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Polishing composition for a tungsten-containing substrate
Grant 7,582,127 - Vacassy , et al. September 1, 2 | 2009-09-01 |
Method of polishing a tungsten-containing substrate
App 20070266641 - Vacassy; Robert ; et al. | 2007-11-22 |
Method Of Polishing A Tungsten-containing Substrate
App 20070214728 - Vacassy; Robert ; et al. | 2007-09-20 |
Method of polishing a tungsten-containing substrate
Grant 7,247,567 - Vacassy , et al. July 24, 2 | 2007-07-24 |
Method of polishing a tungsten-containing substrate
App 20050282391 - Vacassy, Robert ; et al. | 2005-12-22 |
Method for synthesizing polymeric azo dyes
App 20020061473 - Shan, Jianhui ; et al. | 2002-05-23 |
Antireflective coating compositions for photoresist compositions and use thereof
Grant 5,994,430 - Ding , et al. November 30, 1 | 1999-11-30 |
Positive photoresists containing novel photoactive compounds
Grant 5,876,897 - Durham , et al. March 2, 1 | 1999-03-02 |
Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers
Grant 5,858,627 - Rahman , et al. January 12, 1 | 1999-01-12 |
Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
Grant 5,739,265 - Rahman , et al. April 14, 1 | 1998-04-14 |
Antireflective coating for photoresist compositions
Grant 5,733,714 - McCulloch , et al. March 31, 1 | 1998-03-31 |
Aqueous antireflective coatings for photoresist compositions
Grant 5,652,297 - McCulloch , et al. July 29, 1 | 1997-07-29 |
Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
Grant 5,521,052 - Rahman , et al. May 28, 1 | 1996-05-28 |
Polyamide containing the hexafluoroisopropylidene group and process of using to form a positive image
Grant 5,240,819 - Mueller , et al. August 31, 1 | 1993-08-31 |
Crosslinkable polyimides from bis (aminophenoxy) benzonitriles
Grant 5,101,005 - Vora , et al. March 31, 1 | 1992-03-31 |
Polyamide-polyimide and polybenzoxazole-polyimide polymer
Grant 5,071,948 - Khanna December 10, 1 | 1991-12-10 |
Polymers prepared from 4,4'-bis(2-[3,4(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride
Grant 5,055,550 - Mueller , et al. October 8, 1 | 1991-10-08 |
Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use
Grant 5,037,720 - Khanna August 6, 1 | 1991-08-06 |
Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether
Grant 5,037,949 - Mueller , et al. August 6, 1 | 1991-08-06 |
Polyamide containing the hexafluoroisopropylidene group with O-quinone diazide in positive working photoresist
Grant 5,021,320 - Mueller , et al. June 4, 1 | 1991-06-04 |
Photoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers
Grant 5,011,753 - Mueller , et al. April 30, 1 | 1991-04-30 |
Polyamide-polyimide and polybenzoxazole-polyimide polymer
Grant 4,980,447 - Khanna December 25, 1 | 1990-12-25 |
Polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymer having at least one fluorine-containing linking group
Grant 4,978,733 - Khanna December 18, 1 | 1990-12-18 |
Heat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ether
Grant 4,939,215 - Mueller , et al. July 3, 1 | 1990-07-03 |
Polymers prepared from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride
Grant 4,931,540 - Mueller , et al. June 5, 1 | 1990-06-05 |
Hydroxy polyimides and high temperature positive photoresists therefrom
Grant 4,927,736 - Mueller , et al. May 22, 1 | 1990-05-22 |
Heat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethers
Grant 4,845,183 - Mueller , et al. July 4, 1 | 1989-07-04 |
Photosensitive polyimide polymer compositions
Grant 4,803,147 - Mueller , et al. February 7, 1 | 1989-02-07 |
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