Kishimura; Shinji
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kishimura; Shinji.The latest application filed is for "sulfonamide compound, polymer compound, resist material and pattern formation method".
Company Profile
0.42.45
- Kishimura; Shinji - Hyogo JP
- Kishimura; Shinji - Itami JP
- Kishimura; Shinji - Hyogo-ken JP
- Kishimura, Shinji - Itami-shi JP
- Kishimura, Shinji - Chuo Itami-shi JP
- Kishimura, Shinji - Itami-shi Hyogo JP
- Kishimura; Shinji - Tokyo JP
Patent Activity
| Patent | Date |
|---|---|
| Resist material and pattern formation method Grant 7,588,876 - Kishimura , et al. September 15, 2 | 2009-09-15 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method Grant 7,413,843 - Kishimura , et al. August 19, 2 | 2008-08-19 |
| Resist material and pattern formation method Grant 7,378,216 - Kishimura , et al. May 27, 2 | 2008-05-27 |
| Polymer, resist composition, and patterning process Grant 7,241,553 - Hatakeyama , et al. July 10, 2 | 2007-07-10 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method App 20070099117 - Kishimura; Shinji ; et al. | 2007-05-03 |
| Polymers, resist compositions and patterning process Grant 7,169,869 - Harada , et al. January 30, 2 | 2007-01-30 |
| Polymer compound, resist material and pattern formation method Grant 7,169,530 - Kishimura , et al. January 30, 2 | 2007-01-30 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method Grant 7,166,418 - Kishimura , et al. January 23, 2 | 2007-01-23 |
| Sulfonates, polymers, resist compositions and patterning process Grant 7,125,642 - Harada , et al. October 24, 2 | 2006-10-24 |
| Polymers, resist compositions and patterning process Grant 7,125,643 - Harada , et al. October 24, 2 | 2006-10-24 |
| Polymers, resist compositions and patterning process Grant 7,125,641 - Harada , et al. October 24, 2 | 2006-10-24 |
| Polymers, resist compositions and patterning process Grant 7,078,147 - Harada , et al. July 18, 2 | 2006-07-18 |
| Polymers, resist compositions and patterning process Grant 7,067,231 - Harada , et al. June 27, 2 | 2006-06-27 |
| Polymer compound, resist material and pattern formation method Grant 7,060,775 - Kishimura , et al. June 13, 2 | 2006-06-13 |
| Pattern-forming material and method of forming pattern Grant 7,041,428 - Kishimura , et al. May 9, 2 | 2006-05-09 |
| Polymers, resist compositions and patterning process Grant 7,005,228 - Hatakeyama , et al. February 28, 2 | 2006-02-28 |
| Resist compositions and patterning process Grant 7,001,707 - Hatakeyama , et al. February 21, 2 | 2006-02-21 |
| Resist material and pattern formation method App 20050277057 - Kishimura, Shinji ; et al. | 2005-12-15 |
| Resist material and pattern formation method App 20050266338 - Kishimura, Shinji ; et al. | 2005-12-01 |
| Resist material and pattern formation method App 20050266337 - Kishimura, Shinji ; et al. | 2005-12-01 |
| Polymers, resist compositions and patterning process App 20050267275 - Harada, Yuji ; et al. | 2005-12-01 |
| Polymer, resist composition, and patterning process App 20050221221 - Hatakeyama, Jun ; et al. | 2005-10-06 |
| Polymers, resist compositions and patterning process Grant 6,946,235 - Harada , et al. September 20, 2 | 2005-09-20 |
| Polymer compound, resist material and pattern formation method App 20050186501 - Kishimura, Shinji ; et al. | 2005-08-25 |
| Polymers, resist compositions and patterning process Grant 6,933,095 - Harada , et al. August 23, 2 | 2005-08-23 |
| Polymer, resist composition, and patterning process App 20050175935 - Harada, Yuji ; et al. | 2005-08-11 |
| Esters, polymers, resist compositions and patterning process Grant 6,916,592 - Harada , et al. July 12, 2 | 2005-07-12 |
| Polymers, resist compositions and patterning process App 20050089797 - Harada, Yuji ; et al. | 2005-04-28 |
| Resist compositions and patterning process App 20050084796 - Hatakeyama, Jun ; et al. | 2005-04-21 |
| Polymer compound, resist material and pattern formation method App 20050074693 - Kishimura, Shinji ; et al. | 2005-04-07 |
| Resist compositions and patterning process Grant 6,875,556 - Harada , et al. April 5, 2 | 2005-04-05 |
| Polymers, resist compositions and patterning process Grant 6,872,514 - Harada , et al. March 29, 2 | 2005-03-29 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method App 20050058935 - Kishimura, Shinji ; et al. | 2005-03-17 |
| Polymers, resist compositions and patterning process Grant 6,864,037 - Hatakeyama , et al. March 8, 2 | 2005-03-08 |
| Polymers, resist compositions and patterning process Grant 6,861,197 - Harada , et al. March 1, 2 | 2005-03-01 |
| Chemically amplified resist compositions and patterning process Grant 6,855,477 - Hatakeyama , et al. February 15, 2 | 2005-02-15 |
| Pattern forming material and method of pattern formation Grant 6,830,869 - Kishimura , et al. December 14, 2 | 2004-12-14 |
| Polymers, resist compositions and patterning process Grant 6,824,955 - Harada , et al. November 30, 2 | 2004-11-30 |
| Pattern formation material and pattern formation method Grant 6,806,029 - Kishimura , et al. October 19, 2 | 2004-10-19 |
| Resist compositions and patterning process Grant 6,790,586 - Hatakeyama , et al. September 14, 2 | 2004-09-14 |
