Kobari; Hideya

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kobari; Hideya.The latest application filed is for "cleaning liquid for lithography and cleaning method using same".

Company Profile

0.6.3

Kobari; Hideya - Kawasaki JP
Kobari; Hideya - Kawasaki-shi JP
Kobari; Hideya - Kanagawa-ken JP
Kobari; Hideya - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cleaning liquid for lithography and cleaning method using same Grant 7,884,062 - Koshiyama , et al. February 8, 2	2011-02-08
Cleaning Liquid For Lithography and Cleaning Method Using Same App 20090029893 - Koshiyama; Jun ; et al.	2009-01-29
Composition for forming coating and coating formed of composition App 20080114115 - Iida; Hiroyuki ; et al.	2008-05-15
Dielectric element and method for fabricating the same Grant 6,787,412 - Hashimoto , et al. September 7, 2	2004-09-07
Dielectric element and method for fabricating the same App 20030209747 - Hashimoto, Akira ; et al.	2003-11-13
Dielectric element and method for fabricating the same Grant 6,597,027 - Hashimoto , et al. July 22, 2	2003-07-22
Coating solution for forming silica coating and method of forming silica coating Grant 6,214,104 - Iida , et al. April 10, 2	2001-04-10
Rotary chemical treater having stationary cleaning fluid nozzle Grant 5,591,262 - Sago , et al. January 7, 1	1997-01-07
Solution applying apparatus Grant 5,439,519 - Sago , et al. August 8, 1	1995-08-08

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