Khojasteh; Mahmoud

Patent Applications and Registrations

Patent applications and USPTO patent grants for Khojasteh; Mahmoud.The latest application filed is for "iii-v lateral bipolar junction transistor on local facetted buried oxide layer".

Company Profile

13.40.39

Khojasteh; Mahmoud - Poughkeepsie NY
- Poughkeepsie NY US
Khojasteh; Mahmoud - Yorktown Heights NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
III-V lateral bipolar junction transistor on local facetted buried oxide layer Grant 11,444,185 - Hashemi , et al. September 13, 2	2022-09-13
III-V lateral bipolar junction transistor on local facetted buried oxide layer Grant 11,437,502 - Hashemi , et al. September 6, 2	2022-09-06
Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isolation Grant 10,748,990 - Ando , et al. A	2020-08-18
III-V lateral bipolar junction transistor on local facetted buried oxide layer Grant 10,615,271 - Hashemi , et al.	2020-04-07
Iii-v Lateral Bipolar Junction Transistor On Local Facetted Buried Oxide Layer App 20200058776 - Hashemi; Pouya ; et al.	2020-02-20
Iii-v Lateral Bipolar Junction Transistor On Local Facetted Buried Oxide Layer App 20200058777 - Hashemi; Pouya ; et al.	2020-02-20
Forming stacked twin III-V nano-sheets using aspect-ratio trapping techniques Grant 10,546,928 - Hashemi , et al. Ja	2020-01-28
Stacked Indium Gallium Arsenide Nanosheets On Silicon With Bottom Trapezoid Isolation App 20190296106 - Ando; Takashi ; et al.	2019-09-26
Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isolation Grant 10,388,727 - Ando , et al. A	2019-08-20
Forming Stacked Twin Iii-v Nano-sheets Using Aspect-ratio Trapping Techniques App 20190181228 - HASHEMI; Pouya ; et al.	2019-06-13
Iii-v Lateral Bipolar Junction Transistor On Local Facetted Buried Oxide Layer App 20190157433 - Hashemi; Pouya ; et al.	2019-05-23
Stacked Indium Gallium Arsenide Nanosheets On Silicon With Bottom Trapezoid Isolation App 20190157386 - Ando; Takashi ; et al.	2019-05-23
Plasma shallow doping and wet removal of depth control cap Grant 10,276,384 - Bruce , et al.	2019-04-30
Wet clean process for removing C.sub.xH.sub.yF.sub.z etch residue Grant 10,167,443 - Bruce , et al. J	2019-01-01
Plasma Shallow Doping And Wet Removal Of Depth Control Cap App 20180218907 - Bruce; Robert L. ; et al.	2018-08-02
Plasma Shallow Doping And Wet Removal Of Depth Control Cap App 20180218908 - Bruce; Robert L. ; et al.	2018-08-02
Plasma Shallow Doping And Wet Removal Of Depth Control Cap App 20180218909 - Bruce; Robert L. ; et al.	2018-08-02
Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning Grant 9,881,793 - Engelmann , et al. January 30, 2	2018-01-30
WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE App 20170044470 - Bruce; Robert L. ; et al.	2017-02-16
Neutral Hard Mask And Its Application To Graphoepitaxy-based Directed Self-assembly (dsa) Patterning App 20170025274 - Engelmann; Sebastian U. ; et al.	2017-01-26
Wet clean process for removing C.sub.xH.sub.yF.sub.z etch residue Grant 9,536,731 - Bruce , et al. January 3, 2	2017-01-03
Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof Grant 9,058,976 - Chhabra , et al. June 16, 2	2015-06-16
WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE App 20150118839 - Bruce; Robert L. ; et al.	2015-04-30
Cleaning Composition And Process For Cleaning Semiconductor Devices And/or Tooling During Manufacturing Thereof App 20150024989 - Chhabra; Vishal ; et al.	2015-01-22
Post metal chemical-mechanical planarization cleaning process Grant 08920567 -	2014-12-30
Post metal chemical-mechanical planarization cleaning process Grant 8,920,567 - Devarapalli , et al. December 30, 2	2014-12-30
Post Metal Chemical-mechanical Planarization Cleaning Process App 20140256133 - Devarapalli; Vamsi ; et al.	2014-09-11
Removal Of Masking Material App 20140187460 - Afzali-Ardakani; Ali ; et al.	2014-07-03
Cleaning Composition And Process For Cleaning Semiconductor Devices And/or Tooling During Manufacturing Thereof App 20140128307 - Chhabra; Vishal ; et al.	2014-05-08
Process for cleaning semiconductor devices and/or tooling during manufacturing thereof Grant 8,647,445 - Chhabra , et al. February 11, 2	2014-02-11
Aqueous cerium-containing solution having an extended bath lifetime for removing mask material Grant 08618036 -	2013-12-31
Aqueous cerium-containing solution having an extended bath lifetime for removing mask material Grant 8,618,036 - Afzali-Ardakani , et al. December 31, 2	2013-12-31
Spin-on formulation and method for stripping an ion implanted photoresist Grant 8,563,408 - Afzali-Ardakani , et al. October 22, 2	2013-10-22
Use Of An Organic Planarizing Mask For Cutting A Plurality Of Gate Lines App 20130143397 - Fuller; Nicholas C.M. ; et al.	2013-06-06
Spin-on formulation and method for stripping an ion implanted photoresist Grant 8,455,420 - Afzali-Ardakani , et al. June 4, 2	2013-06-04