| Polymers, resist compositions and patterning process App 20040157155 - Harada, Yuji ; et al. | 2004-08-12 |
| Sulfonates, polymers, resist compositions and patterning process App 20040157156 - Harada, Yuji ; et al. | 2004-08-12 |
| Resist compositions and patterning process App 20040144752 - Harada, Yuji ; et al. | 2004-07-29 |
| Pattern formation material and pattern formation method Grant 6,753,132 - Kishimura , et al. June 22, 2 | 2004-06-22 |
| Pattern formation material and method Grant 6,737,213 - Kishimura , et al. May 18, 2 | 2004-05-18 |
| Polymers, resist compositions and patterning process Grant 6,710,148 - Harada , et al. March 23, 2 | 2004-03-23 |
| Pattern forming material and method of pattern formation App 20040043321 - Kishimura, Shinji ; et al. | 2004-03-04 |
| Pattern-forming material and method of forming pattern App 20040029035 - Kishimura, Shinji ; et al. | 2004-02-12 |
| Polymers, resist compositions and patterning process App 20040030079 - Harada, Yuji ; et al. | 2004-02-12 |
| Pattern formation material and pattern formation method Grant 6,689,536 - Kishimura , et al. February 10, 2 | 2004-02-10 |
| Pattern formation method Grant 6,673,523 - Kishimura , et al. January 6, 2 | 2004-01-06 |
| Polymers, resist compositions and patterning process Grant 6,660,447 - Hatakeyama , et al. December 9, 2 | 2003-12-09 |
| Novel esters, polymers, resist compositions and patterning process App 20030219678 - Harada, Yuji ; et al. | 2003-11-27 |
| Polymers, resist compositions and patterning process App 20030215739 - Harada, Yuji ; et al. | 2003-11-20 |
| Polymers, resist compositions and patterning process App 20030215740 - Harada, Yuji ; et al. | 2003-11-20 |
| Pattern formation material and pattern formation method Grant 6,645,694 - Kishimura , et al. November 11, 2 | 2003-11-11 |
| Pattern formation material and pattern formation method Grant 6,632,582 - Kishimura , et al. October 14, 2 | 2003-10-14 |
| Polymers, resist compositions and patterning process App 20030165773 - Harada, Yuji ; et al. | 2003-09-04 |
| Ester compounds Grant 6,603,037 - Harada , et al. August 5, 2 | 2003-08-05 |
| Pattern formation material and pattern formation method App 20030113670 - Kishimura, Shinji ; et al. | 2003-06-19 |
| Novel Ester Compounds App 20030100791 - Harada, Yuji ; et al. | 2003-05-29 |
| Chemically amplified resist compositions and patterning process App 20030099901 - Hatakeyama, Jun ; et al. | 2003-05-29 |
| Pattern formation material and pattern formation method App 20030091930 - Kishimura, Shinji ; et al. | 2003-05-15 |
| Pattern formation method App 20030091941 - Kishimura, Shinji ; et al. | 2003-05-15 |
| Pattern formation material and pattern formation method App 20030087184 - Kishimura, Shinji ; et al. | 2003-05-08 |
| Polymers, resist compositions and patterning process App 20030082479 - Hatakeyama, Jun ; et al. | 2003-05-01 |
| Pattern formation method Grant 6,528,240 - Kishimura , et al. March 4, 2 | 2003-03-04 |
| Polymers, resist compositions and patterning process App 20030031952 - Harada, Yuji ; et al. | 2003-02-13 |
| Polymers, resist compositions and patterning process App 20030031953 - Hatakeyama, Jun ; et al. | 2003-02-13 |
| Polymers, resist compositions and patterning process App 20030008231 - Harada, Yuji ; et al. | 2003-01-09 |
| Pattern formation material and pattern formation method App 20020197557 - Kishimura, Shinji ; et al. | 2002-12-26 |
| Polymers, resist compositions and patterning process App 20020161148 - Harada, Yuji ; et al. | 2002-10-31 |
| Polymers, resist compositions and patterning process App 20020051937 - Hatakeyama, Jun ; et al. | 2002-05-02 |
| Polymers, resist compositions and patterning process App 20020051936 - Harada, Yuji ; et al. | 2002-05-02 |
| Resist compositions and patterning process App 20020051935 - Hatakeyama, Jun ; et al. | 2002-05-02 |
| Polymers, resist compositions and patterning process App 20020048724 - Harada, Yuji ; et al. | 2002-04-25 |
| Pattern formation material and pattern formation method App 20020039700 - Kishimura, Shinji ; et al. | 2002-04-04 |
| Pattern formation material and pattern formation method App 20020037471 - Kishimura, Shinji ; et al. | 2002-03-28 |
| Pattern formation material and pattern formation method App 20020012870 - Kishimura, Shinji ; et al. | 2002-01-31 |
| Pattern formation material and pattern formation method App 20020013059 - Kishimura, Shinji ; et al. | 2002-01-31 |
| Pattern formation method App 20010049075 - Kishimura, Shinji ; et al. | 2001-12-06 |
| Pattern formation material and method App 20010033999 - Kishimura, Shinji ; et al. | 2001-10-25 |
| Pattern formation material and method App 20010028989 - Kishimura, Shinji ; et al. | 2001-10-11 |
| Method of forming a resist pattern Grant 6,124,081 - Kishimura September 26, 2 | 2000-09-26 |
| Method of manufacturing a semiconductor device and a resist composition used therein Grant 5,591,654 - Kishimura January 7, 1 | 1997-01-07 |
| Method of forming and removing resist pattern Grant 5,426,016 - Fujioka , et al. June 20, 1 | 1995-06-20 |
| Method of forming patterns Grant 5,123,998 - Kishimura June 23, 1 | 1992-06-23 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 