Patent | Date |
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EP300/CREBBP inhibitor Grant 11,274,100 - Naito , et al. March 15, 2 | 2022-03-15 |
Pyridone Derivative Having Tetrahydropyranylmethyl Group App 20220002277 - HAGINOYA; Noriyasu ;   et al. | 2022-01-06 |
Pyridone derivatives having tetrahydropyranylmethyl groups Grant 11,208,403 - Haginoya , et al. December 28, 2 | 2021-12-28 |
Endoscope with distal linear conductor Grant 11,064,868 - Kobayashi , et al. July 20, 2 | 2021-07-20 |
Ep300/crebbp Inhibitor App 20210171520 - Naito; Hiroyuki ;   et al. | 2021-06-10 |
Adhesive layer-equipped transparent plate and display device Grant 10,866,443 - Hori , et al. December 15, 2 | 2020-12-15 |
Display Device And Process For Producing Display Device App 20200219425 - NOJIRI; Yu ;   et al. | 2020-07-09 |
Display apparatus and manufacturing method of display apparatus Grant 10,564,473 - Kobayashi , et al. Feb | 2020-02-18 |
Pyridone Derivatives Having Tetrahydropyranylmethyl Groups App 20200010458 - HAGINOYA; Noriyasu ;   et al. | 2020-01-09 |
Catheter, examination system and thrombus removing device Grant 10,456,200 - Okada , et al. Oc | 2019-10-29 |
Pyridone derivatives having tetrahydropyranylmethyl groups Grant 10,442,797 - Haginoya , et al. Oc | 2019-10-15 |
Adhesive Layer-equipped Transparent Plate And Display Device App 20190187510 - Hori; Yuki ;   et al. | 2019-06-20 |
Endoscope App 20190038112 - KOBAYASHI; Katsuhiro ;   et al. | 2019-02-07 |
Display Apparatus And Manufacturing Method Of Display Apparatus App 20190018285 - KOBAYASHI; Katsuhiro ;   et al. | 2019-01-17 |
Crystal of 5-hydroxy-4-(trifluoromethyl)pyrazolopyridine derivative Grant 10,138,240 - Kobayashi , et al. Nov | 2018-11-27 |
Crystal Of 5-hydroxy-4-(trifluoromethyl)pyrazolopyridine Derivative App 20180170926 - Kobayashi; Katsuhiro ;   et al. | 2018-06-21 |
Pyridone Derivatives Having Tetrahydropyranylmethyl Groups App 20180148436 - HAGINOYA; Noriyasu ;   et al. | 2018-05-31 |
Pyridone Derivative Having Tetrahydropyranylmethyl Group App 20170183329 - HAGINOYA; Noriyasu ;   et al. | 2017-06-29 |
Pyridone derivatives Grant 8,933,103 - Ohki , et al. January 13, 2 | 2015-01-13 |
Positive resist composition and patterning process Grant 8,871,427 - Taniguchi , et al. October 28, 2 | 2014-10-28 |
Pyridone Derivatives App 20130281428 - Ohki; Hitoshi ;   et al. | 2013-10-24 |
Positive Resist Composition And Patterning Process App 20130045444 - TANIGUCHI; Ryosuke ;   et al. | 2013-02-21 |
Patterning process and pattern surface coating composition Grant 8,105,760 - Hatakeyama , et al. January 31, 2 | 2012-01-31 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 8,030,515 - Kobayashi , et al. October 4, 2 | 2011-10-04 |
Fluorinated monomer, fluorinated polymer, resist composition and patterning process Grant 7,981,589 - Hasegawa , et al. July 19, 2 | 2011-07-19 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process App 20110160481 - KOBAYASHI; Katsuhiro ;   et al. | 2011-06-30 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,928,262 - Kobayashi , et al. April 19, 2 | 2011-04-19 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,919,226 - Ohsawa , et al. April 5, 2 | 2011-04-05 |
Lactone-containing compound, polymer, resist composition, and patterning process Grant 7,833,694 - Hasegawa , et al. November 16, 2 | 2010-11-16 |
Dumper App 20100121528 - Suzuki; Yasuhiro ;   et al. | 2010-05-13 |
Head Separated Camera And Camera Head App 20100110223 - Kobayashi; Katsuhiro | 2010-05-06 |
Positive resist composition and patterning process Grant 7,618,765 - Nishi , et al. November 17, 2 | 2009-11-17 |
Catheter, Examination System And Thrombus Removing Device App 20090270846 - Okada; Hiroyuki ;   et al. | 2009-10-29 |
Lactone-containing Compound, Polymer, Resist Composition, And Patterning Process App 20090233242 - HASEGAWA; Koji ;   et al. | 2009-09-17 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,569,324 - Kobayashi , et al. August 4, 2 | 2009-08-04 |
Seismic isolation apparatus Grant 7,565,774 - Shizuku , et al. July 28, 2 | 2009-07-28 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,556,909 - Kobayashi , et al. July 7, 2 | 2009-07-07 |
Acid Addition Salt of Dihydropyridine Derivative App 20090170827 - Hagihara; Masahiko ;   et al. | 2009-07-02 |
Acid Addition Salt of Optically Active Dihydropyridine Derivative App 20090170826 - Hagihara; Masahiko ;   et al. | 2009-07-02 |
Positive resist composition and patterning process Grant 7,541,133 - Nishi , et al. June 2, 2 | 2009-06-02 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,531,290 - Kobayashi , et al. May 12, 2 | 2009-05-12 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Grant 7,511,169 - Ohsawa , et al. March 31, 2 | 2009-03-31 |
Patterning Process And Pattern Surface Coating Composition App 20090053657 - HATAKEYAMA; Jun ;   et al. | 2009-02-26 |
