| Patent | Date |
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Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
Grant 8,299,286 - Gardiner , et al. October 30, 2 | 2012-10-30 |
Source Reagent Compositions And Method For Forming Metal Films On A Substrate By Chemical Vapor Deposition
App 20110171382 - Gardiner; Robin A. ; et al. | 2011-07-14 |
Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
Grant 7,323,581 - Gardiner , et al. January 29, 2 | 2008-01-29 |
Plasma-assisted dry etching of noble metal-based materials
Grant 6,846,424 - Baum , et al. January 25, 2 | 2005-01-25 |
Isotropic dry cleaning process for noble metal integrated circuit structures
Grant 6,709,610 - Van Buskirk , et al. March 23, 2 | 2004-03-23 |
Isotropic dry cleaning process for noble metal integrated circuit structures
App 20020011463 - Buskirk, Peter C. Van ; et al. | 2002-01-31 |
Diffusion barriers between noble metal electrodes and metallization layers, and integrated circuit and semiconductor devices comprising same
Grant 6,320,213 - Kirlin , et al. November 20, 2 | 2001-11-20 |
Plasma-assisted dry etching of noble metal-based materials
App 20010024679 - Baum, Thomas H. ; et al. | 2001-09-27 |
Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery
Grant 6,204,180 - Tom , et al. March 20, 2 | 2001-03-20 |
Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same
Grant 6,132,492 - Hultquist , et al. October 17, 2 | 2000-10-17 |
Metal complex source reagents for chemical vapor deposition
Grant 6,126,996 - Kirlin , et al. October 3, 2 | 2000-10-03 |
Method of forming metal films on a substrate by chemical vapor deposition
Grant 6,110,529 - Gardiner , et al. August 29, 2 | 2000-08-29 |
Ferroelectric capacitor and integrated circuit device comprising same
Grant 6,072,689 - Kirlin June 6, 2 | 2000-06-06 |
Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members
Grant 6,019,823 - Tischler , et al. February 1, 2 | 2000-02-01 |
Chemical mechanical polishing of FeRAM capacitors
Grant 5,976,928 - Kirlin , et al. November 2, 1 | 1999-11-02 |
Bulk storage and dispensing system for fluids
Grant 5,961,697 - McManus , et al. October 5, 1 | 1999-10-05 |
Growth of BaSrTiO.sub.3 using polyamine-based precursors
Grant 5,919,522 - Baum , et al. July 6, 1 | 1999-07-06 |
Metal complex source reagents for chemical vapor deposition
Grant 5,840,897 - Kirlin , et al. November 24, 1 | 1998-11-24 |
Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same
Grant 5,820,664 - Gardiner , et al. October 13, 1 | 1998-10-13 |
Platinum source compositions for chemical vapor deposition of platinum
Grant 5,783,716 - Baum , et al. July 21, 1 | 1998-07-21 |
Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
Grant 5,711,816 - Kirlin , et al. January 27, 1 | 1998-01-27 |
Etching method for refractory materials
Grant 5,705,443 - Stauf , et al. January 6, 1 | 1998-01-06 |
Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same
Grant 5,679,815 - Kirlin , et al. October 21, 1 | 1997-10-21 |
Chemical vapor deposition of tantalum- or niobium-containing coatings
Grant 5,677,002 - Kirlin , et al. October 14, 1 | 1997-10-14 |
High-dielectric-constant material electrodes comprising thin platinum layers
Grant 5,576,928 - Summerfelt , et al. November 19, 1 | 1996-11-19 |
High-dielectric-constant material electrodes comprising thin platinum layers
Grant 5,566,045 - Summerfelt , et al. October 15, 1 | 1996-10-15 |
Apparatus for flash vaporization delivery of reagents
Grant 5,536,323 - Kirlin , et al. July 16, 1 | 1996-07-16 |
Metal complex source reagents for MOCVD
Grant 5,453,494 - Kirlin , et al. * September 26, 1 | 1995-09-26 |
Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem
Grant 5,362,328 - Gardiner , et al. November 8, 1 | 1994-11-08 |
Apparatus and method for protection of pumps used for delivery of air- or moisture-sensitive liquids
Grant 5,337,651 - Gardiner , et al. August 16, 1 | 1994-08-16 |
Source reagent compounds for MOCVD of refractory films containing group IIA elements
Grant 5,225,561 - Kirlin , et al. July 6, 1 | 1993-07-06 |
Method for delivering an involatile reagent in vapor form to a CVD reactor
Grant 5,204,314 - Kirlin , et al. April 20, 1 | 1993-04-20 |
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