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Prevention of Contact Bottom Void in Semiconductor Fabrication
App 20220301940 - Lee; Yun ; et al. | 2022-09-22 |
Method of performing atomic layer deposition
Grant 11,441,221 - Cheng , et al. September 13, 2 | 2022-09-13 |
Forming isolation regions for separating fins and gate stacks
Grant 11,437,277 - Ko , et al. September 6, 2 | 2022-09-06 |
Semiconductor Device and Method
App 20220278098 - Lin; Li-Fong ; et al. | 2022-09-01 |
Multi-Layer Photo Etching Mask Including Organic and Inorganic Materials
App 20220262627 - Ko; Chung-Ting ; et al. | 2022-08-18 |
Semiconductor device and method of fabricating a semiconductor device
Grant 11,417,748 - Ko , et al. August 16, 2 | 2022-08-16 |
Formation of hybrid isolation regions through recess and re-deposition
Grant 11,404,323 - Ko , et al. August 2, 2 | 2022-08-02 |
Semiconductor Device, Finfet Device And Methods Of Forming The Same
App 20220238669 - Cheng; Po-Hsien ; et al. | 2022-07-28 |
Semiconductor Device Structure With Etch Stop Layer
App 20220223736 - KO; Chung-Ting ; et al. | 2022-07-14 |
Semiconductor Structure
App 20220190127 - HUANG; Shih-Wen ; et al. | 2022-06-16 |
Prevention of contact bottom void in semiconductor fabrication
Grant 11,362,003 - Lee , et al. June 14, 2 | 2022-06-14 |
Structure and formation method of semiconductor device with monoatomic etch stop layer
Grant 11,316,047 - Ko , et al. April 26, 2 | 2022-04-26 |
Semiconductor structure with barrier layer and method for forming the same
Grant 11,296,198 - Huang , et al. April 5, 2 | 2022-04-05 |
Masking Layer With Post Treatment
App 20220102152 - Chen; Wen-Ju ; et al. | 2022-03-31 |
Semiconductor device, FinFET device and methods of forming the same
Grant 11,271,083 - Cheng , et al. March 8, 2 | 2022-03-08 |
Multilayer Masking Layer and Method of Forming Same
App 20220020865 - Chen; Wen-Ju ; et al. | 2022-01-20 |
Formation Of Hybrid Isolation Regions Through Recess And Re-deposition
App 20210343597 - Ko; Chung-Ting ; et al. | 2021-11-04 |
Forming Isolation Regions For Separating Fins And Gate Stacks
App 20210335670 - Ko; Chung-Ting ; et al. | 2021-10-28 |
Semiconductor device and method
Grant 11,145,746 - Chen , et al. October 12, 2 | 2021-10-12 |
Semiconductor Device and Method
App 20210265489 - Chen; Wen-Ju ; et al. | 2021-08-26 |
Method of Performing Atomic Layer Deposition
App 20210262090 - Cheng; Po-Hsien ; et al. | 2021-08-26 |
Deposition Process For Forming Semiconductor Device And System
App 20210193454 - Ko; Chung-Ting ; et al. | 2021-06-24 |
Semiconductor Device and Method
App 20210183696 - Chen; Chun-Han ; et al. | 2021-06-17 |
Semiconductor Device And Method Of Fabricating A Semiconductor Device
App 20210134971 - Ko; Chung-Ting ; et al. | 2021-05-06 |
Atomic Layer Deposition Tool And Method
App 20210115557 - Ko; Chung-Ting ; et al. | 2021-04-22 |
Semiconductor Device, Finfet Device And Methods Of Forming The Same
App 20210098584 - Cheng; Po-Hsien ; et al. | 2021-04-01 |
Semiconductor device and method
Grant 10,943,818 - Chen , et al. March 9, 2 | 2021-03-09 |
Prevention of Contact Bottom Void in Semiconductor Fabrication
App 20210050268 - Lee; Yun ; et al. | 2021-02-18 |
Low-k gate spacer and formation thereof
Grant 10,854,521 - Lu , et al. December 1, 2 | 2020-12-01 |
FinFET device and method of forming same
Grant 10,840,357 - Ko , et al. November 17, 2 | 2020-11-17 |
Stress Modulation for Dielectric Layers
App 20200350433 - Ko; Chung-Ting ; et al. | 2020-11-05 |
Prevention of contact bottom void in semiconductor fabrication
Grant 10,825,737 - Lee , et al. November 3, 2 | 2020-11-03 |
Semiconductor structure and device each having differential etch stop layer over gate spacer
Grant 10,804,271 - Ko , et al. October 13, 2 | 2020-10-13 |
