| Patent | Date |
|---|
Method of forming an electronic device including forming features within a mask and a selective removal process
Grant 8,003,545 - Lukanc , et al. August 23, 2 | 2011-08-23 |
Method and apparatus for optimizing an optical proximity correction model
Grant 7,788,609 - Kim , et al. August 31, 2 | 2010-08-31 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
Grant 7,657,864 - Tabery , et al. February 2, 2 | 2010-02-02 |
Method And Apparatus For Optimizing An Optical Proximity Correction Model
App 20090249261 - KIM; HUNG-EIL ; et al. | 2009-10-01 |
Method Of Forming An Electronic Device Including Forming Features Within A Mask And A Selective Removal Process
App 20090209107 - Lukanc; Todd ; et al. | 2009-08-20 |
System and method for designing an integrated circuit device
Grant 7,543,256 - Lukanc , et al. June 2, 2 | 2009-06-02 |
Method of forming narrowly spaced flash memory contact openings and lithography masks
Grant 7,507,661 - Lingunis , et al. March 24, 2 | 2009-03-24 |
Mask CD measurement monitor outside of the pellicle area
Grant 7,422,828 - Kim September 9, 2 | 2008-09-09 |
System and method for fabricating contact holes
Grant 7,384,725 - Minvielle , et al. June 10, 2 | 2008-06-10 |
Two mask photoresist exposure pattern for dense and isolated regions
Grant 7,368,225 - Subramanian , et al. May 6, 2 | 2008-05-06 |
Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin
Grant 7,313,769 - Lukanc , et al. December 25, 2 | 2007-12-25 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
Grant 7,269,804 - Tabery , et al. September 11, 2 | 2007-09-11 |
System And Method For Integrated Circuit Device Design And Manufacture Using Optical Rule Checking To Screen Resolution Enhancement Techniques
App 20070209030 - Tabery; Cyrus E. ; et al. | 2007-09-06 |
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
Grant 7,207,017 - Tabery , et al. April 17, 2 | 2007-04-17 |
System and method for design rule creation and selection
Grant 7,194,725 - Lukanc , et al. March 20, 2 | 2007-03-20 |
Method of verifying an optical proximity correction (OPC) model
Grant 7,065,738 - Kim June 20, 2 | 2006-06-20 |
Patterning for elongated V.sub.SS contact flash memory
Grant 7,018,922 - Kim , et al. March 28, 2 | 2006-03-28 |
Method of forming narrowly spaced flash memory contact openings and lithography masks
App 20060035459 - Lingunis; Emmanuil H. ; et al. | 2006-02-16 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
App 20050229125 - Tabery, Cyrus E. ; et al. | 2005-10-13 |
System and method for fabricating contact holes
App 20050221233 - Minvielle, Anna M. ; et al. | 2005-10-06 |
Patterning for elliptical Vss contact on flash memory
Grant 6,900,124 - Kim , et al. May 31, 2 | 2005-05-31 |
Method and system for determining flow rates for contact formation
Grant 6,811,932 - Kim November 2, 2 | 2004-11-02 |
Accurate contact critical dimension measurement using variable threshold method
Grant 6,581,023 - Kim June 17, 2 | 2003-06-17 |
Dark field trench in an alternating phase shift mask to avoid phase conflict
App 20020160275 - Kim, Hung-Eil | 2002-10-31 |
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