| Patent | Date |
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Systems and methods for controlling plasma instability in semiconductor fabrication
Grant 11,393,729 - Sakiyama , et al. July 19, 2 | 2022-07-19 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20210381106 - Xia; Chunguang ; et al. | 2021-12-09 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 11,127,567 - Kang , et al. September 21, 2 | 2021-09-21 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 11,111,581 - Xia , et al. September 7, 2 | 2021-09-07 |
Systems and methods for determining film thickness using DC self-bias voltage
Grant 10,876,209 - Augustyniak , et al. December 29, 2 | 2020-12-29 |
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20200335304 - Kang; Hu ; et al. | 2020-10-22 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 10,665,429 - Kang , et al. | 2020-05-26 |
Systems and Methods for Controlling Plasma Instability in Semiconductor Fabrication
App 20200098651 - Sakiyama; Yukinori ; et al. | 2020-03-26 |
Systems and methods for controlling plasma instability in semiconductor fabrication
Grant 10,510,625 - Sakiyama , et al. Dec | 2019-12-17 |
Systems And Methods For Determining Film Thickness Using Dc Self-bias Voltage
App 20190360101 - AUGUSTYNIAK; Edward J. ; et al. | 2019-11-28 |
Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition
Grant 10,475,627 - Qi , et al. Nov | 2019-11-12 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substra
App 20190271081 - XIA; Chunguang ; et al. | 2019-09-05 |
Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage
Grant 10,378,109 - Augustyniak , et al. A | 2019-08-13 |
Mechanical Suppression Of Parasitic Plasma In Substrate Processing Chamber
App 20190172684 - KEIL; Douglas ; et al. | 2019-06-06 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 10,287,683 - Xia , et al. | 2019-05-14 |
Mechanical suppression of parasitic plasma in substrate processing chamber
Grant 10,224,182 - Keil , et al. | 2019-03-05 |
Systems and methods for detection of plasma instability by electrical measurement
Grant 10,128,160 - Sakiyama , et al. November 13, 2 | 2018-11-13 |
Systems and methods for detection of plasma instability by optical diagnosis
Grant 10,121,708 - Sakiyama , et al. November 6, 2 | 2018-11-06 |
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability
Grant 9,997,422 - Karim , et al. June 12, 2 | 2018-06-12 |
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,941,113 - Keil , et al. April 10, 2 | 2018-04-10 |
Systems and Methods for Detection of Plasma Instability by Electrical Measurement
App 20180076100 - Sakiyama; Yukinori ; et al. | 2018-03-15 |
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20180068833 - Kang; Hu ; et al. | 2018-03-08 |
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
Grant 9,875,883 - Sakiyama , et al. January 23, 2 | 2018-01-23 |
Metrology Methods to Detect Plasma in Wafer Cavity and Use of the Metrology for Station-to-Station and Tool-to-Tool Matching
App 20170338085 - Sakiyama; Yukinori ; et al. | 2017-11-23 |
Systems and methods for detection of plasma instability by electrical measurement
Grant 9,824,941 - Sakiyama , et al. November 21, 2 | 2017-11-21 |
Systems and Methods for Using Electrical Asymmetry Effect to Control Plasma Process Space in Semiconductor Fabrication
App 20170330744 - Keil; Douglas ; et al. | 2017-11-16 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 9,793,096 - Kang , et al. October 17, 2 | 2017-10-17 |
Carrier Ring Wall For Reduction Of Back-diffusion Of Reactive Species And Suppression Of Local Parasitic Plasma Ignition
App 20170278681 - Qi; Chengzhu ; et al. | 2017-09-28 |
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
Grant 9,754,769 - Sakiyama , et al. September 5, 2 | 2017-09-05 |
Systems and Methods for Controlling Plasma Instability in Semiconductor Fabrication
App 20170140968 - Sakiyama; Yukinori ; et al. | 2017-05-18 |
Systems and Methods for Detection of Plasma Instability by Electrical Measurement
App 20170141000 - Sakiyama; Yukinori ; et al. | 2017-05-18 |
Systems and Methods for Detection of Plasma Instability by Optical Diagnosis
App 20170141001 - Sakiyama; Yukinori ; et al. | 2017-05-18 |
Systems and Methods for Frequency Modulation of Radiofrequency Power Supply for Controlling Plasma Instability
App 20170141002 - Karim; Ishtak ; et al. | 2017-05-18 |
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,644,271 - Keil , et al. May 9, 2 | 2017-05-09 |
Metrology Methods to Detect Plasma in Wafer Cavity and Use of the Metrology for Station-to-Station and Tool-to-Tool Matching
App 20170076921 - Sakiyama; Yukinori ; et al. | 2017-03-16 |
Diagnostic And Control Systems And Methods For Substrate Processing Systems Using Dc Self-bias Voltage
App 20160326650 - Augustyniak; Edward ; et al. | 2016-11-10 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20160289832 - Xia; Chunguang ; et al. | 2016-10-06 |
Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage
Grant 9,404,183 - Augustyniak , et al. August 2, 2 | 2016-08-02 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 9,388,494 - Xia , et al. July 12, 2 | 2016-07-12 |
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity
App 20160079036 - Kang; Hu ; et al. | 2016-03-17 |
Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber
Grant 9,153,421 - Booth , et al. October 6, 2 | 2015-10-06 |
Processing system for detecting in-situ arcing events during substrate processing
Grant 9,129,779 - Booth , et al. September 8, 2 | 2015-09-08 |
Apparatus and method for controlling plasma potential