Use of an organic planarizing mask for cutting a plurality of gate lines Grant 8,455,366 - Fuller , et al. June 4, 2	2013-06-04
Non-lithographic method of patterning contacts for a photovoltaic device Grant 8,445,316 - Afzali-Ardakani , et al. May 21, 2	2013-05-21
Aqueous Cerium-containing Solution Having An Extended Bath Lifetime For Removing Mask Material App 20130123159 - Afzali-Ardakani; Ali ; et al.	2013-05-16
Removal of masking material Grant 8,367,555 - Afzali-Ardakani , et al. February 5, 2	2013-02-05
Use of an organic planarizing mask for cutting a plurality of gate lines Grant 8,367,556 - Fuller , et al. February 5, 2	2013-02-05
Non-lithographic Method Of Patterning Contacts For A Photovoltaic Device App 20120322200 - Afzali-Ardakani; Ali ; et al.	2012-12-20
Top antireflective coating composition containing hydrophobic and acidic groups Grant 8,304,178 - Khojasteh , et al. November 6, 2	2012-11-06
Spin-on Formulation And Method For Stripping An Ion Implanted Photoresist App 20120276724 - Afzali-Ardakani; Ali ; et al.	2012-11-01
Spin-on Formulation And Method For Stripping An Ion Implanted Photoresist App 20120270763 - Afzali-Ardakani; Ali ; et al.	2012-10-25
Spin-on formulation and method for stripping an ion implanted photoresist Grant 8,252,673 - Afzali-Ardakani , et al. August 28, 2	2012-08-28
Wet developable bottom antireflective coating composition and method for use thereof Grant 8,202,678 - Chen , et al. June 19, 2	2012-06-19
Low pH mixtures for the removal of high density implanted resist Grant 8,026,200 - Cooper , et al. September 27, 2	2011-09-27
Ultra low post exposure bake photoresist materials Grant 8,017,303 - Goldfarb , et al. September 13, 2	2011-09-13
Spin-on Formulation And Method For Stripping An Ion Implanted Photoresist App 20110151653 - Afzali-Ardakani; Ali ; et al.	2011-06-23
Removal of Masking Material App 20110140181 - Afzali-Ardakani; Ali ; et al.	2011-06-16
Ultra Low Post Exposure Bake Photoresist Materials App 20100216071 - Goldfarb; Dario Leonardo ; et al.	2010-08-26
Top Antireflective Coating Composition Containing Hydrophobic And Acidic Groups App 20100047712 - Khojasteh; Mahmoud ; et al.	2010-02-25
Wet Developable Bottom Antireflective Coating Composition And Method For Use Thereof App 20090291392 - Chen; Kuang-Jung J. ; et al.	2009-11-26
LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST App 20090281016 - Cooper; Emanuel ; et al.	2009-11-12
Top antireflective coating composition containing hydrophobic and acidic groups Grant 7,608,390 - Khojasteh , et al. October 27, 2	2009-10-27
Wet developable bottom antireflective coating composition and method for use thereof Grant 7,563,563 - Chen , et al. July 21, 2	2009-07-21
Hexafluoroalcohol-based Monomers and Processes of Preparation Thereof App 20090143611 - Motallebi; Shahrokh ; et al.	2009-06-04
Low refractive index polymers as underlayers for silicon-containing photoresists Grant 7,439,302 - Huang , et al. October 21, 2	2008-10-21
Top Antireflective Coating Composition Containing Hydrophobic And Acidic Groups App 20080032228 - Khojasteh; Mahmoud ; et al.	2008-02-07
Low refractive index polymers as underlayers for silicon-containing photoresists Grant 7,326,523 - Huang , et al. February 5, 2	2008-02-05
Wet developable bottom antireflective coating composition and method for use thereof App 20070243484 - Chen; Kuang-Jung J. ; et al.	2007-10-18
Bottom antireflective coating composition and method for use thereof App 20070231736 - Chen; Kuang-Jung J. ; et al.	2007-10-04
Fluorinated photoresist materials with improved etch resistant properties Grant 7,217,496 - Khojasteh , et al. May 15, 2	2007-05-15
Low activation energy positive resist Grant 7,183,036 - Khojasteh , et al. February 27, 2	2007-02-27
Molecular photoresists containing nonpolymeric silsesquioxanes Grant 7,141,692 - Allen , et al. November 28, 2	2006-11-28
Positive resist containing naphthol functionality Grant 7,129,016 - Khojasteh , et al. October 31, 2	2006-10-31
Low refractive index polymers as underlayers for silicon-containing photoresists App 20060134547 - Huang; Wu-Song ; et al.	2006-06-22
Low refractive index polymers as underlayers for silicon-containing photoresists App 20060134546 - Huang; Wu-Song ; et al.	2006-06-22
Fluorinated photoresist materials with improved etch resistant properties App 20060105269 - Khojasteh; Mahmoud ; et al.	2006-05-18
Low activation energy positive resist App 20060105266 - Khojasteh; Mahmoud ; et al.	2006-05-18
Positive resist containing naphthol functionality App 20060105267 - Khojasteh; Mahmoud ; et al.	2006-05-18
Molecular photoresists containing nonpolymeric silsesquioxanes App 20050112382 - Allen, Robert David ; et al.	2005-05-26

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.