Kim; Yihwan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kim; Yihwan.The latest application filed is for "semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same".

Company Profile

7.62.64

Kim; Yihwan - SUWON-SI KR
Kim; Yihwan - Seongnam-si KR
Kim; Yihwan - Milpitas CA
Kim; Yihwan - Hwasung-si KR
Kim; Yihwan - San Jose CA
Kim, Yihwan - San Mateo CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor Device Including Barrier Layer Between Active Region And Semiconductor Layer And Method Of Forming The Same App 20220254878 - Lim; Sungkeun ; et al.	2022-08-11
Semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same Grant 11,322,583 - Lim , et al. May 3, 2	2022-05-03
Semiconductor device Grant 11,171,224 - Suh , et al. November 9, 2	2021-11-09
Semiconductor Device Including Barrier Layer Between Active Region And Semiconductor Layer And Method Of Forming The Same App 20200373385 - Lim; Sungkeun ; et al.	2020-11-26
Semiconductor Device App 20200303523 - SUH; Dong Chan ; et al.	2020-09-24
Methods and apparatus for deposition processes Grant 10,731,272 - Myo , et al.	2020-08-04
Semiconductor device and method for manufacturing the same Grant 10,692,993 - Suh , et al.	2020-06-23
Methods And Apparatus For Deposition Processes App 20190257000 - MYO; NYI O. ; et al.	2019-08-22
Semiconductor devices and method of fabricating the same Grant 10,304,834 - Lee , et al.	2019-05-28
Methods and apparatus for deposition processes Grant 10,260,164 - Myo , et al.	2019-04-16
Semiconductor Device And Method For Manufacturing The Same App 20190081160 - SUH; Dong Chan ; et al.	2019-03-14
Semiconductor Devices And Method Of Fabricating The Same App 20190067285 - LEE; Sangmoon ; et al.	2019-02-28
Substrate treating apparatus Grant 10,208,401 - Park , et al. Feb	2019-02-19
Substrate Treating Apparatus App 20180266017 - PARK; KEUM SEOK ; et al.	2018-09-20
Methods And Apparatus For Deposition Processes App 20170314158 - MYO; NYI O. ; et al.	2017-11-02
Method of modifying epitaxial growth shape on source drain area of transistor Grant 9,805,942 - Kim , et al. October 31, 2	2017-10-31
Method of forming strain-relaxed buffer layers Grant 9,721,792 - Huang , et al. August 1, 2	2017-08-01
Halogenated dopant precursors for epitaxy Grant 9,704,708 - Dube , et al. July 11, 2	2017-07-11
Methods and apparatus for forming horizontal gate all around device structures Grant 9,673,277 - Brand , et al. June 6, 2	2017-06-06
Methods and apparatus for deposition processes Grant 9,650,726 - Myo , et al. May 16, 2	2017-05-16
Method Of Modifying Epitaxial Growth Shape On Source Drain Area Of Transistor App 20170098547 - KIM; Yihwan ; et al.	2017-04-06
Method of modifying epitaxial growth shape on source drain area of transistor Grant 9,530,661 - Kim , et al. December 27, 2	2016-12-27
Epitaxy of high tensile silicon alloy for tensile strain applications Grant 9,460,918 - Ye , et al. October 4, 2	2016-10-04
Methods And Apparatus For Forming Horizontal Gate All Around Device Structures App 20160111495 - BRAND; ADAM ; et al.	2016-04-21
Method Of Modifying Epitaxial Growth Shape On Source Drain Area Of Transistor App 20160042963 - KIM; Yihwan ; et al.	2016-02-11
Halogenated Dopant Precursors For Epitaxy App 20160013274 - DUBE; Abhishek ; et al.	2016-01-14
