Kersch; Alfred

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kersch; Alfred.The latest application filed is for "method of performing proximity correction".

Company Profile

0.10.19

Kersch; Alfred - Putzbrunn DE
Kersch; Alfred - Munich DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of Performing Proximity Correction App 20090204936 - Jacobs; Werner ; et al.	2009-08-13
Method for Manufacturing a Structure, Semiconductor Device and Structure on a Substrate App 20090102023 - Wege; Stephan ; et al.	2009-04-23
Method and system for determining deformations on a substrate App 20080182344 - Mueller; Steffen ; et al.	2008-07-31
Method For Forming A Dielectric Layer App 20080176375 - Erben; Elke ; et al.	2008-07-24
Method for Fabricating a Structure for a Semiconductor Component, and Semiconductor Component App 20080085606 - Fischer; Dominik ; et al.	2008-04-10
Method for producing an annular microstructure element Grant 7,316,933 - Kersch , et al. January 8, 2	2008-01-08
Method, Apparatus And Starting Material For Providing A Gaseous Precursor App 20070269598 - Kersch; Alfred ; et al.	2007-11-22
Automatic layer deposition process App 20070161180 - Erben; Elke ; et al.	2007-07-12
PVD method and PVD apparatus Grant 7,022,209 - Sabisch , et al. April 4, 2	2006-04-04
Semiconductor memory with memory cells comprising a vertical selection transistor and method for fabricating it Grant 6,977,405 - Lutzen , et al. December 20, 2	2005-12-20
Method for producing an annular microstructure element App 20050250344 - Kersch, Alfred ; et al.	2005-11-10
Compensation frame for receiving a substrate App 20050016468 - Ruhl, Guenther ; et al.	2005-01-27
Semiconductor memory with memory cells comprising a vertical selection transistor and method for fabricating it App 20040201055 - Lutzen, Jorn ; et al.	2004-10-14
Reaction chamber for processing a substrate wafer, and method for processing a substrate using the chamber Grant 6,716,748 - Kersch April 6, 2	2004-04-06
PVD method and PVD apparatus App 20040011640 - Sabisch, Winfried ; et al.	2004-01-22
Process for chemical mechanical polishing Grant 6,660,637 - Delage , et al. December 9, 2	2003-12-09
Method for determining the relevant ion and particle flows in i-PVD processes Grant 6,649,521 - Kersch , et al. November 18, 2	2003-11-18
Process for chemical mechanical polishing App 20030064594 - Delage, Stephanie ; et al.	2003-04-03
Configuration for the execution of a plasma based sputter process Grant 6,524,448 - Brinkmann , et al. February 25, 2	2003-02-25
Method for determining the relevant ion and particle flows in I-PVD processes App 20030029727 - Kersch, Alfred ; et al.	2003-02-13
Method and apparatus for producing at least one depression in a semiconductor material App 20030019837 - Kersch, Alfred ; et al.	2003-01-30
Method and installation for fabricating one-sided buried straps App 20030003652 - Gobel, Bernd ; et al.	2003-01-02
Method of fabricating a micro-technical structure, and micro-technical component Grant 6,458,603 - Kersch , et al. October 1, 2	2002-10-01
Reaction chamber for processing a substrate wafer, and method for operating the chamber App 20020092840 - Kersch, Alfred	2002-07-18
Method for fabricating a microtechnical structure Grant 6,413,886 - Kersch , et al. July 2, 2	2002-07-02
Method of fabricating a micro-technical structure, and micro-technical component App 20020042158 - Kersch, Alfred ; et al.	2002-04-11
Configuration for the execution of a plasma based sputter process App 20020036132 - Brinkmann, Ralf-Peter ; et al.	2002-03-28
Method of producing a ferroelectric solid-state layer using an auxiliary substance App 20020025377 - Kersch, Alfred ; et al.	2002-02-28
Apparatus for processing a substrate wafer and method for operating same Grant 5,998,767 - Kersch , et al. December 7, 1	1999-12-07

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