loadpatents
name:-0.0080077648162842
name:-0.010618209838867
name:-0.00050592422485352
Kendall; Rodney A. Patent Filings

Kendall; Rodney A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kendall; Rodney A..The latest application filed is for "remote clamping mechanism via vacuum feedthrough".

Company Profile
0.11.5
  • Kendall; Rodney A. - Ridgefield CT
  • Kendall; Rodney A. - Fairfield County CT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Remote clamping mechanism via vacuum feedthrough
Grant 6,908,255 - Kendall , et al. June 21, 2
2005-06-21
Remote Clamping Mechanism Via Vacuum Feedthrough
App 20040265052 - Kendall, Rodney A. ;   et al.
2004-12-30
Electron beam position reference system
Grant 6,818,906 - Hartley , et al. November 16, 2
2004-11-16
Electron beam lithography apparatus with self actuated vacuum bypass valve
Grant 6,724,001 - Pinckney , et al. April 20, 2
2004-04-20
Electron scatter in a thin membrane to eliminate detector saturation
Grant 6,639,219 - Kendall , et al. October 28, 2
2003-10-28
High performance source for electron beam projection lithography
Grant 6,596,999 - Golladay , et al. July 22, 2
2003-07-22
Electron scatter in a thin membrane to eliminate detector saturation
App 20030089853 - Kendall, Rodney A. ;   et al.
2003-05-15
High performance source for electron beam projection lithography
App 20030085364 - Golladay, Steven D. ;   et al.
2003-05-08
Multiple Numerical Aperture Electron Beam Projection Lithography System
App 20020074506 - GORDON, MICHAEL S. ;   et al.
2002-06-20
Target Locking System For Electron Beam Lithography
App 20020056813 - HARTLEY, JOHN GEORGE ;   et al.
2002-05-16
Method for writing a pattern using multiple variable shaped electron beams
Grant 6,175,122 - Groves , et al. January 16, 2
2001-01-16
Adjustment of particle beam landing angle
Grant 6,028,662 - Sturans , et al. February 22, 2
2000-02-22
Distributed direct write lithography system using multiple variable shaped electron beams
Grant 5,981,962 - Groves , et al. November 9, 1
1999-11-09
Spinning reticle scanning projection lithography exposure system and method
Grant 5,434,424 - Stickel , et al. July 18, 1
1995-07-18
Servo guided stage system
Grant 5,140,242 - Doran , et al. August 18, 1
1992-08-18
Two-dimensional positioning apparatus
Grant 5,059,090 - Bobroff , et al. October 22, 1
1991-10-22

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