Kita; Noriyasu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kita; Noriyasu.The latest application filed is for "sensitizing dye and silver halide photographic material".
- Kita; Noriyasu - Hino JP
- Kita, Noriyasu - Tokyo JP
- Kita; Noriyasu - Musashimurayama JP
| Patent | Date |
|---|---|
| Sensitizing dye and silver halide photographic material Grant 6,677,113 - Kagawa , et al. January 13, 2 | 2004-01-13 |
| Sensitizing dye and silver halide photographic material App 20030143499 - Kagawa, Nobuaki ; et al. | 2003-07-31 |
| Silver halide emulsion and silver halide light sensitive photographic material Grant 6,492,102 - Kagawa , et al. December 10, 2 | 2002-12-10 |
| Sensitizing dye and silver halide photographic material App 20020106593 - Kagawa, Nobuaki ; et al. | 2002-08-08 |
| Light-sensitive composition Grant 4,840,869 - Kita , et al. June 20, 1 | 1989-06-20 |
| Photosensitive compositions Grant 4,467,025 - Goto , et al. August 21, 1 | 1984-08-21 |
| Process of developing posi-type lithographic printing plate with inorganic alkali solution Grant 4,467,027 - Yamamoto , et al. August 21, 1 | 1984-08-21 |
| Photosensitive composition Grant 4,442,196 - Iwaki , et al. April 10, 1 | 1984-04-10 |
| Photosensitive material with quinone diazide moiety containing polymer Grant 3,902,906 - Iwama , et al. September 2, 1 | 1975-09-02 |
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