Keck; Martin
Patent Applications and Registrations
Patent applications and USPTO patent grants for Keck; Martin.The latest application filed is for "method of correcting etch and lithographic processes".
- Keck; Martin - Muenchen DE
- Keck, Martin - Munchen DE
| Patent | Date |
|---|---|
| Method of Correcting Etch and Lithographic Processes App 20090300572 - Keck; Martin ; et al. | 2009-12-03 |
| Method for correcting the optical proximity effect App 20060195808 - Keck; Martin | 2006-08-31 |
| Method for compensation of the shortening of line ends during the formation of lines on a wafer App 20050196686 - Meyer, Dirk ; et al. | 2005-09-08 |
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