Kim; Deog-Bae

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kim; Deog-Bae.The latest application filed is for "isocyanurate compound for forming organic anti-reflective layer and composition including same".

Company Profile

0.19.15

Kim; Deog-Bae - Seoul N/A KR
Kim; Deog Bae - Gyeonggi N/A KR
Kim; Deog-Bae - Hwaseong-Si KR
Kim; Deog-Bae - Kyungki-Do KR
Kim; Deog-Bae - Hwaseong KR
Kim; Deog-Bae - Hwaseong-city KR
Kim, Deog-Bae - Hwaseong-Kun KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Isocyanurate compound for forming organic anti-reflective layer and composition including same Grant 9,063,424 - Roh , et al. June 23, 2	2015-06-23
Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition Grant 8,551,684 - Park , et al. October 8, 2	2013-10-08
Method for forming fine pattern in semiconductor device Grant 8,293,458 - Lee , et al. October 23, 2	2012-10-23
Isocyanurate Compound For Forming Organic Anti-reflective Layer And Composition Including Same App 20120164338 - Roh; Hyo-Jung ; et al.	2012-06-28
Polymer For Forming Resist Protection Film, Composition For Forming Resist Protection Film, And Method Of Forming Patterns Of Semiconductor Devices Using The Composition App 20120003589 - Park; Jong Kyoung ; et al.	2012-01-05
Method For Forming Fine Pattern In Semiconductor Device App 20100233622 - Lee; Jun-Gyeong ; et al.	2010-09-16
Photosensitive compound and photoresist composition including the same Grant 7,745,099 - Kim , et al. June 29, 2	2010-06-29
Monomer, polymer and composition for photoresist Grant 7,604,919 - Kim , et al. October 20, 2	2009-10-20
Monomer having sulfonyl group, polymer thereof and photoresist composition including the same Grant 7,569,325 - Lee , et al. August 4, 2	2009-08-04
Photosensitive polymer and photoresist composition Grant 7,504,195 - Kim , et al. March 17, 2	2009-03-17
Polymer for forming anti-reflective coating layer Grant 7,465,531 - Kim , et al. December 16, 2	2008-12-16
Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same Grant 7,419,761 - Lee , et al. September 2, 2	2008-09-02
Polymer for forming anti-reflective coating layer Grant 7,368,219 - Kim , et al. May 6, 2	2008-05-06
Monomer Having Sulfonyl Group, Polymer Thereof And Photoresist Composition Including The Same App 20080102402 - LEE; Jung-Youl ; et al.	2008-05-01
Monomer, Polymer And Composition For Photoresist App 20080070161 - Kim; Deog-Bae ; et al.	2008-03-20
Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same Grant 7,344,820 - Son , et al. March 18, 2	2008-03-18
Photosensitive Polymer And Photoresist Composition App 20080057436 - KIM; Deog-Bae ; et al.	2008-03-06
Polymer for forming anti-reflective coating layer Grant 7,309,561 - Kim , et al. December 18, 2	2007-12-18
Photosensitive polymer and chemically amplified photoresist composition including the same Grant 7,297,463 - Kim , et al. November 20, 2	2007-11-20
Polymer for forming anti-reflective coating layer Grant 7,282,530 - Kim , et al. October 16, 2	2007-10-16
Polymer for forming anti-reflective coating layer App 20060199107 - Kim; Sang-Jung ; et al.	2006-09-07
Polymer for forming anti-reflective coating layer App 20060199108 - Kim; Sang-Jung ; et al.	2006-09-07
Polymer for forming anti-reflective coating layer App 20060199106 - Kim; Sang-Jung ; et al.	2006-09-07
Polymer for forming anti-reflective coating layer App 20060134558 - Kim; Sang-Jung ; et al.	2006-06-22
Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same App 20060057494 - Lee; Jae-Woo ; et al.	2006-03-16
Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same App 20060019192 - SON; Eun-Kyung ; et al.	2006-01-26
Photosensitive polymer and chemically amplified photoresist composition including the same App 20050271977 - Kim, Deog-Bae ; et al.	2005-12-08
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion Grant 6,924,078 - Lee , et al. August 2, 2	2005-08-02
Polymer for chemically amplified resist and a resist composition using the same Grant 6,767,687 - Kim , et al. July 27, 2	2004-07-27
Chemically amplified resist and a resist composition Grant 6,743,881 - Kim , et al. June 1, 2	2004-06-01
Chemically amplified resist and a resist composition App 20030181629 - Kim, Deog- Bae ; et al.	2003-09-25
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion App 20030091927 - Lee, Geun Su ; et al.	2003-05-15

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