Fluorinated Monomer, Fluorinated Polymer, Resist Composition And Patterning Process App 20090035699 - HASEGAWA; Koji ;   et al. | 2009-02-05 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20080318160 - Ohsawa; Youichi ;   et al. | 2008-12-25 |
Positive resist composition and patterning process App 20080254386 - Nishi; Tsunehiro ;   et al. | 2008-10-16 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process App 20080124656 - KOBAYASHI; Katsuhiro ;   et al. | 2008-05-29 |
Positive resist composition and patterning process App 20080124652 - Nishi; Tsunehiro ;   et al. | 2008-05-29 |
Abnormality Judging Device App 20080012698 - Kobayashi; Katsuhiro ;   et al. | 2008-01-17 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process App 20070298352 - KOBAYASHI; Katsuhiro ;   et al. | 2007-12-27 |
Method for measuring forces acted upon tire and apparatus for measuring forces acted upon tire Grant 7,302,868 - Shima , et al. December 4, 2 | 2007-12-04 |
Photoresist undercoat-forming material and patterning process App 20070275325 - Hatakeyama; Jun ;   et al. | 2007-11-29 |
Golf club Grant 7,294,064 - Tsurumaki , et al. November 13, 2 | 2007-11-13 |
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same Grant 7,282,316 - Kobayashi , et al. October 16, 2 | 2007-10-16 |
Nitrogen-containing organic compound, resist composition and patterning process Grant 7,276,324 - Watanabe , et al. October 2, 2 | 2007-10-02 |
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 7,235,343 - Ohsawa , et al. June 26, 2 | 2007-06-26 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20070099112 - Kobayashi; Katsuhiro ;   et al. | 2007-05-03 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20070099113 - Kobayashi; Katsuhiro ;   et al. | 2007-05-03 |
Photo acid generator, chemical amplification resist material Grant 7,211,367 - Kobayashi , et al. May 1, 2 | 2007-05-01 |
Golf club App 20070021234 - Tsurumaki; Masaei ;   et al. | 2007-01-25 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process App 20060228648 - Ohsawa; Youichi ;   et al. | 2006-10-12 |
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process Grant 7,109,311 - Ohsawa , et al. September 19, 2 | 2006-09-19 |
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process Grant 7,101,651 - Ohsawa , et al. September 5, 2 | 2006-09-05 |
Photo acid generator, chemical amplification resist material and pattern formation method Grant 7,090,961 - Kobayashi , et al. August 15, 2 | 2006-08-15 |
Photo acid generator, chemical amplification resist material and pattern formation method App 20060160023 - Kobayashi; Tomohiro ;   et al. | 2006-07-20 |
Seismic isolation apparatus App 20060137264 - Shizuku; Takahisa ;   et al. | 2006-06-29 |
Method for measuring forces acted upon tire and apparatus for measuring forces acted upon tire App 20060010992 - Shima; Hiroshi ;   et al. | 2006-01-19 |
Golf club Grant 6,945,877 - Kobayashi , et al. September 20, 2 | 2005-09-20 |
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 6,916,591 - Ohsawa , et al. July 12, 2 | 2005-07-12 |
Nitrogen-containing organic compound, resist composition and patterning process App 20050106500 - Watanabe, Takeru ;   et al. | 2005-05-19 |
Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same App 20050048395 - Kobayashi, Katsuhiro ;   et al. | 2005-03-03 |
Photoacid generators, chemically amplified resist compositions, and patterning process App 20040229162 - Ohsawa, Youichi ;   et al. | 2004-11-18 |
Golf club App 20040192463 - Tsurumaki, Masaei ;   et al. | 2004-09-30 |
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process App 20040167322 - Ohsawa, Youichi ;   et al. | 2004-08-26 |
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process App 20040166432 - Ohsawa, Youichi ;   et al. | 2004-08-26 |
Golf club App 20040166960 - Kobayashi, Katsuhiro ;   et al. | 2004-08-26 |
Image fiber imaging apparatus Grant 6,744,957 - Kobayashi , et al. June 1, 2 | 2004-06-01 |
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process Grant 6,713,612 - Kobayashi , et al. March 30, 2 | 2004-03-30 |
Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process Grant 6,689,530 - Ohsawa , et al. February 10, 2 | 2004-02-10 |
Photo acid generator, chemical amplification resist material and pattern formation method App 20030224290 - Kobayashi, Tomohiro ;   et al. | 2003-12-04 |
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process App 20030224298 - Kobayashi, Katsuhiro ;   et al. | 2003-12-04 |
Photoacid generators, chemically amplified resist compositions, and patterning process App 20030215738 - Ohsawa, Youichi ;   et al. | 2003-11-20 |
Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process App 20030180653 - Ohsawa, Youichi ;   et al. | 2003-09-25 |
Image fiber imaging apparatus App 20020159728 - Kobayashi, Katsuhiro ;   et al. | 2002-10-31 |