Kim; Hyeongeu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kim; Hyeongeu.The latest application filed is for "reactor system and method to reduce residue buildup during a film deposition process".

Company Profile

5.4.6

Kim; Hyeongeu - Phoenix AZ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reactor System And Method To Reduce Residue Buildup During A Film Deposition Process App 20220307139 - Kim; Hyeongeu ; et al.	2022-09-29
Reactor system and method to reduce residue buildup during a film deposition process Grant 11,390,950 - Kim , et al. July 19, 2	2022-07-19
Methods for thermally calibrating reaction chambers Grant 10,943,771 - Kim , et al. March 9, 2	2021-03-09
System And Method For Thermally Calibrating Semiconductor Process Chambers App 20200333189 - Leow; Yen Lin ; et al.	2020-10-22
System and method for thermally calibrating semiconductor process chambers Grant 10,732,046 - Leow , et al.	2020-08-04
Methods For Thermally Calibrating Reaction Chambers App 20200227243 - Kim; Hyeongeu ; et al.	2020-07-16
Methods for thermally calibrating reaction chambers Grant 10,643,826 - Kim , et al.	2020-05-05
System And Method For Thermally Calibrating Semiconductor Process Chambers App 20200080894 - Leow; Yen Lin ; et al.	2020-03-12
Reactor System And Method To Reduce Residue Buildup During A Film Deposition Process App 20180195174 - Kim; Hyeongeu ; et al.	2018-07-12
Methods For Thermally Calibrating Reaction Chambers App 20180114680 - Kim; Hyeongeu ; et al.	2018-04-26

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