Grant 9,111,724 - Keil , et al. August 18, 2 | 2015-08-18 |
Systems For Automatically Characterizing A Plasma
App 20140367042 - Keil; Douglas ; et al. | 2014-12-18 |
Methods for automatically characterizing a plasma
Grant 8,849,585 - Keil , et al. September 30, 2 | 2014-09-30 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20130344245 - XIA; CHUNGUANG ; et al. | 2013-12-26 |
Diagnostic And Control Systems And Methods For Substrate Processing Systems Using Dc Self-bias Voltage
App 20130327272 - Augustyniak; Edward ; et al. | 2013-12-12 |
Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber
Grant 8,547,085 - Booth , et al. October 1, 2 | 2013-10-01 |
Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
Grant 8,518,209 - Hudson , et al. August 27, 2 | 2013-08-27 |
Mechanical Suppression Of Parasitic Plasma In Substrate Processing Chamber
App 20130092086 - Keil; Douglas ; et al. | 2013-04-18 |
Passive Capacitively-coupled Electrostatic (cce) Probe Method For Detecting Plasma Instabilities In A Plasma Processing Chamber
App 20120316834 - Booth; Jean-Paul ; et al. | 2012-12-13 |
Processing System For Detecting In-situ Arcing Events During Substrate Processing
App 20120259562 - Booth; Jean-Paul ; et al. | 2012-10-11 |
Variable-Density Plasma Processing of Semiconductor Substrates
App 20120164834 - Jennings; Kevin ; et al. | 2012-06-28 |
Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber
Grant 8,179,152 - Booth , et al. May 15, 2 | 2012-05-15 |
RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber
Grant 8,164,353 - Booth , et al. April 24, 2 | 2012-04-24 |
Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamber
Grant 8,159,233 - Booth , et al. April 17, 2 | 2012-04-17 |
Methods for measuring a set of electrical characteristics in a plasma
Grant 7,994,794 - Kimball , et al. August 9, 2 | 2011-08-09 |
Apparatus and Method for Controlling Plasma Potential
App 20110024045 - Keil; Douglas ; et al. | 2011-02-03 |
Apparatus and Method for Controlling Plasma Potential
App 20110024046 - Keil; Douglas ; et al. | 2011-02-03 |
Apparatus To Detect Fault Conditions Of A Plasma Processing Reactor
App 20110022215 - Keil; Douglas ; et al. | 2011-01-27 |
Adjustable height PIF probe
Grant 7,867,355 - Kimball , et al. January 11, 2 | 2011-01-11 |
Method and apparatus to detect fault conditions of plasma processing reactor
Grant 7,829,468 - Keil , et al. November 9, 2 | 2010-11-09 |
Methods For Measuring A Set Of Electrical Characteristics In A Plasma
App 20100229372 - Kimball; Christopher ; et al. | 2010-09-16 |
Plasma processing chamber with an apparatus for measuring a set of electrical characteristics in a plasma
Grant 7,723,994 - Kimball , et al. May 25, 2 | 2010-05-25 |
Passive Capacitively-coupled Electrostatic (cce) Probe Arrangement For Detecting Plasma Instabilities In A Plasma Processing Chamber
App 20100033195 - Booth; Jean-Paul ; et al. | 2010-02-11 |
Plasma-facing Probe Arrangement Including Vacuum Gap For Use In A Plasma Processing Chamber
App 20100007337 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Passive Capacitively-coupled Electrostatic (cce) Probe Arrangement For Detecting In-situ Arcing Events In A Plasma Processing Chamber
App 20100007359 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Rf-biased Capacitively-coupled Electrostatic (rfb-cce) Probe Arrangement For Characterizing A Film In A Plasma Processing Chamber
App 20100007362 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Methods For Automatically Characterizing A Plasma
App 20090322342 - Keil; Douglas ; et al. | 2009-12-31 |
Apparatus For Determining The Endpoint Of A Cleaning Or Conditioning Process In A Plasma Processing System
App 20090277584 - Hudson; Eric ; et al. | 2009-11-12 |
Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
Grant 7,578,301 - Hudson , et al. August 25, 2 | 2009-08-25 |
Adjustable Height Pif Probe
App 20090133836 - KIMBALL; Christopher ; et al. | 2009-05-28 |
Adjustable height PIF probe
Grant 7,479,207 - Kimball , et al. January 20, 2 | 2009-01-20 |
Plasma processing chamber with an apparatus for measuring set of electrical characteristics in a plasma
App 20080066861 - Kimball; Christopher ; et al. | 2008-03-20 |
Apparatus for measuring a set of electrical characteristics in a plasma
Grant 7,319,316 - Kimball , et al. January 15, 2 | 2008-01-15 |
Apparatus and Method for Controlling Plasma Potential
App 20080006205 - Keil; Douglas ; et al. | 2008-01-10 |
Method and apparatus to detect fault conditions of plasma processing reactor
App 20070284246 - Keil; Douglas ; et al. | 2007-12-13 |
Adjustable height PIF probe
App 20070215285 - Kimball; Christopher ; et al. | 2007-09-20 |
Apparatus for measuring a set of electrical characteristics in a plasma
App 20070000843 - Kimball; Christopher ; et al. | 2007-01-04 |
Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
App 20060216406 - Hudson; Eric ; et al. | 2006-09-28 |
Post-development treatment of patterned photoresist to promote cross-linking of polymer chains
Grant 6,780,569 - Hudson , et al. August 24, 2 | 2004-08-24 |
Plasma etching of organic antireflective coating
Grant 6,630,407 - Keil , et al. October 7, 2 | 2003-10-07 |
Profile control of oxide trench features for dual damascene applications
Grant 6,540,885 - Keil , et al. April 1, 2 | 2003-04-01 |
Plasma etching of organic antireflective coating
App 20020173160 - Keil, Douglas ; et al. | 2002-11-21 |
Plasma etching of dielectric layer with selectivity to stop layer
App 20020142610 - Chien, Ting ; et al. | 2002-10-03 |
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