loadpatents
name:-0.015857934951782
name:-0.0083389282226562
name:-0.00057196617126465
Ko; Yong-kyun Patent Filings

Ko; Yong-kyun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ko; Yong-kyun.The latest application filed is for "cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solution".

Company Profile
0.7.12
  • Ko; Yong-kyun - Osan-si KR
  • Ko; Yong-Kyun - Gyeonggi-do KR
  • Ko; Yong-Kyun - Osan KR
  • Ko, Yong-Kyun - Osan-city KR
  • Ko; Yong-kyun - Kyungki-do KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solution
App 20090117499 - Kim; Se-yeon ;   et al.
2009-05-07
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device
Grant 7,311,857 - Ko , et al. December 25, 2
2007-12-25
Supporter And Apparatus For Cleaning Substrates With The Supporter, And Method For Cleaning Substrates
App 20070181160 - YI; Hun-Jung ;   et al.
2007-08-09
Cleaning composition and related methods
App 20070000523 - Kim; Se-Yeon ;   et al.
2007-01-04
Wafer guides for processing semiconductor substrates
App 20060260149 - Jun; Pil-Kwon ;   et al.
2006-11-23
Wafer guides for processing semiconductor substrates
Grant 7,100,306 - Jun , et al. September 5, 2
2006-09-05
Wafer guides for processing semiconductor substrates
App 20060027513 - Jun; Pil-Kwon ;   et al.
2006-02-09
Wafer guides for processing semiconductor substrates
Grant 6,959,823 - Jun , et al. November 1, 2
2005-11-01
Apparatus and method for collecting impurities on a semiconductor wafer
Grant 6,939,410 - Ko , et al. September 6, 2
2005-09-06
Apparatus for manufacturing integrated circuit device
Grant 6,905,570 - Lim , et al. June 14, 2
2005-06-14
Apparatus for drying a substrate using an isopropyl alcohol vapor
Grant 6,883,248 - Ko , et al. April 26, 2
2005-04-26
Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device
App 20050081883 - Ko, Yong-Kyun ;   et al.
2005-04-21
Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatus
App 20040226186 - Chon, Sang-Mun ;   et al.
2004-11-18
Apparatus and method for collecting impurities on a semiconductor wafer
App 20040163670 - Ko, Yong-Kyun ;   et al.
2004-08-26
Apparatus for drying a substrate using an isopropyl alcohol vapor
App 20040045188 - Ko, Yong-Kyun ;   et al.
2004-03-11
Wafer guides for processing semiconductor substrates
App 20040045865 - Jun, Pil-Kwon ;   et al.
2004-03-11
Apparatus for manufacturing integrated circuit device
App 20040022607 - Lim, Kwang-Shin ;   et al.
2004-02-05
Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatus
App 20040010932 - Chon, Sang-Mun ;   et al.
2004-01-22
Chemical refining method and reuse system for semiconductor device manufacturing
Grant 6,137,018 - Ko , et al. October 24, 2
2000-10-24

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