterning process and pattern surface coating composition
Grant 8,105,760 - Hatakeyama , et al. January 31, 2
2012-01-31
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 8,030,515 - Kobayashi , et al. October 4, 2
2011-10-04
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
Grant 7,981,589 - Hasegawa , et al. July 19, 2
2011-07-19
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20110160481 - KOBAYASHI; Katsuhiro ;   et al.
2011-06-30
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,928,262 - Kobayashi , et al. April 19, 2
2011-04-19
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,919,226 - Ohsawa , et al. April 5, 2
2011-04-05
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,833,694 - Hasegawa , et al. November 16, 2
2010-11-16
Dumper
App 20100121528 - Suzuki; Yasuhiro ;   et al.
2010-05-13
Head Separated Camera And Camera Head
App 20100110223 - Kobayashi; Katsuhiro
2010-05-06
Positive resist composition and patterning process
Grant 7,618,765 - Nishi , et al. November 17, 2
2009-11-17
Catheter, Examination System And Thrombus Removing Device
App 20090270846 - Okada; Hiroyuki ;   et al.
2009-10-29
Lactone-containing Compound, Polymer, Resist Composition, And Patterning Process
App 20090233242 - HASEGAWA; Koji ;   et al.
2009-09-17
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,569,324 - Kobayashi , et al. August 4, 2
2009-08-04
Seismic isolation apparatus
Grant 7,565,774 - Shizuku , et al. July 28, 2
2009-07-28
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,556,909 - Kobayashi , et al. July 7, 2
2009-07-07
Acid Addition Salt of Dihydropyridine Derivative
App 20090170827 - Hagihara; Masahiko ;   et al.
2009-07-02
Acid Addition Salt of Optically Active Dihydropyridine Derivative
App 20090170826 - Hagihara; Masahiko ;   et al.
2009-07-02
Positive resist composition and patterning process
Grant 7,541,133 - Nishi , et al. June 2, 2
2009-06-02
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,531,290 - Kobayashi , et al. May 12, 2
2009-05-12
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,511,169 - Ohsawa , et al. March 31, 2
2009-03-31
Patterning Process And Pattern Surface Coating Composition
App 20090053657 - HATAKEYAMA; Jun ;   et al.
2009-02-26
Fluorinated Monomer, Fluorinated Polymer, Resist Composition And Patterning Process
App 20090035699 - HASEGAWA; Koji ;   et al.
2009-02-05
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20080318160 - Ohsawa; Youichi ;   et al.
2008-12-25
Positive resist composition and patterning process
App 20080254386 - Nishi; Tsunehiro ;   et al.
2008-10-16
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20080124656 - KOBAYASHI; Katsuhiro ;   et al.
2008-05-29
Positive resist composition and patterning process
App 20080124652 - Nishi; Tsunehiro ;   et al.
2008-05-29
Abnormality Judging Device
App 20080012698 - Kobayashi; Katsuhiro ;   et al.
2008-01-17
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20070298352 - KOBAYASHI; Katsuhiro ;   et al.
2007-12-27
Method for measuring forces acted upon tire and apparatus for measuring forces acted upon tire
Grant 7,302,868 - Shima , et al. December 4, 2
2007-12-04
Photoresist undercoat-forming material and patterning process
App 20070275325 - Hatakeyama; Jun ;   et al.
2007-11-29
Golf club
Grant 7,294,064 - Tsurumaki , et al. November 13, 2
2007-11-13
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
Grant 7,282,316 - Kobayashi , et al. October 16, 2
2007-10-16
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,276,324 - Watanabe , et al. October 2, 2
2007-10-02
Photoacid generators, chemically amplified resist compositions, and patterning process
Grant 7,235,343 - Ohsawa , et al. June 26, 2
2007-06-26
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099112 - Kobayashi; Katsuhiro ;   et al.
2007-05-03
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099113 - Kobayashi; Katsuhiro ;   et al.
2007-05-03
Photo acid generator, chemical amplification resist material
Grant 7,211,367 - Kobayashi , et al. May 1, 2
2007-05-01
Golf club
App 20070021234 - Tsurumaki; Masaei ;   et al.
2007-01-25
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20060228648 - Ohsawa; Youichi ;   et al.
2006-10-12
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
Grant 7,109,311 - Ohsawa , et al. September 19, 2
2006-09-19
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
Grant 7,101,651 - Ohsawa , et al. September 5, 2
2006-09-05
Photo acid generator, chemical amplification resist material and pattern formation method
Grant 7,090,961 - Kobayashi , et al. August 15, 2
2006-08-15
Photo acid generator, chemical amplification resist material and pattern formation method
App 20060160023 - Kobayashi; Tomohiro ;   et al.
2006-07-20
Seismic isolation apparatus
App 20060137264 - Shizuku; Takahisa ;   et al.
2006-06-29
Method for measuring forces acted upon tire and apparatus for measuring forces acted upon tire
App 20060010992 - Shima; Hiroshi ;   et al.
2006-01-19
Golf club
Grant 6,945,877 - Kobayashi , et al. September 20, 2
2005-09-20
Photoacid generators, chemically amplified resist compositions, and patterning process
Grant 6,916,591 - Ohsawa , et al. July 12, 2
2005-07-12
Nitrogen-containing organic compound, resist composition and patterning process
App 20050106500 - Watanabe, Takeru ;   et al.
2005-05-19
Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same
App 20050048395 - Kobayashi, Katsuhiro ;   et al.
2005-03-03
Photoacid generators, chemically amplified resist compositions, and patterning process
App 20040229162 - Ohsawa, Youichi ;   et al.
2004-11-18
Golf club
App 20040192463 - Tsurumaki, Masaei ;   et al.
2004-09-30
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
App 20040167322 - Ohsawa, Youichi ;   et al.
2004-08-26
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
App 20040166432 - Ohsawa, Youichi ;   et al.
2004-08-26
Golf club
App 20040166960 - Kobayashi, Katsuhiro ;   et al.
2004-08-26
Image fiber imaging apparatus
Grant 6,744,957 - Kobayashi , et al. June 1, 2
2004-06-01
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
Grant 6,713,612 - Kobayashi , et al. March 30, 2
2004-03-30
Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
Grant 6,689,530 - Ohsawa , et al. February 10, 2
2004-02-10
Photo acid generator, chemical amplification resist material and pattern formation method
App 20030224290 - Kobayashi, Tomohiro ;   et al.
2003-12-04
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
App 20030224298 - Kobayashi, Katsuhiro ;   et al.
2003-12-04
Photoacid generators, chemically amplified resist compositions, and patterning process
App 20030215738 - Ohsawa, Youichi ;   et al.
2003-11-20
Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
App 20030180653 - Ohsawa, Youichi ;   et al.
2003-09-25
Image fiber imaging apparatus
App 20020159728 - Kobayashi, Katsuhiro ;   et al.
2002-10-31

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