| Patent | Date |
|---|
Secondary battery and insulator for secondary battery
Grant 11,450,910 - Shin , et al. September 20, 2 | 2022-09-20 |
Secondary Battery and Method for Manufacturing the Same
App 20220093998 - Kim; Do Gyun ; et al. | 2022-03-24 |
Secondary battery
Grant 11,171,384 - Min , et al. November 9, 2 | 2021-11-09 |
Cylindrical battery cell having no beading part
Grant 11,063,318 - Shin , et al. July 13, 2 | 2021-07-13 |
Rust Inhibitor for Gasket, Gasket for Secondary Battery Including Same, and Secondary Battery Including Gasket for Secondary Battery
App 20210151838 - Lee; Byoung Gu ; et al. | 2021-05-20 |
Semiconductor Device With Air Gap And Method For Fabricating The Same
App 20210134808 - KIM; Chan-Bae ; et al. | 2021-05-06 |
Gasket for Secondary Battery, and Secondary Battery Including the Same
App 20210091434 - Lee; Byoung Gu ; et al. | 2021-03-25 |
Secondary Battery
App 20210083236 - Kim; Do Gyun ; et al. | 2021-03-18 |
Semiconductor device with air gap and method for fabricating the same
Grant 10,930,655 - Kim , et al. February 23, 2 | 2021-02-23 |
Secondary Battery and Method for Manufacturing the Same
App 20200295318 - Kim; Do Gyun ; et al. | 2020-09-17 |
Secondary Battery And Insulator For Secondary Battery
App 20200106060 - SHIN; Hang Soo ; et al. | 2020-04-02 |
Secondary Battery
App 20200091482 - Min; Geon Woo ; et al. | 2020-03-19 |
Semiconductor Device With Air Gap And Method For Fabricating The Same
App 20200020697 - KIM; Chan-Bae ; et al. | 2020-01-16 |
Pouch-shaped secondary battery including micro-perforated electrode lead having adhesive properties
Grant 10,535,859 - Kim , et al. Ja | 2020-01-14 |
Insulation Member, Method of Manufacturing the Insulation Member, and Method of Manufacturing Cylindrical Battery Comprising the
App 20200013998 - Shin; Hang Soo ; et al. | 2020-01-09 |
Cylindrical Battery Cell Having No Beading Part
App 20190386272 - Shin; Hang Soo ; et al. | 2019-12-19 |
Cylindrical Battery Comprising Anti-corrosive Gasket
App 20190386270 - Lee; Byoung Gu ; et al. | 2019-12-19 |
Pouch-shaped Secondary Battery Including Micro-perforated Electrode Lead Having Adhesive Properties
App 20180309112 - KIM; Do Gyun ; et al. | 2018-10-25 |
Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using the same
Grant 8,507,665 - Min , et al. August 13, 2 | 2013-08-13 |
Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using the same
Grant 8,354,350 - Min , et al. January 15, 2 | 2013-01-15 |
Template Derivative For Forming Ultra-low Dielectric Layer And Method Of Forming Ultra-low Dielectric Layer Using The Same
App 20120231634 - MIN; Sung Kyu ; et al. | 2012-09-13 |
Template Derivative For Forming Ultra-low Dielectric Layer And Method Of Forming Ultra-low Dielectric Layer Using The Same
App 20120231635 - MIN; Sung Kyu ; et al. | 2012-09-13 |
Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using the same
Grant 8,202,807 - Min , et al. June 19, 2 | 2012-06-19 |
Method for manufacturing a semiconductor device using a spacer as an etch mask for forming a fine pattern
Grant 7,846,843 - Chung , et al. December 7, 2 | 2010-12-07 |
Method for manufacturing semiconductor device utilizing low dielectric layer filling gaps between metal lines
Grant 7,838,414 - Kim , et al. November 23, 2 | 2010-11-23 |
Semiconductor Device Having Air Gap And Method For Manufacturing The Same
App 20090115019 - LEE; Hyo Seok ; et al. | 2009-05-07 |
Method For Manufacturing A Semiconductor Device Using A Spacer As An Etch Mask For Forming A Fine Pattern
App 20090001044 - CHUNG; Chai O. ; et al. | 2009-01-01 |
Method For Manufacturing Semiconductor Device Utilizing Low Dielectric Layer Filling Gaps Between Metal Lines
App 20080318437 - Kim; Chan Bae ; et al. | 2008-12-25 |
Method of manufacturing semiconductor device for improving contact hole filling characteristics while reducing parasitic capacitance of inter-metal dielectric
Grant 7,439,177 - Kim , et al. October 21, 2 | 2008-10-21 |
Template Derivative For Forming Ultra-low Dielectric Layer And Method Of Forming Ultra-low Dielectric Layer Using The Same
App 20080214018 - MIN; Sung Kyu ; et al. | 2008-09-04 |
Method of manufacturing semiconductor device for improving contact hole filling characteristics while reducing parasitic capacitance of inter-metal dielectricMethod of manufacturing semiconductor device for improving contact hole filling characteristics while reducing parasitic capacitance of inter-
App 20070037398 - Kim; Chan Bae ; et al. | 2007-02-15 |
Method for forming a storage node of a capacitor
Grant 6,562,679 - Lee , et al. May 13, 2 | 2003-05-13 |
Method for forming a storage node of a capacitor
App 20020106856 - Lee, Kee-Jeung ; et al. | 2002-08-08 |
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