Ki; Won-Tai

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ki; Won-Tai.The latest application filed is for "mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare".

Company Profile

0.9.10

Ki; Won-Tai - Suwon KR
Ki; Won-tai - Kyungki-do KR
Ki, Won-Tai - Suwon-City KR
Ki; Won-tai - Yongin KR
Ki, Won-tai - Yongin-city KR
Ki, Won-tai - Seoul KR
Ki; Won-tai - Seodaemun-gu KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare Grant 7,393,615 - Ki , et al. July 1, 2	2008-07-01
Exposure method for correcting line width variation in a photomask Grant 7,185,312 - Ki , et al. February 27, 2	2007-02-27
Electron beam lithography method Grant 7,129,024 - Ki October 31, 2	2006-10-31
Method for making an OPC mask and an OPC mask manufactured using the same Grant 7,065,735 - Ki , et al. June 20, 2	2006-06-20
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare App 20050083518 - Ki, Won-Tai ; et al.	2005-04-21
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare Grant 6,835,507 - Ki , et al. December 28, 2	2004-12-28
Exposure method for correcting line width variation in a photomask App 20040229138 - Ki, Won-tai ; et al.	2004-11-18
Exposure method for correcting line width variation in a photomask Grant 6,775,815 - Ki , et al. August 10, 2	2004-08-10
Electron beam lithography method App 20040058536 - Ki, Won-Tai	2004-03-25
Exposure method for correcting dimension variation in electron beam lithography Grant 6,689,520 - Ki February 10, 2	2004-02-10
Method for making an OPC mask and an OPC mask manufactured using the same App 20030226130 - Ki, Won-Tai ; et al.	2003-12-04
Electron beam mask having dummy stripe(s) and lithographic method of manufacturing a semiconductor device using an E-beam mask having at least one defective pattern Grant 6,617,084 - Ki September 9, 2	2003-09-09
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare App 20030068565 - Ki, Won-Tai ; et al.	2003-04-10
Exposure method for correcting line width variation in a photomask App 20030061595 - Ki, Won-tai ; et al.	2003-03-27
Exposure method for correcting dimension variation in electron beam lithography, and recording medium for recording the same App 20030027064 - Ki, Won-Tai	2003-02-06
Electron beam mask having dummy stripe( s) and lithographic method of manufacturing a semiconductor device using an E-beam mask having at least one defective pattern App 20020086221 - Ki, Won-tai	2002-07-04
Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method App 20020051916 - Ki, Won-tai	2002-05-02
Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography and recording medium in which the method is recorded Grant 6,291,119 - Choi , et al. September 18, 2	2001-09-18
Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography App 20010016295 - Choi, Ji-hyeon ; et al.	2001-08-23

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