Kita; Seiji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kita; Seiji.The latest application filed is for "novel cyanate ester compound and method for producing the same, and curable resin composition comprising the compound, and cured product thereof composition".

Company Profile

0.19.13

Kita; Seiji - Kurashiki N/A JP
Kita; Seiji - Kurashiki-shi JP
Kita; Seiji - Okayama JP
Kita; Seiji - Osaka JP
Kita; Seiji - Takatsuki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cyanate ester compound and method for producing the same, and curable resin composition comprising the compound, and cured product thereof composition Grant 10,155,835 - Sugano , et al. Dec	2018-12-18
Novel Cyanate Ester Compound And Method For Producing The Same, And Curable Resin Composition Comprising The Compound, And Cured Product Thereof Composition App 20140308530 - Sugano; Yuuichi ; et al.	2014-10-16
Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereof Grant 8,648,152 - Kita , et al. February 11, 2	2014-02-11
Composition for forming base film for lithography and method for forming multilayer resist pattern Grant 8,592,134 - Oguro , et al. November 26, 2	2013-11-26
Aromatic hydrocarbon resin and composition for forming underlayer film for lithography Grant 8,586,289 - Ideno , et al. November 19, 2	2013-11-19
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Grant 8,563,665 - Kita , et al. October 22, 2	2013-10-22
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Grant 8,524,952 - Kita , et al. September 3, 2	2013-09-03
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Grant 8,519,177 - Kita , et al. August 27, 2	2013-08-27
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound App 20120238775 - Kita; Seiji ; et al.	2012-09-20
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound App 20120238781 - Kita; Seiji ; et al.	2012-09-20
Aromatic Hydrocarbon Resin And Composition For Forming Underlayer Film For Lithography App 20120171611 - Ideno; Ryuji ; et al.	2012-07-05
Modified Naphthalene Formaldehyde Resin, Tricyclodecane Skeleton-containing Naphthol Compound And Ester Compound App 20110009574 - Kita; Seiji ; et al.	2011-01-13
Polyfunctional Dimethylnaphthalene Formaldehyde Resin, And Process For Production Thereof App 20100324255 - Kita; Seiji ; et al.	2010-12-23
Composition For Forming Base Film For Lithography And Method For Forming Multilayer Resist Pattern App 20100316950 - Oguro; Dai ; et al.	2010-12-16
Method of producing low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin Grant 7,772,331 - Ogiwara , et al. August 10, 2	2010-08-10
Software processing method and software processing system Grant 7,584,464 - Yoneda , et al. September 1, 2	2009-09-01
Cyanate ester compound, flame-retardant resin composition, and cured product thereof Grant 7,528,220 - Sugano , et al. May 5, 2	2009-05-05
Method of Producing Low Viscosity Phenol-Modified Aromatic Hydrocarbon Formaldehyde Resin App 20070238850 - Ogiwara; Masashi ; et al.	2007-10-11
Electric toothbrush App 20070000079 - Mori; Toyokazu ; et al.	2007-01-04
Novel cyanate ester compound, flame-retardant resin composition, and cured product thereof App 20060084787 - Sugano; Yuuichi ; et al.	2006-04-20
Novel cyanate ester compound, flame-retardant resin composition, and cured product thereof App 20050182203 - Sugano, Yuuichi ; et al.	2005-08-18
Software processing method and software processing system App 20040168154 - Yoneda, Kei ; et al.	2004-08-26
Oral hygiene instrument Grant 5,718,667 - Sugimoto , et al. February 17, 1	1998-02-17
Syringe Grant 4,795,444 - Hasegawa , et al. January 3, 1	1989-01-03

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