Kim; Hea-Jung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kim; Hea-Jung.The latest application filed is for "method of producing layer structure, layer structure, and method of forming patterns".

Company Profile

3.12.12

Kim; Hea-Jung - Uiwang-si KR
Kim; Hea-Jung - Suwon-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition Grant 10,345,706 - Song , et al. July 9, 2	2019-07-09
Method of producing layer structure, layer structure, and method of forming patterns Grant 10,312,074 - Kim , et al.	2019-06-04
Hardmask composition and method of forming patterns using the hardmask composition Grant 10,018,914 - Nam , et al. July 10, 2	2018-07-10
Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition Grant 9,683,114 - Kim , et al. June 20, 2	2017-06-20
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition Grant 9,671,688 - Shin , et al. June 6, 2	2017-06-06
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns Grant 9,665,003 - Choi , et al. May 30, 2	2017-05-30
Hardmask composition and method of forming patterns using the hardmask composition Grant 9,568,825 - Nam , et al. February 14, 2	2017-02-14
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition Grant 9,556,094 - Kim , et al. January 31, 2	2017-01-31
Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition Grant 9,513,546 - Park , et al. December 6, 2	2016-12-06
Hardmask composition and method of forming patterns using the hardmask composition Grant 9,348,229 - Nam , et al. May 24, 2	2016-05-24
Method Of Producing Layer Structure, Layer Structure, And Method Of Forming Patterns App 20160126088 - KIM; Min-Soo ; et al.	2016-05-05
Hardmask Composition And Method Of Forming Patterns Using The Hardmask Composition App 20160017174 - NAM; Youn-Hee ; et al.	2016-01-21
Hardmask Composition And Method Of Forming Patterns Using The Hardmask Composition App 20150332931 - NAM; Youn-Hee ; et al.	2015-11-19
Monomer For Hardmask Composition, Hardmask Composition Including Said Monomer, And Method For Forming Pattern Using Said Hardmask Composition App 20150301446 - SHIN; Seung-Wook ; et al.	2015-10-22
Monomer, Hard Mask Composition Comprising Said Monomer, And Method For Forming Pattern Using Said Hard Mask Composition App 20150301448 - Park; You-Jung ; et al.	2015-10-22
Monomer, Hardmask Composition Including Monomer, And Method For Forming Pattern By Using Hardmask Composition App 20150274622 - Kim; Yun-Jun ; et al.	2015-10-01
Monomer For Hardmask Composition, Hardmask Composition Including The Monomer, And Method Of Forming Patterns Using The Hardmask Composition App 20150268558 - KIM; Hea-Jung ; et al.	2015-09-24
Hardmask Composition And Method Of Forming Patterns Using The Hardmask Composition App 20150187589 - NAM; Youn-Hee ; et al.	2015-07-02
Monomer For Hardmask Composition And Hardmask Composition Including The Monomer And Method Of Forming Patterns Using The Hardmask Composition App 20150001178 - SONG; Hyun-Ji ; et al.	2015-01-01
Hardmask Composition, Method Of Forming Patterns Using The Hardmask Composition And Semiconductor Integrated Circuit Device Including The Patterns App 20150004531 - CHOI; Yoo-Jeong ; et al.	2015-01-01

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.