Apparatus For Gas Injection To Epitaxial Chamber App 20150368796 - LI; Xuebin ; et al.	2015-12-24
Method and apparatus for gas delivery Grant 9,200,367 - Ye , et al. December 1, 2	2015-12-01
Carbon Addition For Low Resistivity In Situ Doped Silicon Epitaxy App 20150221730 - YE; Zhiyuan ; et al.	2015-08-06
Selective epitaxy process control Grant 9,064,960 - Lam , et al. June 23, 2	2015-06-23
Methods for depositing layers having reduced interfacial contamination Grant 9,058,988 - Vatus , et al. June 16, 2	2015-06-16
Carbon addition for low resistivity in situ doped silicon epitaxy Grant 9,012,328 - Ye , et al. April 21, 2	2015-04-21
Fin formation by epitaxial deposition Grant 8,999,821 - Brand , et al. April 7, 2	2015-04-07
Method Of Forming Strain-relaxed Buffer Layers App 20150079803 - HUANG; Yi-Chiau ; et al.	2015-03-19
Fin Formation By Epitaxial Deposition App 20150050800 - Brand; Adam ; et al.	2015-02-19
Method and apparatus for gas delivery Grant 8,927,066 - Ye , et al. January 6, 2	2015-01-06
Method of removing contaminants and native oxides from a substrate surface Grant 8,728,944 - Kuppurao , et al. May 20, 2	2014-05-20
Epitaxy Of High Tensile Silicon Alloy For Tensile Strain Applications App 20140106547 - YE; Zhiyuan ; et al.	2014-04-17
Selective epitaxial germanium growth on silicon-trench fill and in situ doping Grant 8,652,951 - Huang , et al. February 18, 2	2014-02-18
Epitaxy of high tensile silicon alloy for tensile strain applications Grant 8,652,945 - Ye , et al. February 18, 2	2014-02-18
Method Of Semiconductor Film Stabilization App 20130330911 - HUANG; Yi-Chiau ; et al.	2013-12-12
Use of CL2 and/or HCL during silicon epitaxial film formation Grant 8,586,456 - Ye , et al. November 19, 2	2013-11-19
Method And Apparatus For Germanium Tin Alloy Formation By Thermal Cvd App 20130280891 - KIM; YIHWAN ; et al.	2013-10-24
Selective Epitaxial Germanium Growth On Silicon-trench Fill And In Situ Doping App 20130210221 - HUANG; YI-CHIAU ; et al.	2013-08-15
Formation of in-situ phosphorus doped epitaxial layer containing silicon and carbon Grant 8,394,196 - Kim March 12, 2	2013-03-12
Method And Apparatus For Gas Delivery App 20120273052 - YE; ZHIYUAN ; et al.	2012-11-01
Method And Apparatus For Gas Delivery App 20120272898 - Ye; Zhiyuan ; et al.	2012-11-01
Epitaxy Of High Tensile Silicon Alloy For Tensile Strain Applications App 20120202338 - Ye; Zhiyuan ; et al.	2012-08-09
Carbon Addition For Low Resistivity In Situ Doped Silicon Epitaxy App 20120193623 - Ye; Zhiyuan ; et al.	2012-08-02
Methods of selectively depositing an epitaxial layer Grant 8,207,023 - Ye , et al. June 26, 2	2012-06-26
Method Of Removing Contaminants And Native Oxides From A Substrate Surface App 20120034761 - Kuppurao; Satheesh ; et al.	2012-02-09
Methods Of Selectively Depositing An Epitaxial Layer App 20110277934 - Ye; Zhiyuan ; et al.	2011-11-17
Methods of forming carbon-containing silicon epitaxial layers Grant 8,029,620 - Kim , et al. October 4, 2	2011-10-04
Use Of Cl2 And/or Hcl During Silicon Epitaxial Film Formation App 20110230036 - Ye; Zhiyuan ; et al.	2011-09-22
Methods And Apparatus For Deposition Processes App 20110209660 - MYO; NYI O. ; et al.	2011-09-01
Use of CL2 and/or HCL during silicon epitaxial film formation Grant 7,960,256 - Ye , et al. June 14, 2	2011-06-14
