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name:-0.013499975204468
name:-0.0079460144042969
name:-0.0032379627227783
Kim; SeongSue Patent Filings

Kim; SeongSue

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kim; SeongSue.The latest application filed is for "phase shift mask for extreme ultraviolet lithography and a method of manufacturing a semiconductor device using the same".

Company Profile
2.8.13
  • Kim; SeongSue - Seoul KR
  • Kim; Seongsue - Hwasung-si KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Phase-shift mask for extreme ultraviolet lithography
Grant 11,372,323 - Seo , et al. June 28, 2
2022-06-28
Phase Shift Mask For Extreme Ultraviolet Lithography And A Method Of Manufacturing A Semiconductor Device Using The Same
App 20210389662 - SEO; Hwanseok ;   et al.
2021-12-16
Phase Shift Masks For Extreme Ultraviolet Lithography
App 20210318608 - KIM; SEONGSUE ;   et al.
2021-10-14
Apparatus And Method For Measuring Phase Of Extreme Ultraviolet (euv) Mask And Method Of Fabricating Euv Mask Including The Method
App 20210293701 - Park; Jongju ;   et al.
2021-09-23
Phase-shift mask for extreme ultraviolet lithography
Grant 10,719,008 - Seo , et al.
2020-07-21
Phase-shift Mask For Extreme Ultraviolet Lithography
App 20200209732 - SEO; Hwanseok ;   et al.
2020-07-02
EUV light generator including collecting mirror having drip hole
Grant 10,401,602 - Kim , et al. Sep
2019-09-03
Reflective photomask, method of fabricating the same, and exposure apparatus using the reflective photomask
Grant 10,126,642 - Kim , et al. November 13, 2
2018-11-13
Reticle and exposure apparatus including the same
Grant 9,996,001 - Kim , et al. June 12, 2
2018-06-12
Phase-shift Mask For Extreme Ultraviolet Lithography
App 20180143527 - SEO; Hwanseok ;   et al.
2018-05-24
Reticle And Exposure Apparatus Including The Same
App 20170131638 - KIM; Insung ;   et al.
2017-05-11
Reflective Photomask, Method Of Fabricating The Same, And Exposure Apparatus Using The Reflective Photomask
App 20170108767 - KIM; INSUNG ;   et al.
2017-04-20
Euv Light Generator Including Collecting Mirror Having Drip Hole
App 20170059837 - KIM; Hoyeon ;   et al.
2017-03-02
Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devices
Grant 9,466,490 - Kim , et al. October 11, 2
2016-10-11
Beam Shapers, Annealing Systems Employing The Same, Methods Of Heat Treating Substrates And Methods Of Fabricating Semiconductor Devices
App 20150311078 - Kim; Sanghyun ;   et al.
2015-10-29
Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devices
Grant 9,087,698 - Kim , et al. July 21, 2
2015-07-21
Photomasks And Methods Of Fabricating Semiconductor Devices Using The Same
App 20140220481 - Kim; Mun Ja ;   et al.
2014-08-07
Beam Shapers, Annealing Systems Employing The Same, Methods Of Heat Treating Substrates And Methods Of Fabricating Semiconductor Devices
App 20140076867 - Kim; Sanghyun ;   et al.
2014-03-20

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