Kholodenko; Arnold

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kholodenko; Arnold.The latest application filed is for "metal mesh touch sensor with randomized channel displacement".

Company Profile

0.50.34

Kholodenko; Arnold - San Francisco CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing chamber with a grounded electrode assembly Grant 9,905,402 - Kholodenko , et al. February 27, 2	2018-02-27
Metal Mesh Touch Sensor With Randomized Channel Displacement App 20160282973 - Kholodenko; Arnold ; et al.	2016-09-29
Plasma Processing Chamber With a Grounded Electrode Assembly App 20150325416 - Kholodenko; Arnold ; et al.	2015-11-12
Plasma processing chamber with a grounded electrode assembly Grant 9,111,968 - Kholodenko , et al. August 18, 2	2015-08-18
Proximity head having a fluid resistor Grant 8,900,400 - Kholodenko , et al. December 2, 2	2014-12-02
Methods for Confinement of Foam Delivered by a Proximity Head App 20140251382 - Kholodenko; Arnold ; et al.	2014-09-11
Multi-stage substrate cleaning method and apparatus Grant 8,757,177 - Kholodenko , et al. June 24, 2	2014-06-24
Confinement of foam delivered by a proximity head Grant 8,739,805 - Kholodenko , et al. June 3, 2	2014-06-03
Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid App 20140041581 - Kholodenko; Arnold ; et al.	2014-02-13
Single substrate processing head for particle removal using low viscosity fluid Grant 8,584,613 - Kholodenko , et al. November 19, 2	2013-11-19
Method for using generator for foam to clean substrate Grant 8,557,051 - Kholodenko , et al. October 15, 2	2013-10-15
Multi-stage Substrate Cleaning Method And Apparatus App 20130068261 - Kholodenko; Arnold ; et al.	2013-03-21
Proximity Head Having a Fluid Resistor App 20130048765 - Kholodenko; Arnold ; et al.	2013-02-28
Multi-stage substrate cleaning method and apparatus Grant 8,317,934 - Kholodenko , et al. November 27, 2	2012-11-27
Apparatus for substantially uniform fluid flow rates relative to a proximity head in processing of a wafer surface by a meniscus Grant 8,317,966 - Kholodenko , et al. November 27, 2	2012-11-27
System, method and apparatus for maintaining separation of liquids in a controlled meniscus Grant 8,313,582 - O'Donnell , et al. November 20, 2	2012-11-20
Method for manufacturing a hybrid composite wafer carrier for wet clean equipment Grant 8,292,697 - Cheng , et al. October 23, 2	2012-10-23
Method for Using Generator for Foam to Clean Substrate App 20120255618 - Kholodenko; Arnold ; et al.	2012-10-11
Wafer carrier drive apparatus and method for operating the same Grant 8,261,905 - Kholodenko , et al. September 11, 2	2012-09-11
In situ morphological characterization of foam for a proximity head Grant 8,246,755 - Kholodenko , et al. August 21, 2	2012-08-21
Method for Manufacturing a Hybrid Composite Wafer Carrier for Wet Clean Equipment App 20120168079 - Cheng; Wing Lau ; et al.	2012-07-05
System, Method And Apparatus For Maintaining Separation Of Liquids In A Controlled Meniscus App 20120138098 - O'Donnell; Robert ; et al.	2012-06-07
Generator for foam to clean substrate Grant 8,161,984 - Kholodenko , et al. April 24, 2	2012-04-24
Hybrid composite wafer carrier for wet clean equipment Grant 8,146,902 - Cheng , et al. April 3, 2	2012-04-03
System, method and apparatus for maintaining separation of liquids in a controlled meniscus Grant 8,141,566 - O'Donnell , et al. March 27, 2	2012-03-27
Methods of configuring a proximity head that provides uniform fluid flow relative to a wafer Grant 7,998,304 - Kholodenko , et al. August 16, 2	2011-08-16
In Situ Morphological Characterization Of Foam For A Proximity Head App 20110100399 - Kholodenko; Arnold ; et al.	2011-05-05
Multi-Stage Substrate Cleaning Method and Apparatus App 20100288311 - Kholodenko; Arnold ; et al.	2010-11-18
Plasma Processing Chamber With A Grounded Electrode Assembly App 20100263592 - Kholodenko; Arnold ; et al.	2010-10-21
Wafer Carrier Drive Apparatus and Method for Operating the Same App 20100230243 - Kholodenko; Arnold ; et al.	2010-09-16
Apparatus for an optimized plasma chamber grounded electrode assembly Grant 7,743,730 - Kholodenko , et al. June 29, 2	2010-06-29
Confinement of Foam Delivered by a Proximity Head App 20100126528 - Kholodenko; Arnold ; et al.	2010-05-27
High power electrical connector for a laminated heater Grant 7,699,634 - Kholodenko , et al. April 20, 2	2010-04-20
Apparatus For Substantially Uniform Fluid Flow Rates Relative To A Proximity Head In Processing Of A Wafer Surface By A Meniscus App 20100037922 - Kholodenko; Arnold ; et al.	2010-02-18
Generator For Foam To Clean Substrate App 20100024842 - Kholodenko; Arnold ; et al.	2010-02-04
Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid App 20090320942 - Kholodenko; Arnold ; et al.	2009-12-31
Methods Of Configuring A Proximity Head That Provides Uniform Fluid Flow Relative To A Wafer App 20090159201 - Kholodenko; Arnold ; et al.	2009-06-25