Method of forming differential etch stop layer using directional plasma to activate surface on device structure
Grant 10,763,104 - Ko , et al. Sep | 2020-09-01 |
Semiconductor Structure With Barrier Layer And Method For Forming The Same
App 20200235214 - HUANG; Shih-Wen ; et al. | 2020-07-23 |
Stress modulation for dielectric layers
Grant 10,720,526 - Ko , et al. | 2020-07-21 |
Semiconductor Device and Method
App 20200135550 - Chen; Chun-Han ; et al. | 2020-04-30 |
Systems And Methods For A Plasma Enhanced Deposition Of Material On A Semiconductor Substrate
App 20200123656 - LIN; Kun-Mo ; et al. | 2020-04-23 |
Semiconductor structure with barrier layer and method for forming the same
Grant 10,629,693 - Huang , et al. | 2020-04-21 |
Low-K Gate Spacer and Formation Thereof
App 20200075419 - Lu; Bo-Cyuan ; et al. | 2020-03-05 |
Structure And Formation Method Of Semiconductor Device Structure With Etch Stop Layer
App 20200058793 - KO; Chung-Ting ; et al. | 2020-02-20 |
Semiconductor Device and Method of Manufacture
App 20200043799 - Lee; Chun-Yi ; et al. | 2020-02-06 |
Differential Layer Formation Processes and Structures Formed Thereby
App 20200035679 - Ko; Chung-Ting ; et al. | 2020-01-30 |
FinFET Device and Method of Forming Same
App 20200035814 - Ko; Chung-Ting ; et al. | 2020-01-30 |
Stress Modulation for Dielectric Layers
App 20200006557 - Ko; Chung-Ting ; et al. | 2020-01-02 |
Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate
Grant 10,519,545 - Lin , et al. Dec | 2019-12-31 |
Low-K gate spacer and formation thereof
Grant 10,510,612 - Lu , et al. Dec | 2019-12-17 |
FinFETs and methods of forming the same
Grant 10,510,867 - Hsieh , et al. Dec | 2019-12-17 |
FinFet device and method of forming the same
Grant 10,505,021 - Ko , et al. Dec | 2019-12-10 |
Low-k gate spacer and formation thereof
Grant 10,483,168 - Lu , et al. Nov | 2019-11-19 |
Structure and formation method of semiconductor device structure with etch stop layer
Grant 10,468,529 - Ko , et al. No | 2019-11-05 |
Prevention of Contact Bottom Void in Semiconductor Fabrication
App 20190164842 - Lee; Yun ; et al. | 2019-05-30 |
Semiconductor Structure With Barrier Layer And Method For Forming The Same
App 20190157405 - HUANG; Shih-Wen ; et al. | 2019-05-23 |
Low-K Gate Spacer and Formation Thereof
App 20190148239 - Lu; Bo-Cyuan ; et al. | 2019-05-16 |
Low-k Gate Spacer And Formation Thereof
App 20190148238 - LU; Bo-Cyuan ; et al. | 2019-05-16 |
FinFETs and Methods of Forming the Same
App 20190140076 - Hsieh; Bor Chiuan ; et al. | 2019-05-09 |
FinFet Device and Method of Forming the Same
App 20190103477 - Ko; Chung-Ting ; et al. | 2019-04-04 |
Differential Layer Formation Processes and Structures Formed Thereby
App 20190096888 - KO; Chung-Ting ; et al. | 2019-03-28 |
Structure And Formation Method Of Semiconductor Device Structure With Etch Stop Layer
App 20190019890 - KO; Chung-Ting ; et al. | 2019-01-17 |
Prevention of contact bottom void in semiconductor fabrication
Grant 10,177,038 - Lee , et al. J | 2019-01-08 |
FinFETs and methods of forming the same
Grant 10,157,997 - Hsieh , et al. Dec | 2018-12-18 |
FinFETs and Methods of Forming the Same
App 20180315830 - Hsieh; Bor Chiuan ; et al. | 2018-11-01 |
Forming sidewall spacers using isotropic etch
Grant 9,852,947 - Ko , et al. December 26, 2 | 2017-12-26 |
Systems And Methods For A Plasma Enhanced Deposition Of Material On A Semiconductor Substrate
App 20170342561 - LIN; Kun-Mo ; et al. | 2017-11-30 |
Method for changing ultrasound wave frequency by using the acoustic matching layer
Grant 8,410,664 - Shieh , et al. April 2, 2 | 2013-04-02 |
Method for changing ultrasound wave frequency by using the acoustic matching layer
App 20100283355 - Shieh; Tzong-Lin Jay ; et al. | 2010-11-11 |
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