Patent | Date |
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Clustering for prediction models in process control and for optimal dispatching Grant 9,037,279 - Ko , et al. May 19, 2 | 2015-05-19 |
Forming interconnect structures using pre-ink-printed sheets Grant 8,716,867 - Ko , et al. May 6, 2 | 2014-05-06 |
Automatic virtual metrology for semiconductor wafer result prediction Grant 8,682,466 - Ko , et al. March 25, 2 | 2014-03-25 |
Near non-adaptive virtual metrology and chamber control Grant 8,433,434 - Wang , et al. April 30, 2 | 2013-04-30 |
Method and system for controlling copper chemical mechanical polish uniformity Grant 8,409,993 - Ko , et al. April 2, 2 | 2013-04-02 |
Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment Grant 8,145,337 - Lin , et al. March 27, 2 | 2012-03-27 |
Forming Interconnect Structures Using Pre-Ink-Printed Sheets App 20110277655 - Ko; Francis ;   et al. | 2011-11-17 |
System for extraction of key process parameters from fault detection classification to enable wafer prediction Grant 7,974,728 - Lin , et al. July 5, 2 | 2011-07-05 |
Clustering for Prediction Models in Process Control and for Optimal Dispatching App 20110060441 - Ko; Francis ;   et al. | 2011-03-10 |
Near Non-Adaptive Virtual Metrology and Chamber Control App 20110009998 - Wang; Amy ;   et al. | 2011-01-13 |
System and method for enhanced control of copper trench sheet resistance uniformity Grant 7,851,234 - Ko , et al. December 14, 2 | 2010-12-14 |
Auto routing for optimal uniformity control Grant 7,767,471 - Wang , et al. August 3, 2 | 2010-08-03 |
Method and system for yield and productivity improvements in semiconductor processing Grant 7,642,100 - Yu , et al. January 5, 2 | 2010-01-05 |
Prediction of uniformity of a wafer Grant 7,634,325 - Wang , et al. December 15, 2 | 2009-12-15 |
System And Method For Enhanced Control Of Copper Trench Sheet Resistance Uniformity App 20090142860 - Ko; Francis ;   et al. | 2009-06-04 |
Auto Routing for Optimal Uniformity Control App 20090035883 - Wang; Jean ;   et al. | 2009-02-05 |
Method and system for controlling copper chemical mechanical polish uniformity App 20080305563 - Ko; Francis ;   et al. | 2008-12-11 |
Methodology To Enable Wafer Result Prediction Of Batch Tools App 20080275676 - Lin; Chun-Hsien ;   et al. | 2008-11-06 |
Extraction Of Key Process Parameter App 20080275585 - Lin; Chun-Hsien ;   et al. | 2008-11-06 |
Novel Methodology To Realize Automatic Virtual Metrology App 20080275586 - Ko; Francis ;   et al. | 2008-11-06 |
Prediction Of Uniformity Of A Wafer App 20080275588 - Wang; Jean ;   et al. | 2008-11-06 |
Method And System For Yield And Productivity Improvements In Semiconductor Processing App 20080064127 - Yu; Chen-Hua ;   et al. | 2008-03-13 |
Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity App 20070072095 - Ko; Francis ;   et al. | 2007-03-29 |
Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity Grant 7,160,671 - Ko , et al. January 9, 2 | 2007-01-09 |
Method and apparatus to enable accurate wafer prediction Grant 7,144,297 - Lin , et al. December 5, 2 | 2006-12-05 |
Method And Apparatus To Enable Accurate Wafer Prediction App 20060252348 - Lin; Chun-Hsien ;   et al. | 2006-11-09 |
Novel method and apparatus for integrating fault detection and real-time virtual metrology in an advanced process control framework App 20060129257 - Chen; Ping-Hsu ;   et al. | 2006-06-15 |
FIB exposure of alignment marks in MIM technology App 20050186753 - Chen, Ping-Hsu ;   et al. | 2005-08-25 |
Plasma enhanced method for increasing silicon-containing photoresist selectivity Grant 6,799,907 - Ko , et al. October 5, 2 | 2004-10-05 |
Plasma enhanced method for increasing silicon-containing photoresist selectivity App 20030129816 - Ko, Francis ;   et al. | 2003-07-10 |
All dual damascene oxide etch process steps in one confined plasma chamber App 20030032278 - Chen, Lawrence ;   et al. | 2003-02-13 |
Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity App 20030003407 - Ko, Francis ;   et al. | 2003-01-02 |
Plasma Enhanced Method For Increasing Silicon-containing Photoresist Selectivity App 20030003683 - Ko, Francis ;   et al. | 2003-01-02 |