loadpatents
name:-0.001878023147583
name:-0.018128871917725
name:-0.001215934753418
Kieser; Jorg Patent Filings

Kieser; Jorg

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kieser; Jorg.The latest application filed is for "method and device for influencing combustion processes, in particular during the operation of a gas turbine".

Company Profile
0.15.1
  • Kieser; Jorg - Forchheim DE
  • Kieser; Jorg - Albstadt DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method and Device For Influencing Combustion Processes, In Particular During the Operation of a Gas Turbine
App 20070261383 - Hartmann; Werner ;   et al.
2007-11-15
Low pressure gas discharge switch
Grant 6,417,604 - Hartmann , et al. July 9, 2
2002-07-09
Process and device for purifying exhaust gases containing nitrogen oxides
Grant 6,119,455 - Hammer , et al. September 19, 2
2000-09-19
Device for detoxifying exhaust fumes from mobile equipment
Grant 5,746,051 - Kieser , et al. May 5, 1
1998-05-05
Switching component for detecting contact erosion
Grant 5,747,984 - Amft , et al. May 5, 1
1998-05-05
Variable high-current resistor, especially for use as protective element in power switching applications & circuit making use of high-current resistor
Grant 5,644,283 - Grosse-Wilde , et al. July 1, 1
1997-07-01
Process for depositing silicon oxide on a substrate
Grant 5,053,244 - Kieser , et al. October 1, 1
1991-10-01
Cathode sputtering apparatus on the magnetron principle with a hollow cathode and a cylindrical target
Grant 4,966,677 - Aichert , et al. October 30, 1
1990-10-30
Apparatus for producing a plasma and for the treatment of substrates
Grant 4,939,424 - Kieser , et al. July 3, 1
1990-07-03
Sputtering cathode based on the magnetron principle
Grant 4,933,064 - Geisler , et al. June 12, 1
1990-06-12
Plasma treatment apparatus
Grant 4,767,641 - Kieser , et al. August 30, 1
1988-08-30
Method of producing amorphous carbon coatings on substrates and substrates coated by this method
Grant 4,661,409 - Kieser , et al. April 28, 1
1987-04-28
Magnetron cathode for sputtering ferromagnetic targets
Grant 4,572,776 - Aichert , et al. February 25, 1
1986-02-25
Method of producing amorphous carbon coatings on substrates by plasma deposition
Grant 4,569,738 - Kieser , et al. February 11, 1
1986-02-11
Apparatus for producing a microwave plasma for the treatment of substrates, in particular for the plasma-polymerization of monomers thereon
Grant 4,521,717 - Kieser June 4, 1
1985-06-04
Magnetron cathode for cathodic evaportion apparatus
Grant 4,515,675 - Kieser , et al. May 7, 1
1985-05-07

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