Kluth; George Jonathan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kluth; George Jonathan.The latest application filed is for "fdsoi semiconductor device with contact enhancement layer and method of manufacturing".

Company Profile

2.12.3

Kluth; George Jonathan - Saratoga Springs NY
Kluth; George Jonathan - Hopewell Junction NY
Kluth; George Jonathan - Hopewell Juction NY
Kluth; George Jonathan - Los Gatos CA
Kluth; George Jonathan - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
FDSOI semiconductor device with contact enhancement layer and method of manufacturing Grant 10,347,543 - Baars , et al. July 9, 2	2019-07-09
Fdsoi Semiconductor Device With Contact Enhancement Layer And Method Of Manufacturing App 20190148245 - Baars; Peter ; et al.	2019-05-16
Use of scanning theme implanters and annealers for selective implantation and annealing Grant 7,504,326 - Kluth , et al. March 17, 2	2009-03-17
Use of Scanning Theme Implanters and Annealers for Selective Implantation and Annealing App 20070281450 - Kluth; George Jonathan ; et al.	2007-12-06
Method of manufacturing a semiconductor device with supersaturated source/drain extensions and metal silicide contacts Grant 6,797,602 - Kluth , et al. September 28, 2	2004-09-28
Single anneal for dopant activation and silicide formation Grant 6,777,275 - Kluth August 17, 2	2004-08-17
Nickel silicide process using non-reactive spacer Grant 6,724,051 - Woo , et al. April 20, 2	2004-04-20
Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing Grant 6,605,513 - Paton , et al. August 12, 2	2003-08-12
Dopant implantation processing for improved source/drain interface with metal silicides Grant 6,544,872 - Buynoski , et al. April 8, 2	2003-04-08
Deeply doped source/drains for reduction of silicide/silicon interface roughness Grant 6,521,515 - Kluth February 18, 2	2003-02-18
Double silicide formation in polysicon gate without silicide in source/drain extensions Grant 6,451,693 - Woo , et al. September 17, 2	2002-09-17
Process for optimizing pocket implant profile by RTA implant annealing for a non-volatile semiconductor device Grant 6,410,388 - Kluth , et al. June 25, 2	2002-06-25
Method Of Forming Nickel Silicide Using A One-step Rapid Thermal Anneal Process And Backend Processing App 20020068408 - Paton, Eric N. ; et al.	2002-06-06
Enhancement of nickel silicide formation by use of nickel pre-amorphizing implant Grant 6,380,057 - Buynoski , et al. April 30, 2	2002-04-30
Nickel silicide stripping after nickel silicide formation Grant 6,362,095 - Woo , et al. March 26, 2	2002-03-26

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