Phosphorus containing Si epitaxial layers in N-type source/drain junctions Grant 7,960,236 - Chopra , et al. June 14, 2	2011-06-14
Methods Of Selectively Depositing An Epitaxial Layer App 20110124169 - YE; ZHIYUAN ; et al.	2011-05-26
Formation of epitaxial layer containing silicon and carbon Grant 7,897,495 - Ye , et al. March 1, 2	2011-03-01
Formation and treatment of epitaxial layer containing silicon and carbon Grant 7,837,790 - Kim , et al. November 23, 2	2010-11-23
Methods For Depositing Layers Having Reduced Interfacial Contamination App 20100255661 - VATUS; JEAN R. ; et al.	2010-10-07
Use Of Cl2 And/or Hcl During Silicon Epitaxial Film Formation App 20100221902 - Ye; Zhiyuan ; et al.	2010-09-02
Selective formation of silicon carbon epitaxial layer Grant 7,776,698 - Ye , et al. August 17, 2	2010-08-17
Method of forming conformal silicon layer for recessed source-drain Grant 7,772,074 - Ye , et al. August 10, 2	2010-08-10
Formation and treatment of epitaxial layer containing silicon and carbon Grant 7,741,200 - Cho , et al. June 22, 2	2010-06-22
Methods to fabricate MOSFET devices using a selective deposition process Grant 7,737,007 - Samoilov , et al. June 15, 2	2010-06-15
Use of Cl2 and/or HCl during silicon epitaxial film formation Grant 7,732,305 - Ye , et al. June 8, 2	2010-06-08
Method of ultra-shallow junction formation using Si film alloyed with carbon Grant 7,732,269 - Kim , et al. June 8, 2	2010-06-08
Method of forming an embedded silicon carbon epitaxial layer Grant 7,700,424 - Boland , et al. April 20, 2	2010-04-20
Use of Cl2 and/or HCl during silicon epitaxial film formation Grant 7,682,940 - Ye , et al. March 23, 2	2010-03-23
Gas manifolds for use during epitaxial film formation Grant 7,674,337 - Ishikawa , et al. March 9, 2	2010-03-09
Pre-cleaning of substrates in epitaxy chambers Grant 7,651,948 - Kim , et al. January 26, 2	2010-01-26
Carbon precursors for use during silicon epitaxial film formation Grant 7,598,178 - Samoilov , et al. October 6, 2	2009-10-06
Methods of controlling morphology during epitaxial layer formation Grant 7,588,980 - Kim , et al. September 15, 2	2009-09-15
Method Of Forming An Embedded Silicon Carbon Epitaxial Layer App 20090215249 - Boland; John ; et al.	2009-08-27
Selective epitaxy process with alternating gas supply Grant 7,572,715 - Kim , et al. August 11, 2	2009-08-11
Selective deposition Grant 7,560,352 - Carlson , et al. July 14, 2	2009-07-14
Method Of Forming Conformal Silicon Layer For Recessed Source-drain App 20090104739 - Ye; Zhiyuan ; et al.	2009-04-23
Selective epitaxy process with alternating gas supply Grant 7,521,365 - Kim , et al. April 21, 2	2009-04-21
Methods of selective deposition of heavily doped epitaxial SiGe Grant 7,517,775 - Kim , et al. April 14, 2	2009-04-14
Selective Formation of Silicon Carbon Epitaxial Layer App 20090093094 - Ye; Zhiyuan ; et al.	2009-04-09
Epitaxial deposition process and apparatus Grant 7,494,545 - Lam , et al. February 24, 2	2009-02-24
Methods To Fabricate Mosfet Devices Using A Selective Deposition Process App 20090011578 - SAMOILOV; ARKADII V. ; et al.	2009-01-08
Methods to fabricate MOSFET devices using a selective deposition process Grant 7,439,142 - Samoilov , et al. October 21, 2	2008-10-21
