Kim; Hee Bom

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kim; Hee Bom.The latest application filed is for "systems and methods using mask pattern measurements performed with compensated light signals".

Company Profile

4.26.29

Kim; Hee Bom - Hwaseong-si KR
Kim; Hee-Bom - Seoul KR
Kim; Hee-bom - Seongnam-si KR
Kim; Hee-bom - Suwon-si KR
Kim; Hee-Bom - Gyeonggi-do KR
Kim; Hee-Bom - Ichon-shi KR
Kim; Hee Bom - Ichon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Systems and methods using mask pattern measurements performed with compensated light signals Grant 11,281,093 - Na , et al. March 22, 2	2022-03-22
Systems And Methods Using Mask Pattern Measurements Performed With Compensated Light Signals App 20210302828 - Na; Ji Hoon ; et al.	2021-09-30
Apparatus for manufacturing pellicle Grant 11,067,887 - Kim , et al. July 20, 2	2021-07-20
Systems and methods using mask pattern measurements performed with compensated light signals Grant 11,061,322 - Na , et al. July 13, 2	2021-07-13
Apparatus For Manufacturing Pellicle App 20200333701 - KIM; Mun-Ja ; et al.	2020-10-22
Method of manufacturing pellicle and apparatus for assembling pellicle Grant 10,747,104 - Kim , et al. A	2020-08-18
Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle Grant 10,437,143 - Jeon , et al. O	2019-10-08
Systems And Methods Using Mask Pattern Measurements Performed With Compensated Light Signals App 20190235387 - Na; Ji Hoon ; et al.	2019-08-01
Pellicle For Exposure To Extreme Ultraviolet Light, Photomask Assembly, And Method Of Manufacturing The Pellicle App 20180284599 - JEON; Hwan-chul ; et al.	2018-10-04
Method Of Manufacturing Pellicle And Apparatus For Assembling Pellicle App 20180275508 - KIM; Mun-Ja ; et al.	2018-09-27
Method for manufacturing photomask and photomask manufactured using the same Grant 8,673,522 - Choi , et al. March 18, 2	2014-03-18
Method of forming photomask using calibration pattern, and photomask having calibration pattern Grant 8,522,172 - Yoon , et al. August 27, 2	2013-08-27
Methods of forming semiconductor devices using photolithographic shot grouping Grant 8,475,980 - Choi , et al. July 2, 2	2013-07-02
Method For Manufacturing Photomask And Photomask Manufactured Using The Same App 20130143150 - CHOI; JIN ; et al.	2013-06-06
Methods Of Estimating Point Spread Functions In Electron-beam Lithography Processes App 20120314198 - Lee; Sang-Hee ; et al.	2012-12-13
Pattern forming method Grant 8,329,381 - Choi , et al. December 11, 2	2012-12-11
Method for inspecting critical dimension uniformity at high speed measurement Grant 8,213,722 - Kim , et al. July 3, 2	2012-07-03
Method Of Forming Photomask Using Calibration Pattern, And Photomask Having Calibration Pattern App 20120159405 - YOON; Young-keun ; et al.	2012-06-21
Pattern Forming Method App 20120148959 - CHOI; Jin ; et al.	2012-06-14
Method of manufacturing photomask Grant 8,137,870 - Lee , et al. March 20, 2	2012-03-20
Methods Of Forming Semiconductor Devices Using Photolithographic Shot Grouping App 20120058432 - Choi; Jin ; et al.	2012-03-08
Photomask Using Separated Exposure Technique, Method Of Fabricating Photomask, And Apparatus For Fabricating Photomask By Using The Method App 20110244376 - HAN; Hak-seung ; et al.	2011-10-06
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method Grant 7,939,223 - Han , et al. May 10, 2	2011-05-10
Phase-shift Mask And Method Of Forming The Same App 20110104593 - Yoon; Gi-Sung ; et al.	2011-05-05
Phase-shift mask and method of forming the same Grant 7,897,299 - Yoon , et al. March 1, 2	2011-03-01
Method of inspecting mask using aerial image inspection apparatus Grant 7,865,866 - Kim , et al. January 4, 2	2011-01-04
Pattern forming method App 20100266959 - Lee; Sang-Hee ; et al.	2010-10-21
Photo mask having assist pattern and method of fabricating the same Grant 7,754,398 - Kim , et al. July 13, 2	2010-07-13
Binary photomask having a compensation layer Grant 7,745,068 - Jung , et al. June 29, 2	2010-06-29
Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method Grant 7,745,072 - Jung , et al. June 29, 2	2010-06-29
Methods for forming pattern using electron beam and cell masks used in electron beam lithography Grant 7,736,838 - Kim , et al. June 15, 2	2010-06-15
Method for Inspecting Critical Dimension Uniformity at High Speed Measurement App 20100111427 - Kim; Hee-Bom ; et al.	2010-05-06
Reflective photomask, method of fabricating the same, and reflective blank photomask Grant 7,642,017 - Huh , et al. January 5, 2	2010-01-05
Method of manufacturing EUVL alternating phase-shift mask Grant 7,601,467 - Huh , et al. October 13, 2	2009-10-13
Method of manufacturing photomask App 20090191475 - Lee; Myoung-soo ; et al.	2009-07-30
Method of measuring a critical dimension of a semiconductor device and a related apparatus Grant 7,525,089 - Choi , et al. April 28, 2	2009-04-28
Method Of Inspecting Mask Using Aerial Image Inspection Apparatus App 20080288912 - KIM; Hee-Bom ; et al.	2008-11-20
Phase-shift mask and method of forming the same App 20080145771 - Yoon; Gi-Sung ; et al.	2008-06-19
Photo mask having assist pattern and method of fabricating the same App 20080090156 - Kim; Hee-Bom ; et al.	2008-04-17
Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method App 20080044742 - Jung; Jin-sik ; et al.	2008-02-21
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method App 20070231715 - Han; Hak-seung ; et al.	2007-10-04
Reflective photomask, method of fabricating the same, and reflective blank photomask App 20070224523 - Huh; Sung-min ; et al.	2007-09-27
Methods for forming pattern using electron beam and cell masks used in electron beam lithography App 20070166646 - Kim; Hee-Bom ; et al.	2007-07-19
Method of measuring a critical dimension of a semiconductor device and a related apparatus App 20070125948 - Choi; Yo-Han ; et al.	2007-06-07
Systems and methods for fabricating photo masks App 20070111112 - Huh; Sung-Min ; et al.	2007-05-17
Binary photomask having a compensation layer and method of manufacturing the same App 20070054200 - Jung; Jin-Sik ; et al.	2007-03-08
Method of manufacturing EUVL alternating phase-shift mask App 20060240334 - Huh; Sung-min ; et al.	2006-10-26
Phase shift masks App 20060177745 - Huh; Sung-min ; et al.	2006-08-10
Method for forming a phase-shifting mask for semiconductor device manufacture Grant 6,767,672 - Hong , et al. July 27, 2	2004-07-27
Method For Forming A Phase-shifting Mask For Semiconductor Device Manufacture App 20030068563 - HONG , Ji-Suk ; et al.	2003-04-10
Simulation method in lithographic process Grant 6,049,660 - Ahn , et al. April 11, 2	2000-04-11

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