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Patent applications and USPTO patent grants for Kerstens; Pieter J. M..The latest application filed is for "apparatus and method for measuring distortion of a visible pattern on a substrate by viewing predetermined portions thereof".
Patent | Date |
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Apparatus and method for measuring distortion of a visible pattern on a substrate by viewing predetermined portions thereof Grant 6,219,442 - Harper , et al. April 17, 2 | 2001-04-17 |
Optical apparatus for monitoring profiles of textured spots during a disk texturing process Grant 5,951,891 - Barenboim , et al. September 14, 1 | 1999-09-14 |
Textured surface monitoring and control apparatus Grant 5,877,858 - Kerstens , et al. March 2, 1 | 1999-03-02 |
Laser texturing apparatus with dual laser paths having an independently adjusted parameter Grant 5,822,211 - Barenboim , et al. October 13, 1 | 1998-10-13 |
Linear-scanning, oblique-viewing optical apparatus Grant 5,774,224 - Kerstens June 30, 1 | 1998-06-30 |
Optical apparatus for inspecting laser texture Grant 5,699,160 - Barenboim , et al. December 16, 1 | 1997-12-16 |
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