Kling, Michael E.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kling, Michael E..The latest application filed is for "method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator".
- Kling, Michael E. - Austin TX
| Patent | Date |
|---|---|
| Using double exposure effects during phase shifting to control line end shortening App 20020142232 - Kling, Michael E. ; et al. | 2002-10-03 |
| Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator App 20020142231 - Kling, Michael E. ; et al. | 2002-10-03 |
| Lithographic proximity correction through subset feature modification Grant 5,958,635 - Reich , et al. September 28, 1 | 1999-09-28 |
| Two dimensional lithographic proximity correction using DRC shape functions Grant 5,920,487 - Reich , et al. July 6, 1 | 1999-07-06 |
| Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same Grant 5,849,440 - Lucas , et al. December 15, 1 | 1998-12-15 |
| Methods of designing a reticle and forming a semiconductor device therewith Grant 5,827,625 - Lucas , et al. October 27, 1 | 1998-10-27 |
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