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Patent applications and USPTO patent grants for Kelchner; Kathryn Merced.The latest application filed is for "conformal damage-free encapsulation of chalcogenide materials".
Patent | Date |
---|---|
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20220115592 - Sims; James Samuel ;   et al. | 2022-04-14 |
Conformal damage-free encapsulation of chalcogenide materials Grant 11,239,420 - Sims , et al. February 1, 2 | 2022-02-01 |
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20200066987 - Sims; James Samuel ;   et al. | 2020-02-27 |
Method for depositing ALD films using halide-based precursors Grant 10,020,188 - Sims , et al. July 10, 2 | 2018-07-10 |
Method For Depositing Ald Films Using Halide-based Precursors App 20180102245 - Sims; James S. ;   et al. | 2018-04-12 |
Nitride film formed by plasma-enhanced and thermal atomic layer deposition process Grant 9,865,455 - Sims , et al. January 9, 2 | 2018-01-09 |
Method for depositing metals free ald silicon nitride films using halide-based precursors Grant 9,824,884 - Sims , et al. November 21, 2 | 2017-11-21 |
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