loadpatents
Patent applications and USPTO patent grants for KO; Tsung-Han.The latest application filed is for "air spacer formation with a spin-on dielectric material".
Patent | Date |
---|---|
Air Spacer Formation With A Spin-on Dielectric Material App 20220285492 - CHEN; Ting-Ting ;   et al. | 2022-09-08 |
Method Of Forming Photoresist Pattern App 20210200092 - SU; Yu-Chung ;   et al. | 2021-07-01 |
Method for performing a photolithography process Grant 10,796,910 - Ko , et al. October 6, 2 | 2020-10-06 |
Method For Performing A Photolithography Process App 20200135452 - KO; Tsung-Han ;   et al. | 2020-04-30 |
Method for performing a photolithography process Grant 10,573,519 - Ko , et al. Feb | 2020-02-25 |
Method For Performing A Photolithography Process App 20190080901 - KO; Tsung-Han ;   et al. | 2019-03-14 |
Orientation layer for directed self-assembly patterning process Grant 10,157,739 - Ko , et al. Dec | 2018-12-18 |
Orientation Layer for Directed Self-Assembly Patterning Process App 20180144928 - Ko; Tsung-Han ;   et al. | 2018-05-24 |
Orientation layer for directed self-assembly patterning process Grant 9,892,914 - Ko , et al. February 13, 2 | 2018-02-13 |
Orientation Layer for Directed Self-Assembly Patterning Process App 20170110319 - Ko; Tsung-Han ;   et al. | 2017-04-20 |
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