Kinase; Yoshinori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kinase; Yoshinori.The latest application filed is for "photomask making method".

Company Profile

0.13.11

Kinase; Yoshinori - Joetsu N/A JP
KINASE; Yoshinori - Joetsu-shi JP
Kinase; Yoshinori - Niigata JP
Kinase; Yoshinori - Tokyo JP
Kinase; Yoshinori - Tokyo-to JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching method and photomask blank processing method Grant 8,920,666 - Igarashi , et al. December 30, 2	2014-12-30
Photomask making method Grant 8,309,277 - Igarashi , et al. November 13, 2	2012-11-13
Photomask Making Method App 20100316942 - IGARASHI; Shinichi ; et al.	2010-12-16
Etching Method And Photomask Blank Processing Method App 20100291478 - IGARASHI; Shinichi ; et al.	2010-11-18
Photomask blank, photomask and fabrication method thereof Grant 7,771,893 - Yoshikawa , et al. August 10, 2	2010-08-10
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof Grant 7,625,677 - Yoshikawa , et al. December 1, 2	2009-12-01
Photomask blank, photomask and fabrication method thereof Grant 7,625,676 - Yoshikawa , et al. December 1, 2	2009-12-01
Photomask blank, photomask and method for producing those Grant 7,618,753 - Yoshikawa , et al. November 17, 2	2009-11-17
Photomask Blank, Photomask and Method for Producing Those App 20070259276 - Yoshikawa; Hiroki ; et al.	2007-11-08
Mask for charged particle beam exposure, and method of forming the same Grant 7,232,631 - Morimoto , et al. June 19, 2	2007-06-19
Photomask blank, photomask and fabrication method thereof App 20070020534 - Yoshikawa; Hiroki ; et al.	2007-01-25
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof App 20060177746 - Yoshikawa; Hiroki ; et al.	2006-08-10
Photomask blank, photomask and fabrication method thereof App 20060088774 - Yoshikawa; Hiroki ; et al.	2006-04-27
Halftone phase shift photomask and blank for halftone phase shift photomask Grant 6,869,736 - Nakagawa , et al. March 22, 2	2005-03-22
Mask for charged particle beam exposure, and method of forming the same App 20050008946 - Morimoto, Kenichi ; et al.	2005-01-13
Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it Grant 6,764,792 - Fujikawa , et al. July 20, 2	2004-07-20
Photomask Grant 6,740,455 - Noguchi , et al. May 25, 2	2004-05-25
Halftone phase shift photomask and blank for halftone phase shift photomask App 20030186135 - Nakagawa, Hiro-o ; et al.	2003-10-02
Halftone phase shift photomask and blank for halftone phase shift photomask Grant 6,599,667 - Yusa , et al. July 29, 2	2003-07-29
Photomask App 20020119379 - Noguchi, Kenji ; et al.	2002-08-29
Halftone phase shift photomask and blank for halftone phase shift photomask App 20020039689 - Yusa, Satoshi ; et al.	2002-04-04
Blank for halftone phase shift photomask and halftone phase shift photomask App 20010005564 - Motonaga, Toshiaki ; et al.	2001-06-28
Polymeric material for liquid crystal/polymer composite film, record display medium, and use thereof Grant 5,851,422 - Saito , et al. December 22, 1	1998-12-22

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