KIM; Hyeong Soo

Patent Applications and Registrations

Patent applications and USPTO patent grants for KIM; Hyeong Soo.The latest application filed is for "memory system, data processing system and method of operating the same".

Company Profile

1.14.15

KIM; Hyeong Soo - Gyeonggi-do KR
Kim; Hyeong Soo - Yongin-Si KR
Kim; Hyeong-Soo - Ichon-shi KR
Kim; Hyeong-Soo - Kyoungki-do KR
Kim; Hyeong-Soo - Yicheon-shi KR
Kim; Hyeong Soo - Shinha-Ri Bubal-Uep KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Memory System, Data Processing System And Method Of Operating The Same App 20220180915 - KIM; Hyeong Soo ; et al.	2022-06-09
Data Processing System And Method Of Operating The Same App 20190341097 - KIM; Hyeong Soo ; et al.	2019-11-07
Mask and method of fabricating the same Grant 8,057,965 - Kim November 15, 2	2011-11-15
Method For Manufacturing Semiconductor Device App 20100099046 - Kim; Hyeong Soo ; et al.	2010-04-22
Mask and Method of Fabricating the Same App 20090170013 - Kim; Hyeong Soo	2009-07-02
Liquid Composition for Immersion Lithography and Lithography Method Using the Same App 20080176047 - Kong; Keun Kyu ; et al.	2008-07-24
Semiconductor device and method for fabricating the same Grant 7,339,211 - Kim , et al. March 4, 2	2008-03-04
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same Grant 7,329,477 - Jung , et al. February 12, 2	2008-02-12
Semiconductor Device And Method For Fabricating The Same App 20070085128 - KIM; Dong-Sauk ; et al.	2007-04-19
Top-coating composition for photoresist and process for forming fine pattern using the same Grant 6,984,482 - Jung , et al. January 10, 2	2006-01-10
Liquid composition for immersion lithography and lithography method using the same App 20050260528 - Kong, Keun Kyu ; et al.	2005-11-24
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same App 20050069816 - Jung, Jae Chang ; et al.	2005-03-31
Alignment mark for aligning wafer of semiconductor device Grant 6,864,590 - Bae , et al. March 8, 2	2005-03-08
Semiconductor device and method for fabricating the same App 20050018525 - Kim, Dong-Sauk ; et al.	2005-01-27
Alignment Mark For Aligning Wafer Of Semiconductor Device App 20040261282 - Bae, Sang-Man ; et al.	2004-12-30
Reflection-inhibiting resin used in process for forming photoresist pattern Grant 6,797,451 - Hong , et al. September 28, 2	2004-09-28
Process for forming a photoresist pattern comprising alkaline treatment Grant 6,699,644 - Lee , et al. March 2, 2	2004-03-02
Photoresist composition for resist flow process and process for forming a contact hole using the same Grant 6,627,384 - Kim , et al. September 30, 2	2003-09-30
Top-coating composition for photoresist and process for forming fine pattern using the same App 20030108815 - Jung, Jae Chang ; et al.	2003-06-12
Reflection-inhibiting resinn used in process for forming photoresist pattern App 20030018150 - Hong, Sung Eun ; et al.	2003-01-23
Anti reflective coating polymers and the preparation method thereof Grant 6,492,441 - Hong , et al. December 10, 2	2002-12-10
Anti reflective coating polymers and the preparation method thereof App 20020120070 - Hong, Sung-Eun ; et al.	2002-08-29
Photoresist cross-linker and photoresist composition comprising the same Grant 6,368,773 - Jung , et al. April 9, 2	2002-04-09
Novel photoresist polymers, and photoresist compositions containing the same App 20020018960 - Lee, Geun Su ; et al.	2002-02-14
Novel photoresist cross-linker and photoresist composition comprising the same App 20020019560 - Kong, Keun Kyu ; et al.	2002-02-14
Photoresist cross-linker and photoresist composition comprising the same Grant 6,312,868 - Kong , et al. November 6, 2	2001-11-06
Mask for use in stitching exposure process Grant 5,922,495 - Kim July 13, 1	1999-07-13
Method for forming micro patterns of semiconductor devices Grant 5,821,034 - Kim , et al. October 13, 1	1998-10-13
Method of removing a silylated or germanium implanted photoresist Grant 5,491,047 - Kim , et al. February 13, 1	1996-02-13

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