System, method and apparatus for maintaining separation of liquids in a controlled meniscus App 20080314422 - O'Donnell; Robert ; et al.	2008-12-25
High Power Electrical Connector for a Laminated Heater App 20080227323 - Kholodenko; Arnold ; et al.	2008-09-18
Hybrid Composite Wafer Carrier For Wet Clean Equipment App 20080152922 - Cheng; Wing Lau ; et al.	2008-06-26
Chemical resistant semiconductor processing chamber bodies App 20080038448 - Kholodenko; Arnold ; et al.	2008-02-14
Apparatus for an optimized plasma chamber grounded electrode assembly App 20070137573 - Kholodenko; Arnold ; et al.	2007-06-21
Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process Grant 6,908,540 - Kholodenko June 21, 2	2005-06-21
Electrostatic chuck having dielectric member with stacked layers and manufacture App 20040190215 - Weldon, Edwin C. ; et al.	2004-09-30
Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber Grant 6,795,292 - Grimard , et al. September 21, 2	2004-09-21
Actively-controlled electrostatic chuck heater App 20040081439 - Kholodenko, Arnold ; et al.	2004-04-29
Electrostatic chuck having composite dielectric layer and method of manufacture Grant 6,721,162 - Weldon , et al. April 13, 2	2004-04-13
Electrostatic chuck having heater and method Grant 6,538,872 - Wang , et al. March 25, 2	2003-03-25
Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process App 20030010641 - Kholodenko, Arnold	2003-01-16
Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process App 20030010640 - Kholodenko, Arnold	2003-01-16
Substrate support having bonded sections and method Grant 6,503,368 - Kholodenko , et al. January 7, 2	2003-01-07
Electrostatic chuck bonded to base with a bond layer and method Grant 6,490,146 - Wang , et al. December 3, 2	2002-12-03
Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber App 20020171994 - Grimard, Dennis ; et al.	2002-11-21
Plasma chamber support having dual electrodes Grant 6,478,924 - Shamouilian , et al. November 12, 2	2002-11-12
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma Grant 6,471,822 - Yin , et al. October 29, 2	2002-10-29
Substrate support member for a processing chamber Grant 6,464,795 - Sherstinsky , et al. October 15, 2	2002-10-15
Substrate support member Grant 6,464,790 - Sherstinsky , et al. October 15, 2	2002-10-15
Electrostatic chuck having improved electrical connector and method Grant 6,462,928 - Shamouilian , et al. October 8, 2	2002-10-08
Electrostatic chuck having composite dielectric layer and method of manufacture App 20020135969 - Weldon, Edwin C. ; et al.	2002-09-26
Electrostatic chuck bonded to base with a bond layer and method App 20020075624 - Wang, You ; et al.	2002-06-20
Electrostatic Chuck Having Composite Base And Method App 20020036881 - SHAMOUILIAN, SHAMOUIL ; et al.	2002-03-28
Chuck having pressurized zones of heat transfer gas Grant 6,320,736 - Shamouilian , et al. November 20, 2	2001-11-20
Electrostatic chuck having gas cavity and method Grant 6,310,755 - Kholodenko , et al. October 30, 2	2001-10-30
Method of fabricating a semiconductor wafer support chuck apparatus having small diameter gas distribution ports for distributing a heat transfer gas App 20010024349 - Shamoulian, Shamouil ; et al.	2001-09-27
Electrostatic chuck with improved temperature control and puncture resistance Grant 6,278,600 - Shamouilian , et al. August 21, 2	2001-08-21
Plasma reactor having a helicon wave high density plasma source Grant 6,189,484 - Yin , et al. February 20, 2	2001-02-20
Connectors for an electrostatic chuck and combination thereof Grant 6,151,203 - Shamouilian , et al. November 21, 2	2000-11-21
Electrostatic chuck having improved gas conduits Grant 6,108,189 - Weldon , et al. August 22, 2	2000-08-22
High density plasma process chamber Grant 6,095,084 - Shamouilian , et al. August 1, 2	2000-08-01
Polymer chuck with heater and method of manufacture Grant 6,094,334 - Bedi , et al. July 25, 2	2000-07-25
Wafer support with improved temperature control Grant 6,033,478 - Kholodenko March 7, 2	2000-03-07
Temperature control system for semiconductor process chamber Grant 6,015,465 - Kholodenko , et al. January 18, 2	2000-01-18
Plasma process chamber Grant 5,900,064 - Kholodenko May 4, 1	1999-05-04
Topographical structure of an electrostatic chuck and method of fabricating same Grant 5,885,469 - Kholodenko , et al. March 23, 1	1999-03-23
Electrostatic chuck having a unidirectionally conducting coupler layer Grant 5,801,915 - Kholodenko , et al. September 1, 1	1998-09-01
Resilient rotary seal with projecting edge Grant 5,356,158 - Simmons , et al. October 18, 1	1994-10-18
Rotary shaft sealing method and device Grant 5,292,137 - Simmons , et al. March 8, 1	1994-03-08

Company Registrations

SEC

0001619854

Kholodenko Arnold

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