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Patent applications and USPTO patent grants for Kim; Byung Chun.The latest application filed is for "method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield".
Patent | Date |
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Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield Grant 10,707,093 - Lee , et al. | 2020-07-07 |
Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield Grant 10,453,703 - Lee , et al. Oc | 2019-10-22 |
Method Of Treating Silicon Wafers To Have Intrinsic Gettering And Gate Oxide Integrity Yield App 20190267251 - Lee; Young Jung ;   et al. | 2019-08-29 |
Method Of Treating Silicon Wafers To Have Intrinsic Gettering And Gate Oxide Integrity Yield App 20180182641 - Lee; Young Jung ;   et al. | 2018-06-28 |
Methods For Producing Single Crystal Silicon Ingots With Reduced Seed End Oxygen App 20180030615 - Kwon; Doh Hyung ;   et al. | 2018-02-01 |
Multifunction lighting and audio system App 20070008711 - Kim; Byung-Chun | 2007-01-11 |
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