Patent | Date |
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Extreme ultraviolet light source device Grant 9,867,267 - Lee , et al. January 9, 2 | 2018-01-09 |
Method of manufacturing a semiconductor device Grant 9,791,788 - Heo , et al. October 17, 2 | 2017-10-17 |
Reflective extreme ultraviolet mask Grant 9,658,522 - Kim , et al. May 23, 2 | 2017-05-23 |
Reflective masks for use in extreme ultraviolet lithography apparatus and methods of manufacturing the same Grant 9,645,484 - Kim , et al. May 9, 2 | 2017-05-09 |
Method Of Manufacturing A Semiconductor Device App 20160268176 - HEO; Jin-seok ;   et al. | 2016-09-15 |
Reflective Extreme Ultraviolet Mask App 20160154296 - KIM; Sang-Hyun ;   et al. | 2016-06-02 |
Extreme Ultraviolet Light Source Device And Method Of Generating Extreme Ultra-violet Light App 20160143121 - Lee; Seung-Koo ;   et al. | 2016-05-19 |
Reflective Masks For Use In Extreme Ultraviolet Lithography Apparatus And Methods Of Manufacturing The Same App 20160116835 - KIM; Seong-sue ;   et al. | 2016-04-28 |
Method of correcting flare and method of preparing extreme ultra violet mask Grant 9,116,438 - Lee , et al. August 25, 2 | 2015-08-25 |
Apparatus And Method For Generating Extreme Ultra Violet Radiation App 20140264089 - Kim; In-Sung ;   et al. | 2014-09-18 |
Exposing Method And Method Of Forming A Pattern Using The Same App 20140213054 - KIM; In-Sung ;   et al. | 2014-07-31 |
Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuck Grant 8,599,360 - Heo , et al. December 3, 2 | 2013-12-03 |
Methods of forming fine patterns using a nanoimprint lithography Grant 8,287,792 - Lee , et al. October 16, 2 | 2012-10-16 |
Method Of Correcting Flare And Method Of Preparing Extreme Ultra Violet Mask App 20120224156 - Lee; Young-Mi ;   et al. | 2012-09-06 |
Flare evaluation methods Grant 8,158,958 - Kim , et al. April 17, 2 | 2012-04-17 |
Reflective photomask and method of fabricating, reflective illumination system and method of process using the same Grant 8,119,309 - Lee , et al. February 21, 2 | 2012-02-21 |
Exposure Apparatus And Exposing Method Using The Apparatus App 20110294074 - LEE; Ji-Eun ;   et al. | 2011-12-01 |
Systems and methods for UV lithography Grant 8,006,202 - Lorusso , et al. August 23, 2 | 2011-08-23 |
Reflective Reticle Chuck, Reflective Illumination System Including The Same, Method Of Controlling Flatness Of Reflective Reticle Using The Chuck, And Method Of Manufacturing Semiconductor Device Using The Chuck App 20110128518 - HEO; Jin-Seok ;   et al. | 2011-06-02 |
Flare Evaluation Methods App 20100258744 - Kim; In-Sung ;   et al. | 2010-10-14 |
Wafer Cleaning Method And Wafer Bonding Method Using The Same App 20100261332 - Kim; In Sung ;   et al. | 2010-10-14 |
Nanoimprint Lithography Template and Method of Fabricating Semiconductor Device Using the Same App 20100230864 - Park; Chang-min ;   et al. | 2010-09-16 |
Reflective photomask and method of fabricating, reflective illumination system and method of process using the same App 20100216062 - Lee; Dong-Gun ;   et al. | 2010-08-26 |
Methods of forming fine patterns using a nanoimprint lithography App 20100190340 - Lee; Jeong-Hoon ;   et al. | 2010-07-29 |
Stencil mask having main and auxiliary strut and method of forming the same Grant 7,635,547 - Kim , et al. December 22, 2 | 2009-12-22 |
Phase shifting mask for manufacturing semiconductor device and method of fabricating the same Grant 7,473,497 - Kim , et al. January 6, 2 | 2009-01-06 |
Method of fabricating photo mask Grant 7,475,383 - Suh , et al. January 6, 2 | 2009-01-06 |
Antioxidant Fermenting Microorganism Agent Reducing Volatile Organic Compounds From Polyurethane Foam, and Urethane Foam Comprising the Same App 20090004718 - Lim; Taek ;   et al. | 2009-01-01 |
Stencil Mask Having Main And Auxiliary Strut And Method Of Forming The Same App 20080268353 - KIM; In-Sung ;   et al. | 2008-10-30 |
Systems And Methods For Uv Lithography App 20080229273 - Lorusso; Gian Francesco ;   et al. | 2008-09-18 |
Stencil mask having main and auxiliary strut and method of forming the same Grant 7,384,711 - Kim , et al. June 10, 2 | 2008-06-10 |
Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same Grant 7,361,433 - Hwang , et al. April 22, 2 | 2008-04-22 |
Photomask for forming small contact hole array and methods of fabricating and using the same Grant 7,300,746 - Kim November 27, 2 | 2007-11-27 |
Pattern Arrangement Method Of Semiconductor Device App 20070264584 - KIM; In-Sung ;   et al. | 2007-11-15 |
Method of fabricating photo mask App 20070162887 - Suh; Sung-Soo ;   et al. | 2007-07-12 |
Liquid crystal television container App 20070035671 - Ryu; Doc Hee ;   et al. | 2007-02-15 |
Photomask for forming small contact hole array and methods of fabricating and using the same App 20060110684 - Kim; In-sung | 2006-05-25 |
Photomask for forming small contact hole array and methods of fabricating and using the same Grant 7,022,438 - Kim April 4, 2 | 2006-04-04 |
Phase shifting mask for manufacturing semiconductor device and method of fabricating the same App 20050164100 - Kim, In-sung ;   et al. | 2005-07-28 |
Phase shifting mask for manufacturing semiconductor device and method of fabricating the same Grant 6,893,779 - Kim , et al. May 17, 2 | 2005-05-17 |
Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same App 20050003278 - Hwang, Chan ;   et al. | 2005-01-06 |
Stencil mask having main and auxiliary strut and method of forming the same App 20040265744 - Kim, In-Sung ;   et al. | 2004-12-30 |
Semiconductor device having self-aligned contact and method of fabricating the same Grant 6,716,746 - Kim , et al. April 6, 2 | 2004-04-06 |
Photomask for forming small contact hole array and methods of fabricating and using the same App 20040018435 - Kim, In-sung | 2004-01-29 |
Phase shifting mask for manufacturing semiconductor device and method of fabricating the same App 20020137361 - Kim, In-sung ;   et al. | 2002-09-26 |