Kher; Shreyas

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kher; Shreyas.The latest application filed is for "hardware set for growth of high k & capping material films".

Company Profile

0.7.13

Kher; Shreyas - Campbell CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatuses for atomic layer deposition Grant 8,343,279 - Myo , et al. January 1, 2	2013-01-01
Methods for atomic layer deposition of hafnium-containing high-K dielectric materials Grant 8,282,992 - Myo , et al. October 9, 2	2012-10-09
Integrated scheme for forming inter-poly dielectrics for non-volatile memory devices Grant 7,910,446 - Ma , et al. March 22, 2	2011-03-22
Hardware set for growth of high k and capping material films Grant 7,816,200 - Kher October 19, 2	2010-10-19
Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system Grant 7,794,544 - Nguyen , et al. September 14, 2	2010-09-14
Hardware Set For Growth Of High K & Capping Material Films App 20090263961 - KHER; SHREYAS	2009-10-22
Method for fabricating an integrated gate dielectric layer for field effect transistors Grant 7,601,648 - Chua , et al. October 13, 2	2009-10-13
Method for hafnium nitride deposition Grant 7,547,952 - Metzner , et al. June 16, 2	2009-06-16
Integrated Scheme For Forming Inter-poly Dielectrics For Non-volatile Memory Devices App 20090020802 - MA; YI ; et al.	2009-01-22
Methods For Depositing A High-k Dielectric Material Using Chemical Vapor Deposition Process App 20080268154 - KHER; SHREYAS ; et al.	2008-10-30
Control Of Gas Flow And Delivery To Suppress The Formation Of Particles In An Mocvd/ald System App 20080041307 - Nguyen; Son T. ; et al.	2008-02-21
Methods For Atomic Layer Deposition Of Hafnium-containing High-k Dielectric Materials App 20080044569 - Myo; Nyi Oo ; et al.	2008-02-21
Method for fabricating an integrated gate dielectric layer for field effect transistors App 20080026553 - Chua; Thai Cheng ; et al.	2008-01-31
Method For Hafnium Nitride Deposition App 20060208215 - Metzner; Craig ; et al.	2006-09-21
Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials App 20050271812 - Myo, Nyi Oo ; et al.	2005-12-08
Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials App 20050271813 - Kher, Shreyas ; et al.	2005-12-08
Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system App 20050252449 - Nguyen, Son T. ; et al.	2005-11-17
Method for hafnium nitride deposition App 20040198069 - Metzner, Craig ; et al.	2004-10-07
CVD BST film composition and property control with thickness below 200 A for DRAM capacitor application with size at 0.1mum or below App 20030012875 - Kher, Shreyas ; et al.	2003-01-16
Low thermal budget metal oxide deposition for capacitor structures App 20020197793 - Dornfest, Charles N ; et al.	2002-12-26

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