Pre-cleaning of substrates in epitaxy chambers App 20080245767 - Kim; Yihwan ; et al.	2008-10-09
Phosphorus Containing Si Epitaxial Layers in N-Type Source/Drain Junctions App 20080182075 - Chopra; Saurabh ; et al.	2008-07-31
Selective Epitaxy Process Control App 20080182397 - Lam; Andrew ; et al.	2008-07-31
Formation Of In-situ Phosphorus Doped Epitaxial Layer Containing Silicon And Carbon App 20080138939 - Kim; Yihwan	2008-06-12
Formation Of Epitaxial Layer Containing Silicon App 20080138955 - Ye; Zhiyuan ; et al.	2008-06-12
Formation of Epitaxial Layer Containing Silicon and Carbon App 20080138964 - Ye; Zhiyuan ; et al.	2008-06-12
Formation And Treatment Of Epitaxial Layer Containing Silicon And Carbon App 20080132018 - KIM; YIHWAN ; et al.	2008-06-05
Formation And Treatment Of Epitaxial Layer Containing Silicon And Carbon App 20080131619 - CHO; YONAH ; et al.	2008-06-05
Formation And Treatment Of Epitaxial Layer Containing Silicon And Carbon App 20080132039 - CHO; YONAH ; et al.	2008-06-05
Carbon Precursors For Use During Silicon Epitaxial Film Formation App 20080044932 - SAMOILOV; ARKADII V. ; et al.	2008-02-21
Methods Of Controlling Morphology During Epitaxial Layer Formation App 20080026549 - Kim; Yihwan ; et al.	2008-01-31
Methods Of Forming Carbon-containing Silicon Epitaxial Layers App 20080022924 - Kim; Yihwan ; et al.	2008-01-31
Selective epitaxy process with alternating gas supply Grant 7,312,128 - Kim , et al. December 25, 2	2007-12-25
Method Of Ultra-shallow Junction Formation Using Si Film Alloyed With Carbon App 20070256627 - KIM; YIHWAN ; et al.	2007-11-08
Gas Manifolds For Use During Epitaxial Film Formation App 20070259112 - Ishikawa; David ; et al.	2007-11-08
Selective Epitaxy Process With Alternating Gas Supply App 20070207596 - Kim; Yihwan ; et al.	2007-09-06
Epitaxial deposition process and apparatus App 20070181057 - Lam; Andrew ; et al.	2007-08-09
Methods To Fabricate Mosfet Devices Using A Selective Deposition Process App 20070082451 - SAMOILOV; ARKADII V. ; et al.	2007-04-12
Methods of selective deposition of heavily doped epitaxial SiGe Grant 7,166,528 - Kim , et al. January 23, 2	2007-01-23
Use of Cl2 and/or HCl during silicon epitaxial film formation App 20060260538 - Ye; Zhiyuan ; et al.	2006-11-23
Methods to fabricate MOSFET devices using selective deposition process Grant 7,132,338 - Samoilov , et al. November 7, 2	2006-11-07
METHODS OF SELECTIVE DEPOSITION OF HEAVILY DOPED EPITAXIAL SiGe App 20060234488 - Kim; Yihwan ; et al.	2006-10-19
Selective Epitaxy Process With Alternating Gas Supply App 20060216876 - Kim; Yihwan ; et al.	2006-09-28
Selective deposition App 20060166414 - Carlson; David K. ; et al.	2006-07-27
Use of CL2 and/or HCL during silicon epitaxial film formation App 20060115933 - Ye; Zhiyuan ; et al.	2006-06-01
Selective epitaxy process with alternating gas supply App 20060115934 - Kim; Yihwan ; et al.	2006-06-01
Methods to fabricate MOSFET devices using selective deposition process App 20050079692 - Samoilov, Arkadii V. ; et al.	2005-04-14
Methods of selective deposition of heavily doped epitaxial SiGe App 20050079691 - Kim, Yihwan ; et al.	2005-04-14
Process for growing epitaxial gallium nitride and composite wafers App 20020005566 - Weber, Eicke R. ; et al.	2002-01-17

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